公开(公告)号：US20120045360A1

公开(公告)日：2012-02-23

申请号：US13263992

申请日：2010-04-14

申请人： Hiromi Matsumura ,  Akira Nanbu ,  Masaya Ehira ,  Shinya Okamoto

发明人： Hiromi Matsumura ,  Akira Nanbu ,  Masaya Ehira ,  Shinya Okamoto

IPC分类号： B32B15/00 ,  B05D3/02 ,  B05D3/00 ,  C23C14/14 ,  C23C14/34

CPC分类号： C23C14/3414 ,  B22F2998/10 ,  C22C1/0425 ,  C22C9/00 ,  B22F9/082 ,  C23C14/34 ,  B22F3/15

摘要： Disclosed is a Cu—Ga alloy sputtering target which enables the formation of a Cu—Ga sputtering film having excellent uniformity in film component composition (film uniformity), enables the reduction of occurrence of arcing during sputtering, has high strength, and rarely undergoes cracking during sputtering. Specifically disclosed is a Cu—Ga alloy sputtering target which comprises a Cu-based alloy containing Ga, has an average crystal particle diameter of 10 μm or less, and has a porosity of 0.1% or less.

摘要翻译： 公开了一种Cu-Ga合金溅射靶，其能够形成具有优异的膜组分组成（膜均匀性）的Cu-Ga溅射膜，能够减少溅射期间电弧的发生，具有高强度，并且很少发生裂纹 在溅射期间。 具体公开了包含含有Ga的Cu基合金的Cu-Ga合金溅射靶，其平均结晶粒径为10μm以下，孔隙率为0.1％以下。

公开(公告)号：US5122423A

公开(公告)日：1992-06-16

申请号：US326641

申请日：1989-03-21

申请人： Takashi Hase ,  Hiromi Matsumura ,  Yoshihiko Onishi ,  Hidetaka Hayashi ,  Motoharu Sato

发明人： Takashi Hase ,  Hiromi Matsumura ,  Yoshihiko Onishi ,  Hidetaka Hayashi ,  Motoharu Sato

IPC分类号： G11B5/82 ,  G11B5/64 ,  G11B5/72 ,  G11B5/73 ,  G11B5/738 ,  G11B5/84

CPC分类号： G11B5/7325 ,  G11B5/656 ,  G11B5/72 ,  Y10S428/90 ,  Y10S428/928 ,  Y10T428/12465 ,  Y10T428/12625 ,  Y10T428/12743

摘要： Magnetic recording media, wherein a substrate of Al-Mg alloy prepared from aluminum metal at a purity of higher than 99.99% is surface finished by electrolytic abrasive polishing and a thin film layer of ferromagnetic material is formed thereover as a recording layer.The Al-Mg alloy is preferably prepared by rapid-cooling solidification.

摘要翻译： 磁记录介质，其中由铝金属制备的纯度高于99.99％的Al-Mg合金的基底通过电解研磨抛光进行表面处理，并在其上形成铁磁材料薄膜作为记录层。 Al-Mg合金优选通过快速冷却固化来制备。

公开(公告)号：US20080073411A1

公开(公告)日：2008-03-27

申请号：US11946577

申请日：2007-11-28

申请人： Hiromi Matsumura ,  Yoichiro Yoneda

发明人： Hiromi Matsumura ,  Yoichiro Yoneda

IPC分类号： B23K20/12

CPC分类号： B23K20/22 ,  C23C14/3407 ,  C23C14/3414

摘要： A sputtering target prepared by the butt joining of metal sheets being made of the same material, wherein an intermetallic compound in a joined portion has an average particle diameter of 60% to 130% of the average particle diameter of the intermetallic compound in a non-joined portion is provided. In the sputtering target, the average particle diameter of an intermetallic compound in a joined portion is approximately the same as that of the intermetallic compound in a non-joined portion.

