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公开(公告)号：US06949174B2
公开(公告)日：2005-09-27
申请号：US10444990
申请日：2003-05-27
IPC分类号： H05H1/10 , C23F4/00 , G11B7/26 , G11B11/105 , H01J37/32 , H01L21/00 , H05H1/11 , C23C14/35 , C23F1/00
CPC分类号： H01L21/67069 , H01J37/32009 , H01J37/3233
摘要： A milling apparatus is provided in which temperature rise of a treatment-object in milling treatment, especially of the substrate thereof, is prevented. In the apparatus, ionization mechanism 2 comprises casing 20d having an opening at the center portion of the face thereof opposing to substrate 5 held by substrate holder 6; a filament is placed at the position where the straight line drawn from the filament to substrate 5 is intercepted by casing 20d; and electromagnets 31, 32 are provided around ionization mechanism 2 for generating a magnetic field to produce magnetic lines extending through opening 20j to substrate 5.
摘要翻译： 提供了一种铣削设备，其中防止了处理对象在铣削处理中的温度升高，特别是其衬底的温度升高。 在该装置中，电离机构2包括壳体20d，其在其面的中心部分处具有与由基板保持器6保持的基板5相对的开口; 灯丝被放置在从灯丝到基板5的直线被壳体20d截取的位置处; 并且在电离机构2周围设置电磁体31,32，用于产生磁场，以产生延伸通过开口20j到基板5的磁线。
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公开(公告)号：US06812164B2
公开(公告)日：2004-11-02
申请号：US10350019
申请日：2003-01-24
IPC分类号： H01L2131
CPC分类号： C23C14/046 , C23C14/32 , C23C14/355 , H01J2237/3137
摘要： A method for ionization film formation to form a deposited film by ionizing vaporized particles with an ionization mechanism of the hot-cathode system and injecting the ionized particles into a substrate is provided. The method includes the step of introducing He gas inside the ionization mechanism.
摘要翻译： 提供了一种用于通过用热阴极系统的电离机构离子化蒸发的颗粒以将离子化的颗粒注入基底而形成沉积膜的电离膜的形成方法。 该方法包括将He气引入电离机构的步骤。
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公开(公告)号：US06551471B1
公开(公告)日：2003-04-22
申请号：US09722675
申请日：2000-11-28
IPC分类号： C23C1435
CPC分类号： H01J37/3233 , C23C14/355 , H01J37/3405
摘要： The present invention provides a film forming method comprising the steps of ionizing sputtering particles and applying a periodically changing voltage to an electrode near a substrate, wherein a time for applying a voltage equal to or higher than an intermediate value between maximum and minimum values of the periodically changing voltage is shorter than a time for applying a voltage equal to or less than the intermediate value, and a film forming apparatus for carrying out the above method.
摘要翻译： 本发明提供一种成膜方法，其特征在于，包括以下步骤：使溅射粒子离子化，向基板附近的电极施加周期性变化的电压，其中施加电压等于或高于中间值的电压的时间 周期性变化的电压比施加等于或小于中间值的电压的时间短;以及用于实施上述方法的成膜装置。
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公开(公告)号：US20050029090A1
公开(公告)日：2005-02-10
申请号：US10940024
申请日：2004-09-14
IPC分类号： C23C14/04 , C23C14/32 , C23C14/35 , G11B11/105
CPC分类号： C23C14/046 , C23C14/32 , C23C14/355 , H01J2237/3137
摘要： A method for ionization film formation to form a deposited film by ionizing vaporized particles with an ionization mechanism of the hot-cathode system and injecting the ionized particles into a substrate is provided. The method includes the step of introducing He gas inside the ionization mechanism.
摘要翻译： 提供了一种用于通过用热阴极系统的电离机构离子化蒸发的颗粒以将离子化的颗粒注入基底而形成沉积膜的电离膜的形成方法。 该方法包括将He气引入电离机构的步骤。
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公开(公告)号：US06878241B2
公开(公告)日：2005-04-12
申请号：US10409190
申请日：2003-04-09
CPC分类号： H01J37/3402 , C23C14/355 , C23C14/358
摘要： Sputtering particles emitted from a target are ionized by the Penning ionization process. And the sputtering particles ionized are caused to fly in the direction of the substrate by a magnetic field formed by ambipolar diffusion due to a magnetic field generating means without scattering the particles to deposit the particles on the substrate. The partial pressure of a sputtering discharge gas in a discharge space is set to 1.3 Pa or less and a distance from the target to an ionization space is within twice the mean free path of the partial pressure of the sputtering discharge gas.
