-
1.发明申请Hydrogen Atom Generation Source in Vacuum Treatment Apparatus, and Hydrogen Atom Transportation Method 有权真空处理装置中的氢原子产生源和氢原子运输方法公开(公告)号：US20090004100A1
公开(公告)日：2009-01-01
申请号：US11816726
申请日：2005-07-15
CPC分类号： C23C16/4404 , H01J37/32477 , H01J37/32871
摘要： In a hydrogen atom generation source in a vacuum treatment apparatus which can effectively inhibit hydrogen atoms from being recombined due to contact with an internal wall surface of a treatment chamber of the vacuum treatment apparatus and an internal wall surface of a transport passage, and being returned into hydrogen molecules, at least a part of a surface facing a space with the hydrogen atom generation means formed therein of a member surrounding the hydrogen atom generation means is coated with SiO2. In a hydrogen atom transportation method for transporting hydrogen atoms generated by the hydrogen atom generation means in the vacuum treatment apparatus to a desired place, the hydrogen atoms are transported via a transport passage whose internal wall surface is coated with SiO2.
摘要翻译： 在真空处理装置中的氢原子产生源中，能够有效地抑制氢原子与真空处理装置的处理室的内壁面的接触和输送通路的内壁面的复合，并被返回 形成氢分子，其中形成有围绕氢原子产生装置的构件的氢原子产生装置的面向空间的表面的至少一部分被涂覆有SiO 2。 在将真空处理装置中由氢原子产生装置产生的氢原子转移到所需位置的氢原子传输方法中，氢原子通过内壁表面被SiO 2涂覆的输送通道输送。
-
2.发明授权公开(公告)号：US07771701B2
公开(公告)日：2010-08-10
申请号：US11816726
申请日：2005-07-15
CPC分类号： C23C16/4404 , H01J37/32477 , H01J37/32871
摘要： In a hydrogen atom generation source in a vacuum treatment apparatus which can effectively inhibit hydrogen atoms from being recombined due to contact with an internal wall surface of a treatment chamber of the vacuum treatment apparatus and an internal wall surface of a transport passage, and being returned into hydrogen molecules, at least a part of a surface facing a space with the hydrogen atom generation source formed therein of a member surrounding the hydrogen atom generation source is coated with SiO2. In a hydrogen atom transportation method for transporting hydrogen atoms generated by the hydrogen atom generation source in the vacuum treatment apparatus to a desired place, the hydrogen atoms are transported via a transport passage whose internal wall surface is coated with SiO2.
摘要翻译： 在真空处理装置中的氢原子产生源中，能够有效地抑制氢原子与真空处理装置的处理室的内壁面的接触和输送通路的内壁面的复合，并被返回 形成氢分子，其中形成有围绕氢原子产生源的构件的氢原子产生源的面向空间的表面的至少一部分被涂覆有SiO 2。 在将真空处理装置中由氢原子产生源产生的氢原子转移到所需位置的氢原子输送方法中，氢原子通过内壁表面被SiO 2涂覆的输送通道输送。
-
3.发明申请公开(公告)号：US20090263911A1
公开(公告)日：2009-10-22
申请号：US11991278
申请日：2006-08-22
CPC分类号： H01J37/32963 , H01J37/3244 , H01J37/32935 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： The object of the present invention is to provide an end point detection method in a gas phase reaction processing apparatus.An end point detection method in the case where a catalyst 9 arranged in a treatment chamber is heated at high temperature by supplying electric power thereto and the treatment is carried out by cracking a reaction gas by the catalyst 9 heated at high temperature, comprises the steps of supplying the electric power to the catalyst 9 from a constant current source 10, detecting electric potential difference between both ends of the catalyst 9, performing primary differentiation of the detected electric potential difference, and determining an end point of the treatment based on obtained primary differential value.
摘要翻译： 本发明的目的是提供一种气相反应处理装置中的终点检测方法。 在布置在处理室中的催化剂9通过向其供给电力而在高温下加热并且通过在高温下加热的催化剂9裂解反应气体来进行处理的情况下的终点检测方法包括以下步骤 从恒定电流源10向催化剂9供给电力，检测催化剂9的两端之间的电位差，进行检测出的电位差的一次微分，并根据获得的主电极确定治疗的终点 差分值。
-
4.发明授权End point detection method, end point detection device, and gas phase reaction processing apparatus equipped with end point detection device 失效端点检测方法，终点检测装置和装有端点检测装置的气相反应处理装置公开(公告)号：US07815813B2
公开(公告)日：2010-10-19
申请号：US11991278
申请日：2006-08-22
IPC分类号： C23F1/00
CPC分类号： H01J37/32963 , H01J37/3244 , H01J37/32935 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： An end point detection method in the case where a catalyst arranged in a treatment chamber of a gas phase reaction processing apparatus is heated at high temperature by supplying electric power thereto and the treatment is carried out by cracking a reaction gas by the catalyst heated at high temperature, comprises the steps of supplying the electric power to the catalyst from a constant current source, detecting electric potential difference between both ends of the catalyst, performing primary differentiation of the detected electric potential difference, and determining an end point of the treatment based on obtained primary differential value.
摘要翻译： 在气相反应处理装置的处理室中配置的催化剂通过向其供给电力而在高温下被加热的情况下的终点检测方法，并且通过在高温下加热的催化剂裂化反应气体进行处理 温度，包括从恒定电流源向催化剂供电的步骤，检测催化剂两端之间的电位差，进行检测电位差的初步分化，并根据 获得初级差分值。
-
公开(公告)号：US20070048200A1
公开(公告)日：2007-03-01
申请号：US11511862
申请日：2006-08-29
IPC分类号： B01J19/08
摘要： A gas phase reaction processing device 25 comprising a processing chamber 14 into which reactive gas is introduced, substrate material 3 to be processed which is disposed within the processing chamber 14, a catalytic body 9 for decomposing the reactive gas introduced into the processing chamber 14, an electric power unit 10 for supplying power to the catalytic body 9, and an electrode structure 15 containing the catalytic body 9, the gas phase reaction processing device being characterized in that the electrode structure 15 is provided with a plurality of catalytic bodies 9 which are arranged substantially parallel with one another, a first group of terminals 7 and a second group of terminals 8 which are disposed opposite to sandwich this catalytic body 9 therebetween, wherein the first group of terminals 7 supports one end of the catalytic body 9 and the second group of terminals 8 supports the other end of the catalytic body 9 respectively, and a terminal block 6 adapted to support and electrically insulate the first and second groups of terminals 7 and 8.
摘要翻译： 一种气相反应处理装置25，包括被加入反应气体的处理室14，设置在处理室14内的待处理基板3，用于分解引入到处理室14中的反应气体的催化体9， 用于向催化剂体9供电的电力单元10和包含催化剂体9的电极结构15，气相反应处理装置的特征在于，电极结构15设置有多个催化体9， 彼此基本平行地布置，第一组端子7和第二组端子8，其相对地设置在其间夹着该催化剂体9，其中第一组端子7支撑催化体9的一端，第二组端子 端子组8分别支撑催化剂体9的另一端，以及适于支撑催化体9的端子块6 并且使第一和第二组端子7和8电绝缘。
-
-
-
-
搜索结果
5 条记录 (耗时 0.022 秒)