公开(公告)号：US5404018A

公开(公告)日：1995-04-04

申请号：US843172

申请日：1992-02-28

申请人： Hiroshi Yasuda ,  Yoshihisa Oae ,  Akio Yamada ,  Nobuyuki Yasutake ,  Hisayasu Nishino

发明人： Hiroshi Yasuda ,  Yoshihisa Oae ,  Akio Yamada ,  Nobuyuki Yasutake ,  Hisayasu Nishino

IPC分类号： G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01L21/30 ,  H01J3/26

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30483 ,  H01J2237/31764

摘要： A charged particle beam exposure apparatus employs a main deflector made of electromagnetic coils and a subdeflector made of electrostatic deflection electrodes. An exposure method used for this apparatus is capable of shortening a wait time of the main deflector. The main deflector deflects a charged particle beam in a direction X, while the subdeflector deflects the beam around the deflecting position of the main deflector to expose an object to the beam. An area to be exposed on the object is divided into thin subfields such that the width, in an X-axis direction of each subfield, is approximately 1/3 the length in a Y-axis direction of the same.

摘要翻译： 带电粒子束曝光装置采用由电磁线圈制成的主偏转器和由静电偏转电极制成的子偏转器。 用于该装置的曝光方法能够缩短主导流板的等待时间。 主偏转器使方向X上的带电粒子束偏转，而子偏转器将光束偏转在主偏转器的偏转位置附近，以将物体暴露于光束。 要曝光在物体上的区域被划分为薄的子场，使得每个子场的X轴方向上的宽度大约为其Y轴方向上的长度的1/3。

公开(公告)号：US5223719A

公开(公告)日：1993-06-29

申请号：US724338

申请日：1991-07-05

申请人： Yasushi Takahashi ,  Kiichi Sakamoto ,  Yoshihisa Oae ,  Hiroshi Yasuda ,  Nobuyuki Yasutake

发明人： Yasushi Takahashi ,  Kiichi Sakamoto ,  Yoshihisa Oae ,  Hiroshi Yasuda ,  Nobuyuki Yasutake

IPC分类号： H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31761 ,  H01J2237/31776

摘要： A charged particle beam mask and apparatus and method of using the same employing a mask that includes a substrate and a plurality of substantially rectangular beam passing sections arranged in parallel and to have a trapezoidal shape. In addition, the masks having a matrix of irradiation areas formed thereon where each irradiation area has a matrix of block patterns, are aligned and selectively irradiated to form a desired pattern on an object.

摘要翻译： 一种带电粒子束掩模及其采用掩模的装置及方法，该掩模包括基板和平行排列并具有梯形形状的多个大致矩形的光束通过部分。 此外，在其上形成有照射区域具有块图案的矩阵的照射区域的矩阵的掩模被对准并选择性地照射以在物体上形成期望的图案。

公开(公告)号：US5368613A

公开(公告)日：1994-11-29

申请号：US947963

申请日：1992-09-21

申请人： Nobuyuki Yasutake ,  Akio Yamada

发明人： Nobuyuki Yasutake ,  Akio Yamada

IPC分类号： H01L21/027 ,  H01J37/147 ,  H01J37/153 ,  B21F41/00

CPC分类号： H01J37/1475 ,  H01J37/153 ,  Y10S430/143 ,  Y10T29/41

摘要： An electron beam exposure apparatus comprises an electron beam source, a holder for supporting a semiconductor substrate, a beam patterning part for patterning the electron beam, a beam focusing system for focusing the patterned electron beam on the semiconductor substrate, and a beam deflector system for deflecting the focused electron beam. The beam deflector comprises at least first, second and third coil assemblies connected in series for producing first through third magnetic fields respectively such that the first through third magnetic fields extend generally perpendicularly to the beam path of the electron beam at respective vertical levels on the beam path. The beam deflection means further comprises fourth and fifth coil assemblies for producing fourth and fifth magnetic fields respectively wherein the fourth coil assembly is disposed such that the fourth magnetic field extends generally parallel to the second magnetic field for correcting the second magnetic field and the fifth coil means is disposed such that the fifth magnetic field extends generally parallel to the third magnetic field for correcting the third magnetic field. Further, the electron beam exposing apparatus includes a driving system for energizing the beam deflector by driving the fourth and fifth coil assemblies independently from the first through third coils, so that the electron beam is deflected by a desired deflection angle and hits the semiconductor substrate substantially vertically at a desired location without the coma aberration.

