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公开(公告)号:US20080257261A1
公开(公告)日:2008-10-23
申请号:US11738505
申请日:2007-04-22
申请人: Hiroji Hanawa , Andrew Nguyen , Keiji Horiaka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger Alan Lindley , Hong S. Yang
发明人: Hiroji Hanawa , Andrew Nguyen , Keiji Horiaka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger Alan Lindley , Hong S. Yang
IPC分类号: H05H1/00
CPC分类号: H01J37/3266 , H01J37/32623
摘要: Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a plasma control magnet assembly includes a plurality of magnets arranged in a predetermined pattern that generate a magnetic field having a strength greater than 10 Gauss in a region proximate the assembly and less than 10 Gauss in a region remote from the assembly.
摘要翻译: 本发明的实施例涉及等离子体处理装置及其使用方法。 在一些实施例中,等离子体控制磁体组件包括以预定图案布置的多个磁体,其在靠近组件的区域中产生强度大于10高斯的磁场,并且在远离组件的区域中小于10高斯。