公开(公告)号：US20090246402A1

公开(公告)日：2009-10-01

申请号：US12382803

申请日：2009-03-24

申请人： Hiroshi Mataki ,  Hirotaka Watano ,  Seiichi Inoue

发明人： Hiroshi Mataki ,  Hirotaka Watano ,  Seiichi Inoue

IPC分类号： C23C14/02 ,  C23C16/54

CPC分类号： G01T1/244 ,  G01T1/246

摘要： A layer-forming apparatus coats a solution containing a layer component and a flammable solvent on a surface of a base material, and forms a layer on the surface of the base material. In the layer-forming apparatus, a coating chamber in which the solution is coated on the surface of the base material is closed substantially hermetically, and a clean air is supplied from a clean-air supplier to the coating chamber. Then, ions that are produced by a corona discharger are sprayed to the surface of the base material in a state that a vapor concentration of the solvent in the coating chamber is below a burning lower limit, and dusts are removed from the base material. Then, the solution is coated on the surface of the base material from which the dusts are removed.

摘要翻译： 层形成装置在基材的表面上涂布含有层成分和易燃溶剂的溶液，并在基材的表面上形成层。 在层形成装置中，在基材的表面上涂布有溶液的涂布室基本上密封地封闭，并且清洁空气从清洁空气供给器供给到涂布室。 然后，将电晕放电器产生的离子在涂布室中的溶剂的蒸气浓度低于燃烧下限的状态下喷射到基材的表面，并且从基材除去灰尘。 然后，将溶液涂布在去除灰尘的基材的表面上。

公开(公告)号：US08263189B2

公开(公告)日：2012-09-11

申请号：US12382803

申请日：2009-03-24

申请人： Hiroshi Mataki ,  Hirotaka Watano ,  Seiichi Inoue

发明人： Hiroshi Mataki ,  Hirotaka Watano ,  Seiichi Inoue

IPC分类号： C23C14/02

CPC分类号： G01T1/244 ,  G01T1/246

摘要： A layer-forming apparatus coats a solution containing a layer component and a flammable solvent on a surface of a base material, and forms a layer on the surface of the base material. In the layer-forming apparatus, a coating chamber in which the solution is coated on the surface of the base material is closed substantially hermetically, and a clean air is supplied from a clean-air supplier to the coating chamber. Then, ions that are produced by a corona discharger are sprayed to the surface of the base material in a state that a vapor concentration of the solvent in the coating chamber is below a burning lower limit, and dusts are removed from the base material. Then, the solution is coated on the surface of the base material from which the dusts are removed.

摘要翻译： 层形成装置在基材的表面上涂布含有层成分和易燃溶剂的溶液，并在基材的表面上形成层。 在层形成装置中，在基材的表面上涂布有溶液的涂布室基本上密封地封闭，并且清洁空气从清洁空气供给器供给到涂布室。 然后，将电晕放电器产生的离子在涂布室中的溶剂的蒸气浓度低于燃烧下限的状态下喷射到基材的表面，并且从基材除去灰尘。 然后，将溶液涂布在去除灰尘的基材的表面上。

公开(公告)号：US08133536B2

公开(公告)日：2012-03-13

申请号：US12382975

申请日：2009-03-27

申请人： Hiroshi Mataki ,  Hirotaka Watano ,  Seiichi Inoue

发明人： Hiroshi Mataki ,  Hirotaka Watano ,  Seiichi Inoue

IPC分类号： B05D5/00 ,  B05C11/10

CPC分类号： B41J2/2132

摘要： The liquid coating method includes the step of ejecting droplets from nozzles of a recording head onto an imaging region of a surface of a substrate placed on a support plate, wherein a dot pitch φ that is an interval between landing positions of the droplets on the surface of the substrate satisfies a following condition: ϕ ≤ 2 ⁢ 3 ⁢ V ⁡ ( 1 + cos ⁢ ⁢ θ a ) ⁢ sin ⁢ ⁢ θ a π ⁡ ( 1 - cos ⁢ ⁢ θ a ) ⁢ ( 2 + cos ⁢ ⁢ θ a ) 3 where V stands for a volume of a droplet ejected from each of the nozzles and θa stands for an advancing contact angle of the droplet against the substrate.