摘要翻译： 电子束曝光装置包括电子束源，用于支撑半导体衬底的保持器，用于图案化电子束的光束图案形成部分，用于将图案化电子束聚焦在半导体衬底上的束聚焦系统，以及用于 偏转聚焦电子束。 光束偏转器包括至少串联连接的第一，第二和第三线圈组件，用于分别产生第一至第三磁场，使得第一至第三磁场大致垂直于电子束的光束路径在波束的相应垂直电平处延伸 路径。 光束偏转装置还包括用于产生第四和第五磁场的第四和第五线圈组件，其中第四线圈组件设置成使得第四磁场大致平行于第二磁场延伸，用于校正第二磁场和第五线圈 装置被布置成使得第五磁场大致平行于第三磁场延伸，用于校正第三磁场。 此外，电子束曝光装置包括用于通过独立于第一至第三线圈驱动第四和第五线圈组件来激励光束偏转器的驱动系统，使得电子束被偏转所需的偏转角并基本上撞击半导体衬底 垂直于所需位置而没有昏迷。

公开(公告)号：US5981118A

公开(公告)日：1999-11-09

申请号：US42747

申请日：1998-03-17

申请人： Nobuyuki Yasutake ,  Yoshihisa Ooae ,  Kazushi Ishida ,  Hiroshi Yasuda ,  Akiyoshi Tsuda ,  Hitoshi Tanaka

发明人： Nobuyuki Yasutake ,  Yoshihisa Ooae ,  Kazushi Ishida ,  Hiroshi Yasuda ,  Akiyoshi Tsuda ,  Hitoshi Tanaka

IPC分类号： G03F7/20 ,  H01J37/317 ,  G03F9/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/2037 ,  G03F7/2065 ,  H01J37/3174 ,  H01J2237/31774

摘要： With using one scanning stage 19 where a plurality of wafers 16A to 16E is mounted through wafer holders 20A to 20E and balancing stage 21 disposed below scanning stage 19, scanning stage 19 is scanned based on exposure data common to a plurality of charged particle beam exposure apparatus 10A to 10E, and balancing stage 21 is scanned so that barycenter G of scanning stage 19 and balancing stage 21 becomes a fixed point. The positions of reflecting mirrors 70L and 70R secured to stage 19 are measured and based on their values, the expansion/contraction ratio of stage 19 and the positions of samples 16A to 16E are calculated to obtain deviation of the positions from target positions. Stage 19 is modeled such that rigid areas 19A to 19E are loosely connected, and for each area, the positions of three points are measured to calculate deviation of the exposure target position due to rotation of each ridged area. These deviations are corrected by deflectors 18A to 18D.

摘要翻译： 通过使用一个扫描台19，其中通过设置在扫描台19下方的晶片保持器20A至20E和平衡台21安装多个晶片16A至16E，基于多个带电粒子束曝光共同的曝光数据扫描扫描台19 扫描装置10A至10E以及平衡级21，使得扫描级19和平衡级21的重心G成为固定点。 测量固定在工作台19上的反射镜70L和70R的位置，并且基于它们的值，计算级19的伸缩比和样品16A至16E的位置以获得位置与目标位置的偏差。 阶段19被建模为刚性区域19A至19E松散地连接，并且对于每个区域，测量三个点的位置以计算由于每个脊状区域的旋转引起的曝光目标位置的偏差。 这些偏差由偏转器18A至18D校正。

公开(公告)号：US6046459A

公开(公告)日：2000-04-04

申请号：US401943

申请日：1999-09-23

申请人： Nobuyuki Yasutake ,  Yoshihisa Ooae ,  Kazushi Ishida ,  Hiroshi Yasuda ,  Akiyoshi Tsuda ,  Hitoshi Tanaka

发明人： Nobuyuki Yasutake ,  Yoshihisa Ooae ,  Kazushi Ishida ,  Hiroshi Yasuda ,  Akiyoshi Tsuda ,  Hitoshi Tanaka