摘要翻译： 通过由相同材料制成的金属板的对接制备的溅射靶，其中接合部分中的金属间化合物的平均粒径为非金属间化合物的平均粒径的60〜130％ 提供接合部分。 在溅射靶中，接合部中的金属间化合物的平均粒径与非接合部的金属间化合物的平均粒径大致相同。

公开(公告)号：US20060207876A1

公开(公告)日：2006-09-21

申请号：US10551672

申请日：2004-03-22

申请人： Hiromi Matsumura ,  Yoichiro Yoneda

发明人： Hiromi Matsumura ,  Yoichiro Yoneda

IPC分类号： B23K20/12 ,  C23C14/00

CPC分类号： B23K20/22 ,  C23C14/3407 ,  C23C14/3414

摘要： A sputtering target prepared by the butt joining of metal sheets being made of the same material, wherein an intermetallic compound in a joined portion has an average particle diameter of 60% to 130% of the average particle diameter of the intermetallic compound in a non-joined portion is provided. In the sputtering target, the average particle diameter of an intermetallic compound in a joined portion is approximately the same as that of the intermetallic compound in a non-joined portion.

摘要翻译： 通过由相同材料制成的金属板的对接制备的溅射靶，其中接合部分中的金属间化合物的平均粒径为非金属间化合物的平均粒径的60〜130％ 提供接合部分。 在溅射靶中，接合部中的金属间化合物的平均粒径与非接合部的金属间化合物的平均粒径大致相同。

公开(公告)号：US5789088A

公开(公告)日：1998-08-04

申请号：US427874

申请日：1995-04-26

申请人： Junichi Nakai ,  Kazuo Yoshikawa ,  Eisuke Kusumoto ,  Hiromi Matsumura ,  Takashi Miyamoto

发明人： Junichi Nakai ,  Kazuo Yoshikawa ,  Eisuke Kusumoto ,  Hiromi Matsumura ,  Takashi Miyamoto

IPC分类号： G11B5/64 ,  G11B5/73

CPC分类号： G11B5/7325 ,  G11B5/656 ,  Y10S428/90 ,  Y10T428/12465 ,  Y10T428/12854 ,  Y10T428/12861 ,  Y10T428/31678

摘要： Disclosed is magnetic recording media having a high coercivity sufficient to cope with the recent high density recording, low noise property and excellent squareness, and a target for forming a magnetic film useful for realizing the magnetic recording media. The magnetic film is made of a Co based alloy containing: Cr in an amount of 8-18 atomic %; one kind or more of elements selected from a group consisting of V, Mo and W in an amount of 3-10 atomic %, or one kind or more of the elements and Ta in an amount of 3-10 atomic %; Pt in an amount of 0.5 to 20 atomic % or Ni in an amount of 5-30 atomic %, as needed; and the balance being Co and inevitable impurities, wherein the total content of Cr and one kind or more of the elements selected from a group consisting of V, Mo and W, or of Cr and one kind or more of the elements and Ta is specified to be 24 atomic % or less. A target for forming the magnetic film is formed by melting, casting and hot-rolling the Co alloy having the above composition, and it has a maximum permeability of 100 or less.

摘要翻译： 公开了具有足以应付近来的高密度记录，低噪声特性和优异的矩形度的高矫顽力的磁记录介质，以及用于形成用于实现磁记录介质的磁膜的目标。 磁性膜由含有8〜18原子％的Cr的Co系合金构成。 选自含量为3-10原子％的V，Mo和W的元素中的一种或多种元素，或者一种或多种元素，Ta为3-10原子％的量; 根据需要的量为0.5〜20原子％的Pt或5-30原子％的Ni; 其余为Co和不可避免的杂质，其中规定Cr和选自由V，Mo和W组成的组中的一种或多种元素，或Cr和一种或多种元素和Ta的元素的总含量 为24原子％以下。 通过熔融，铸造和热轧具有上述组成的Co合金来形成磁性膜的目标，并且其最大磁导率为100以下。