摘要翻译： 液体涂布方法包括将液滴从记录头的喷嘴喷射到放置在支撑板上的基板的表面的成像区域上的步骤，其中点间距＆ 即衬底表面上的液滴的着陆位置之间的间隔满足以下条件：＆phis; ≤2 3 V⁡（1 + cos⁢⁢as as; a sin sin） 一个 ⁡（1-cos-⁢⁢as as as;; a a a a a a;;;; where where where where where where where where where where where where where where where where the the the the the the the the;;;; 液滴抵靠基板。

公开(公告)号：US20090244144A1

公开(公告)日：2009-10-01

申请号：US12382975

申请日：2009-03-27

申请人： Hiroshi Mataki ,  Hirotaka Watano ,  Seiichi Inoue

发明人： Hiroshi Mataki ,  Hirotaka Watano ,  Seiichi Inoue

IPC分类号： B41J29/38 ,  B05D5/00 ,  B41J2/135

CPC分类号： B41J2/2132

摘要： The liquid coating method includes the step of ejecting droplets from nozzles of a recording head onto an imaging region of a surface of a substrate placed on a support plate, wherein a dot pitch φ that is an interval between landing positions of the droplets on the surface of the substrate satisfies a following condition: φ ≤ 2  3  V  ( 1 + cos   θ a )  sin   θ a π  ( 1 - cos   θ a )  ( 2 + cos   θ a ) 3 where V stands for a volume of a droplet ejected from each of the nozzles and θa stands for an advancing contact angle of the droplet against the substrate.

公开(公告)号：US08778227B2

公开(公告)日：2014-07-15

申请号：US13442750

申请日：2012-04-09

申请人： Hiroshi Mataki ,  Toshimi Fukui

发明人： Hiroshi Mataki ,  Toshimi Fukui

IPC分类号： H01B1/08 ,  C09K11/02 ,  H01S3/00 ,  C08J5/00 ,  C09K11/77 ,  C07F5/00 ,  C08K3/22 ,  G02B1/04 ,  H01L33/50

CPC分类号： C07F5/003 ,  C08J5/00 ,  C08K3/22 ,  C09K11/02 ,  C09K11/7706 ,  C09K11/7721 ,  C09K11/7734 ,  C09K11/7744 ,  C09K11/7749 ,  G02B1/04 ,  H01L33/502 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention provides an organic/inorganic composite containing an inorganic phase dispersed in an organic polymer, the inorganic phase comprises one or more metal atoms that are coordinated to at least one rare earth metal atom via oxygen. The composite contains at least 5 mass % of rare earth metal. This rare earth metal is dispersed in the inorganic phase.

摘要翻译： 本发明提供了一种含有分散在有机聚合物中的无机相的有机/无机复合物，无机相包含一个或多个通过氧与至少一个稀土金属原子配位的金属原子。 该复合材料含有至少5质量％的稀土金属。 这种稀土金属分散在无机相中。

公开(公告)号：US07618128B2

公开(公告)日：2009-11-17

申请号：US11190943

申请日：2005-07-28

申请人： Hiroshi Mataki

发明人： Hiroshi Mataki

IPC分类号： B41J2/045

CPC分类号： B41J2/04543 ,  B41J2/04581 ,  B41J2/04588 ,  B41J2/14233 ,  B41J2002/14459 ,  B41J2202/11 ,  B41J2202/20 ,  B41J2202/21

摘要： The liquid ejection head comprises: a nozzle through which liquid is ejected; a pressure chamber which stores the liquid ejected through the nozzle; a pressurizing device which changes a volume of the pressure chamber to apply pressure to the liquid stored in the pressure chamber; and a supply port through which the liquid is supplied to the pressure chamber, wherein the liquid ejection head has a structure such that inertance Mn of the nozzle, liquid resistance Rn of the nozzle, compliance Cn caused by a surface tension of the liquid in the nozzle, inertance Ms of the supply port, and liquid resistance Rn of the supply port satisfy the following inequality: 4 · ( Mn + Ms ) Cn ≤ ( Rn + Rs ) 2 , so that oscillation of a meniscus surface located in vicinity of the nozzle is controlled at a time of refill when the liquid is filled in the pressure chamber through the supply port after the liquid is ejected from the nozzle.