摘要翻译： 通过Penning电离过程使从靶发射的溅射粒子离子化。 并且通过由于磁场产生装置的双极扩散形成的磁场而使离子化的溅射粒子在基板的方向上飞行，而不会散射颗粒以将颗粒沉积在基板上。 放电空间中的溅射放电气体的分压设定为1.3Pa以下，从靶到电离空间的距离在溅射放电气体的分压平均自由程的2倍以下。
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公开(公告)号：US06787478B2
公开(公告)日：2004-09-07
申请号：US10400872
申请日：2003-03-28
IPC分类号： H01L2131
CPC分类号： H01J37/3233 , C23C14/0021 , C23C14/0063 , C23C14/0068 , C23C14/355 , C23C14/564 , H01J37/34
摘要： In a deposited-film-forming method of forming a compound film on a substrate by a chemical reaction between the particles of a raw material emitted from a raw material particle generation source opposed to the substrate in the direction of the substrate, and the atoms of a reactive gas supplied to a flying space of the particles of the raw material, the space being interposed between the substrate and the raw material particle source, the atoms of a rare gas in an excited state are supplied to the flying space of the particles of the raw material, in order to ionize the atoms of the reactive gas and the particles of the raw material and thereby induce the chemical reaction.
摘要翻译： 在通过在与基板相反的原料颗粒发生源发射的原料颗粒沿着基板的方向发生的化学反应而在基板上形成化合物膜的沉积膜形成方法中， 提供给原料颗粒的飞行空间的反应气体，该空间插入在基板和原料颗粒源之间，将处于激发状态的稀有气体的原子供给到颗粒的飞行空间 原料，以使电反应气体的原子和原料的粒子离子化，从而引起化学反应。
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公开(公告)号：US06397775B1
公开(公告)日：2002-06-04
申请号：US09419115
申请日：1999-10-15
申请人： Hitomi Sano , Masahiro Kanai , Atsushi Koike , Hiroshi Sugai
发明人： Hitomi Sano , Masahiro Kanai , Atsushi Koike , Hiroshi Sugai
IPC分类号： C23C1600
CPC分类号： H01J37/32082 , C23C16/24 , C23C16/509 , C23C16/511 , C23C16/545 , H01J37/32532
摘要： In a deposited film forming system having at least a vacuum vessel, means for feeding a film-forming material gas into the vacuum vessel, a discharge electrode provided inside the vacuum vessel, used to make the material gas into a plasma, and a power supply conductor for applying a high-frequency power to the discharge electrode, the system comprises an earth shield so disposed as to surround the power supply conductor inside the vacuum vessel, and a plurality of dielectric materials at least part of which is disposed between the power supply conductor and the earth shield. A process carried out using the deposited film forming system is also disclosed. The system and process can maintain large-area and uniform discharge for a long time and can form deposited films having a high quality and a superior uniformity, on a beltlike substrate that moves continuously.