IPC分类号： G03F7/20 ,  H01J37/317 ,  H01J37/20

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/2037 ,  G03F7/2065 ,  H01J37/3174 ,  H01J2237/31774

摘要： With using one scanning stage 19 where a plurality of wafers 16A to 16E is mounted through wafer holders 20A to 20E and balancing stage 21 disposed below scanning stage 19, scanning stage 19 is scanned based on exposure data common to a plurality of charged particle beam exposure apparatus 10A to 10E, and balancing stage 21 is scanned so that barycenter G of scanning stage 19 and balancing stage 21 becomes a fixed point. The positions of reflecting mirrors 70L and 70R secured to stage 19 are measured and based on their values, the expansion/contraction ratio of stage 19 and the positions of samples 16A to 16E are calculated to obtain deviation of the positions from target positions. Stage 19 is modeled such that rigid areas 19A to 19E are loosely connected, and for each area, the positions of three points are measured to calculate deviation of the exposure target position due to rotation of each ridged area. These deviations are corrected by deflectors 18A to 18D.

摘要翻译： 通过使用一个扫描台19，其中通过设置在扫描台19下方的晶片保持器20A至20E和平衡台21安装多个晶片16A至16E，基于多个带电粒子束曝光共同的曝光数据扫描扫描台19 扫描装置10A至10E以及平衡级21，使得扫描级19和平衡级21的重心G成为固定点。 测量固定在工作台19上的反射镜70L和70R的位置，并且基于它们的值，计算级19的伸缩比和样品16A至16E的位置以获得位置与目标位置的偏差。 阶段19被建模为刚性区域19A至19E松散地连接，并且对于每个区域，测量三个点的位置以计算由于每个脊状区域的旋转引起的曝光目标位置的偏差。 这些偏差由偏转器18A至18D校正。

公开(公告)号：US4853870A

公开(公告)日：1989-08-01

申请号：US54782

申请日：1987-05-27

申请人： Nobuyuki Yasutake ,  Jun-ichi Kai ,  Hiroshi Yasuda ,  Kenichi Kawashima

发明人： Nobuyuki Yasutake ,  Jun-ichi Kai ,  Hiroshi Yasuda ,  Kenichi Kawashima

IPC分类号： H01J37/147 ,  G05B15/02 ,  H01J37/304 ,  H01J37/317 ,  H01L21/027 ,  H01L21/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/15 ,  H01J2237/30455 ,  H01J2237/31766

摘要： In an electron beam exposure system controlled by a computer, the system includes: an electron optical device for generating electron beams and irradiating the beams to a sample on a stage through a plurality of electron lens, a main deflection coil, and sub deflection electrodes, to form predetermined circuit patterns on the sample. The system also includes a position control device controlling the driving of the stage based on a stage position coordinate designated by the computer, detecting an actual stage position coordinate, and calculating an error value between the designated stage position coordinate and the actual stage position coordinate, the error value being divided into two components of an upper bits portion having an relatively large error value and a lower bits portion having a relatively small error value, and a deflection control device controlling the direction of the electron beams based on the main pattern data corrected by the upper bits portion and the sub pattern data corrected by the lower bits portion, and based on selected main and sub wait times determined by exposure and non-exposure timings.

摘要翻译： 在由计算机控制的电子束曝光系统中，该系统包括：用于产生电子束并通过多个电子透镜，主偏转线圈和副偏转电极将光束照射到载物台上的样品的电子光学装置， 以在样品上形成预定的电路图案。 该系统还包括：基于由计算机指定的舞台位置坐标来控制舞台的驾驶的位置控制装置，检测实际舞台位置坐标，以及计算指定舞台位置坐标与实际舞台位置坐标之间的误差值， 误差值被分成具有相对较大误差值的较高位部分和具有相对较小误差值的较低位部分的两个分量，以及基于校正的主图案数据控制电子束方向的偏转控制装置 通过由较低位部分校正的较高比特部分和子图形数据，并且基于由曝光和非曝光定时确定的选择的主等待时间和次等待时间。