摘要翻译： 液体喷射头包括喷射液体的喷嘴; 压力室，储存通过喷嘴喷出的液体; 加压装置，其改变所述压力室的容积以对存储在所述压力室中的液体施加压力; 以及供给口，通过该供给口将液体供给到压力室，其中，液体喷射头具有这样的结构，使得喷嘴的惯性Mn，喷嘴的液体电阻Rn，柔顺度Cn由液体的表面张力引起 喷嘴，供给口的惯量Ms和供给口的液体电阻Rn满足以下不等式：4。 （Mn + Ms）Cn（Rn + Rs）2，使得当液体在液体被填充到压力室中之后，在液体被填充在压力室中之后，位于喷嘴附近的弯液面的振荡被控制在补充时 从喷嘴喷出。

公开(公告)号：US07614711B2

公开(公告)日：2009-11-10

申请号：US11489503

申请日：2006-07-20

申请人： Hiroshi Mataki

发明人： Hiroshi Mataki

IPC分类号： B41J29/38 ,  B41J2/045

CPC分类号： B41J2/14233 ,  B41J2002/14459 ,  B41J2202/21

摘要： A liquid droplet ejection apparatus comprises: a nozzle from which a liquid droplet is ejected; a pressure chamber filled with liquid to which a pressure is applied in order to eject the liquid in a form of the liquid droplet from the nozzle; and a supply port which supplies the liquid to the pressure chamber, wherein inertance Mn of the nozzle, resistance Rn of the nozzle, compliance Cn of a nozzle section due to surface tension, inertance Ms of the supply port, and resistance Rs of the supply port satisfy the following two formulas: 1 Mn + Ms ⁢ Mn + Ms Cn - ( Rn + Rs ) 2 4 > π ⁢ ⁢ f - Rn + Rs 2 ⁢ ( Mn + Ms ) × 1 f

摘要翻译： 液滴喷射装置包括：喷射液滴的喷嘴; 填充有施加压力的液体的压力室，以便从喷嘴喷出液滴形式的液体; 以及将液体供给到压力室的供给口，其中喷嘴的惯量Mn，喷嘴的电阻Rn，由于表面张力引起的喷嘴部的柔量Cn，供给口的惯性Ms和供给的电阻Rs 端口满足以下两个公式：1 Mn + Ms Mn + Ms Cn - （Rn + Rs）2 4> piüf-Rn + Rs 2（Mn + Ms）x 1 f log⁢0.01。

公开(公告)号：US20060221106A1

公开(公告)日：2006-10-05

申请号：US11392818

申请日：2006-03-30

申请人： Hiroshi Mataki

发明人： Hiroshi Mataki

IPC分类号： B41J29/38

CPC分类号： B41J29/38 ,  B41J2/04581 ,  B41J2/04588

摘要： The liquid ejection apparatus comprises: a nozzle which ejects liquid; a pressure chamber which is connected to the nozzle and filled with the liquid to be ejected from the nozzle; an actuator which causes the liquid to be ejected from the nozzle by applying a pressure change to the liquid inside the pressure chamber, by changing volume of the pressure chamber; and a drive signal generating device which generates a drive signal for driving the actuator, wherein the drive signal includes: a first pull drive waveform component which drives the actuator to increase the volume of the pressure chamber; a push drive waveform component which drives the actuator to reduce the volume of the pressure chamber by a first volume change amount after the first pull drive waveform component, so as to push out a column of the liquid from the nozzle; and a second pull drive waveform component which drives the actuator to again increase the volume of the pressure chamber by a second volume change amount after the push drive waveform component, so as to sever the column of the liquid, an absolute value of the second volume change amount being not less than an absolute value of the first volume change amount.

摘要翻译： 液体喷射装置包括：喷射液体的喷嘴; 压力室，其连接到喷嘴并填充有从喷嘴喷出的液体; 致动器，其通过改变压力室的容积而使得通过对压力室内的液体施加压力变化而从喷嘴喷出液体; 以及驱动信号发生装置，其产生用于驱动所述致动器的驱动信号，其中所述驱动信号包括：驱动所述致动器以增加所述压力室的容积的第一拉动驱动波形成分; 推动驱动波形分量，其驱动致动器以在第一拉动驱动波形分量之后减小压力室的体积第一体积变化量，以便从喷嘴推出液体柱; 以及第二拉动驱动波形分量，其驱动所述致动器，以在所述推动驱动波形分量之后再次将所述压力室的体积增加第二体积变化量，从而切断所述液体的列，所述第二体积的绝对值 变化量不小于第一容量变化量的绝对值。