摘要翻译： 在具有至少真空容器的沉积膜形成系统中，用于将成膜材料气体进料到真空容器中的装置，设置在真空容器内部的用于使材料气体进入等离子体的放电电极，以及电源 导体，用于向放电电极施加高频电力，该系统包括一个接地屏蔽层，其设置成围绕真空容器内部的电源导体，以及多个电介质材料，其至少一部分设置在电源 导体和地盾。 还公开了使用沉积膜形成系统进行的工艺。 该系统和工艺可以长时间保持大面积均匀的放电，并且可以在连续移动的带状基板上形成具有高质量和优异均匀性的沉积膜。
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8.发明申请PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS 审中-公开加工设备，排气加工过程和等离子体处理工艺公开(公告)号：US20090084500A1
公开(公告)日：2009-04-02
申请号：US12326238
申请日：2008-12-02
申请人： Tadashi Sawayama , Yasushi Fujioka , Masahiro Kanai , Shotaro Okabe , Yuzo Kohda , Tadashi Hori , Koichiro Moriyama , Hiroyuki Ozaki , Yukito Aota , Atsushi Koike , Mitsuyuki Niwa , Yasuyoshi Takai , Hidetoshi Tsuzuki
发明人： Tadashi Sawayama , Yasushi Fujioka , Masahiro Kanai , Shotaro Okabe , Yuzo Kohda , Tadashi Hori , Koichiro Moriyama , Hiroyuki Ozaki , Yukito Aota , Atsushi Koike , Mitsuyuki Niwa , Yasuyoshi Takai , Hidetoshi Tsuzuki
CPC分类号： H01L21/67017 , C23C16/24 , C23C16/4412 , C23C16/545 , H01J37/3244 , H01J37/32834 , H01J37/32844 , Y02C20/30 , Y02P70/605
摘要： There is disclosed an exhaust processing process of a processing apparatus for processing a substrate or a film, which comprises after the processing of the substrate or the film, introducing a non-reacted gas and/or a by-product into a trap means comprising a filament comprised of a high-melting metal material comprising as a main component at least one of tungsten, molybdenum and rhenium; and processing the non-reacted gas and/or the by-product inside the trap means. This makes it possible to prevent lowering in exhaust conductance, to lengthen the maintenance cycle of the processing apparatus, and to provide a high-quality product (processed substrate or film).
摘要翻译： 公开了一种处理衬底或膜的处理装置的废气处理过程，其包括在处理基板或膜之后，将未反应的气体和/或副产物引入陷阱装置， 由包含钨，钼和铼中的至少一种作为主要成分的高熔点金属材料构成的长丝; 以及处理陷阱装置内的未反应气体和/或副产物。 这使得可以防止排气电导降低，延长加工设备的维护周期，并且提供高质量的产品（经处理的基板或膜）。
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公开(公告)号：US08298031B2
公开(公告)日：2012-10-30
申请号：US12396860
申请日：2009-03-03
申请人： Atsushi Koike , Mutsuo Mitsui , Masahiro Kanai
发明人： Atsushi Koike , Mutsuo Mitsui , Masahiro Kanai
IPC分类号： H01J9/24
CPC分类号： H01L51/5259 , H01L51/524 , H01L51/5243 , H01L51/5246
摘要： The present invention provides an excellent organic EL device with a glass substrate and a sealing glass sheet which are thinned for weight reduction while avoiding lowering the durability and impact resistance of the device. The organic luminescence device is characterized in that sealing is performed at the space between a face of the sealing glass sheet along the outer edge and a face of the device substrate with a low melting point metal.
摘要翻译： 本发明提供了一种具有玻璃基板和密封玻璃板的优异的有机EL器件，其在减少设备的耐久性和抗冲击性的同时减小重量。 有机发光装置的特征在于，在密封玻璃板的沿着外边缘的表面和具有低熔点金属的器件基板的表面之间的空间处进行密封。
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公开(公告)号：US20090170393A1
公开(公告)日：2009-07-02
申请号：US12396860
申请日：2009-03-03
申请人： Atsushi Koike , Mutsuo Mitsui , Masahiro Kanai
发明人： Atsushi Koike , Mutsuo Mitsui , Masahiro Kanai
IPC分类号： H01J9/26
CPC分类号： H01L51/5259 , H01L51/524 , H01L51/5243 , H01L51/5246
摘要： The present invention provides an excellent organic EL device with a glass substrate and a sealing glass sheet which are thinned for weight reduction while avoiding lowering the durability and impact resistance of the device. The organic luminescence device is characterized in that sealing is performed at the space between a face of the sealing glass sheet along the outer edge and a face of the device substrate with a low melting point metal.
摘要翻译： 本发明提供了一种具有玻璃基板和密封玻璃板的优异的有机EL器件，其在减少设备的耐久性和抗冲击性的同时减小重量。 有机发光装置的特征在于，在密封玻璃板的沿着外边缘的表面和具有低熔点金属的器件基板的表面之间的空间处进行密封。
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