公开(公告)号：US4607333A

公开(公告)日：1986-08-19

申请号：US566322

申请日：1983-12-28

申请人： Nobuyuki Yasutake ,  Hiroshi Yasuda

发明人： Nobuyuki Yasutake ,  Hiroshi Yasuda

IPC分类号： H01L21/027 ,  H01J37/147 ,  H01L21/30 ,  G06F15/46 ,  H01J37/304

CPC分类号： H01J37/1477 ,  H01L21/30

摘要： An electron beam exposure apparatus includes an electromagnetic-type deflector for deflecting an electron beam in accordance with an analog signal corresponding to a digital signal which specifies an exposure region of a sample and an electrostatic-type deflector for deflecting the electron beam to a desired position in the exposure region. A difference signal representing the difference between the analog signal and a reference analog signal corresponding to the digital signal is taken out for compensating the amount of deflection of the electron beam in the electrostatic-type deflector.

摘要翻译： 电子束曝光装置包括电磁型偏转器，用于根据对应于指定样本的曝光区域的数字信号的模拟信号和用于将电子束偏转到期望位置的静电型偏转器来偏转电子束 在曝光区域。 取出表示对应于数字信号的模拟信号和参考模拟信号之间的差异的差分信号，以补偿静电型偏转器中的电子束的偏转量。

公开(公告)号：US5208560A

公开(公告)日：1993-05-04

申请号：US930449

申请日：1992-08-19

申请人： Nobuyuki Yasutake

发明人： Nobuyuki Yasutake

IPC分类号： H01J37/24

CPC分类号： H01J37/24 ,  H01J2237/151 ,  H01J2237/3175

摘要： A signal transmission circuit including a signal line through which the signal is transmitted from a signal source element to a signal receiving element, a grounding line arranged along the length of the signal line, and a high impedance element connected between the grounding line and the ground.

摘要翻译： 一种信号传输电路，包括信号从信号源元件发送到信号接收元件的信号线，沿着信号线的长度布置的接地线以及连接在接地线和接地之间的高阻抗元件 。

公开(公告)号：US4651033A

公开(公告)日：1987-03-17

申请号：US574725

申请日：1984-01-27

申请人： Nobuyuki Yasutake ,  Toshitaka Tsuda

发明人： Nobuyuki Yasutake ,  Toshitaka Tsuda

IPC分类号： H03K17/0412 ,  H03K17/14 ,  H03K17/60 ,  H03K17/30

CPC分类号： H03K17/14 ,  H03K17/04126 ,  H03K17/603

摘要： A differential switching circuit includes a first current switching circuit having a first input terminal; a second current switching circuit having a second input terminal and a threshold different from that of the first circuit; and a constant current source commonly connected to the first and second circuits. Complementary input signals are applied to the first and second input terminals.

摘要翻译： 差分开关电路包括具有第一输入端的第一电流开关电路; 第二电流开关电路，具有与第一电路不同的第二输入端和阈值; 以及通常连接到第一和第二电路的恒流源。 互补输入信号被施加到第一和第二输入端子。

公开(公告)号：US5917360A

公开(公告)日：1999-06-29

申请号：US745209

申请日：1996-11-08

申请人： Nobuyuki Yasutake

发明人： Nobuyuki Yasutake

IPC分类号： H03M1/74 ,  H03K17/041 ,  H03K17/60 ,  H03K17/687 ,  H03K19/018 ,  H03K19/0952 ,  H03M5/04 ,  H03K17/16

CPC分类号： H03M5/04 ,  H03K17/04106 ,  H03K17/04113

摘要： When a pair of emitter-coupled transistor switches 22A and 22B are switched over, the D flipflop 26A shifts the base potential of a transistor buffer circuit 24 to reduce a potential fluctuation at a constant current source 21, reducing a current oscillation caused by the transient response of the constant current source 21 in which feedback control is performed by a comparator 214. In another construction, a potential oscillation waveform of the connected emitter node is stored in a RAM and the waveform read out of the RAM is added to the base of the transistor buffer circuit to reduce the current oscillation.

摘要翻译： 当一对发射极耦合晶体管开关22A和22B被切换时，D触发器26A移动晶体管缓冲电路24的基极电位以减小恒定电流源21处的电位波动，从而减少由瞬变引起的电流振荡 反馈控制由比较器214执行的恒流源21的响应。在另一种结构中，连接的发射极节点的电位振荡波形被存储在RAM中，并且从RAM中读出的波形被添加到 晶体管缓冲电路减少电流振荡。