公开(公告)号：US20050179736A1

公开(公告)日：2005-08-18

申请号：US11060776

申请日：2005-02-18

申请人： Hiroshi Mataki

发明人： Hiroshi Mataki

IPC分类号： B41J2/045 ,  B41J29/393

CPC分类号： B41J2/14233 ,  B41J2/0451 ,  B41J2/04526 ,  B41J2/04555 ,  B41J2/04563 ,  B41J2/0458 ,  B41J2/04581 ,  B41J2002/14354 ,  B41J2002/14459 ,  B41J2202/16 ,  B41J2202/20 ,  B41J2202/21

摘要： The liquid ejection device comprises: an ejection head including a plurality of nozzles which eject droplets of liquid onto an ejection receiving medium; a liquid flow speed determining device which determines a flow speed of the liquid in each of the nozzles, the liquid flow speed determining device being arranged in each of the nozzles; an ejection abnormality detecting device which detects an ejection abnormality in each of the nozzles according to the flow speed of the liquid determined by the liquid flow speed determining device; an ejection direction deflecting device which deflects a direction of ejection of a droplet of the liquid ejected from each of the nozzles, the ejection direction deflecting device being arranged in each of the nozzles; and an ejection compensation control device which performs control in such a manner that, when an abnormal one of the nozzles having an ejection abnormality is detected by the ejection abnormality detecting device, a compensatory ejection is performed by deflecting a direction of ejection of a droplet of the liquid ejected from one of the nozzles adjacent to the abnormal nozzle, by means of the ejection direction deflecting device.

摘要翻译： 液体喷射装置包括：喷射头，其包括喷射液滴到喷射接收介质上的多个喷嘴; 液体流速确定装置，其确定每个喷嘴中的液体的流速;液体流速确定装置布置在每个喷嘴中; 喷射异常检测装置，根据由液体流速确定装置确定的液体的流速检测每个喷嘴中的喷射异常; 喷射方向偏转装置，其使从每个喷嘴喷出的液体的液滴的喷射方向偏转，喷射方向偏转装置布置在每个喷嘴中; 以及喷射补偿控制装置，其以这样的方式进行控制，即当由喷射异常检测装置检测到具有喷射异常的喷嘴中的异常一个喷嘴时，通过使喷射异常检测装置的液滴的喷射方向偏转 通过喷射方向偏转装置从与异常喷嘴相邻的喷嘴之一喷射的液体。

公开(公告)号：US5471494A

公开(公告)日：1995-11-28

申请号：US254079

申请日：1994-06-06

申请人： Hiroshi Mataki ,  Satoshi Uchida ,  Hajime Sakiyama

发明人： Hiroshi Mataki ,  Satoshi Uchida ,  Hajime Sakiyama

IPC分类号： H01L33/00 ,  H01S5/065 ,  H01S5/10 ,  H01S5/343 ,  H01S3/18

CPC分类号： H01S5/10 ,  B82Y20/00 ,  H01S5/0658 ,  H01S5/3432

摘要： A method for selecting a semiconductor laser is provided which contributes to improved productivity of a highly reliable semiconductor laser of prolonged lifetime, and which includes the steps of: (a) measuring highest peak intensity, Ia, and next highest peak intensity, Ib, of an interference fringes pattern of laser radiation of each semiconductor laser using an interferometer to find a damping ratio of visibility of the interference fringes pattern, .gamma.=Ib/Ia; and (b) selecting a semiconductor exhibiting self-pulsation by selecting a semiconductor laser which emits laser radiation whose damping ratio of visibility, .gamma., is 0.5 or less.

摘要翻译： 提供一种用于选择半导体激光器的方法，其有助于提高长寿命的高度可靠的半导体激光器的生产率，并且其包括以下步骤：（a）测量最高峰值强度Ia和下一个最高峰值强度Ib 使用干涉仪的每个半导体激光器的激光辐射的干涉条纹图案来找出干涉条纹图案的可见度的阻尼比，γ= Ib / Ia; 以及（b）通过选择发出其可见度的阻尼比（gamma）为0.5以下的激光辐射的半导体激光器来选择呈现自脉动的半导体。