公开(公告)号：US07902504B2

公开(公告)日：2011-03-08

申请号：US12285673

申请日：2008-10-10

申请人： Hirotami Koike ,  Shinichi Okada

发明人： Hirotami Koike ,  Shinichi Okada

IPC分类号： H01J3/16 ,  H01J37/12 ,  H01J37/26

CPC分类号： H01J37/153 ,  H01J37/26 ,  H01J37/28 ,  H01J49/067 ,  H01J2237/1534

摘要： A charged particle beam reflector device is configured to include at least two electrostatic mirrors arranged with a predetermined interval on a linear optical axis, each having a through hole through which a charged particle beam radiated from an electron gun along a linear optical axis passes, and having a function of reflecting the charged particle beam or allowing the charged particle beam to pass through the through hole in accordance with an applied voltage, and a controller controlling an applied voltage to the at least two electrostatic mirrors. The controller applies, to each of the electrostatic mirrors, a reflection voltage allowing the electrostatic mirrors to reflect the charged particle beam at a predetermined timing so that the charged particle beam from the electron gun is reflected by the at least two electrostatic mirrors a plurality of times.

摘要翻译： 带电粒子束反射器装置被配置为包括在线性光轴上以预定间隔布置的至少两个静电镜，每个具有通孔，沿着线性光轴从电子枪辐射的带电粒子通过该通孔，以及 具有反射带电粒子束或使带电粒子束根据施加电压通过通孔的功能，以及控制器对至少两个静电反射镜施加的电压的控制器。 控制器向每个静电反射镜施加反射电压，该反射电压允许静电镜在预定的定时反射带电粒子束，使得来自电子枪的带电粒子束被至少两个静电镜反射，多个 次

公开(公告)号：US20060289757A1

公开(公告)日：2006-12-28

申请号：US11505872

申请日：2006-08-18

申请人： Nobuo Kochi ,  Hirotami Koike ,  Yasuko Tsuruga ,  Shinichi Okada

发明人： Nobuo Kochi ,  Hirotami Koike ,  Yasuko Tsuruga ,  Shinichi Okada

IPC分类号： G21K7/00

CPC分类号： H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2611

摘要： To provide an electron beam system capable of performing three-dimensional measurement of a sample with high precision irrespective of the tilt angle and height of the sample. The electron beam system has a correction factor storing section 32 for storing a correction factor at a reference tilt angle with respect to a plane which is used to tilt a sample by a sample tilting section 5, an approximate coordinate measuring section 28 for obtaining an approximate shape or approximate coordinate values of the sample based on an output corresponding to a stereo image from an electron beam detecting section 4, an image correcting section 30 for correcting the stereo image according to the tilt angle created by the sample tilting section 5 based on the shape or coordinate values of the sample obtained in the approximate coordinate measuring section 28 using a correction factor stored in the correction factor storing section 32, and a precise coordinate measuring section 34 for obtaining a shape or coordinate values of the sample which are more precise than those obtained in the approximate coordinate measuring section 28 based on a corrected stereo image obtained in the image correcting section 30.

公开(公告)号：US5893999A

公开(公告)日：1999-04-13

申请号：US304868

申请日：1994-09-13

申请人： Masaaki Tamatani ,  Hirotami Koike ,  Miwa Okumura ,  Keiko Albessard ,  Naotoshi Matsuda

发明人： Masaaki Tamatani ,  Hirotami Koike ,  Miwa Okumura ,  Keiko Albessard ,  Naotoshi Matsuda

IPC分类号： C09K11/08 ,  C09K11/59 ,  C09K11/67 ,  C09K11/77 ,  G01N33/533 ,  G01N33/543 ,  G01N33/58 ,  C09K11/54 ,  C09K11/55

CPC分类号： G01N33/587 ,  C09K11/0811 ,  C09K11/595 ,  C09K11/673 ,  C09K11/7734 ,  C09K11/7769 ,  C09K11/7771 ,  C09K11/7795 ,  G01N33/533 ,  G01N33/582

摘要： A specific binding material labeled with an ultrafine inorganic phosphor 1 to 100 nm in particle size is disclosed The composition of the ultrafine inorganic phosphor is one of Ln.sub.2 O.sub.3 :Re, Ln.sub.2 O.sub.2 S:Re, ZnO, CaWO.sub.4, MO.xAl.sub.2 O.sub.3 :Eu, Zn.sub.2 SiO.sub.4 :Mn, and LaPO.sub.4 :Ce,Tb, wherein Ln represents at least one element selected from La, Gd, Lu, and Y, Re represents at least one element selected from lanthanide elements, M represents at least one element selected from alkali earth metals, and x represents a value from 0.5 to 15. This ultrafine inorganic phosphor is prepared by one of the following processes a process of evaporation in a gas including an RF thermal plasma process, dc plasma thermal spraying, sputtering, glass crystallization, a sol-gel process, precipitation including hydrothermal synthesis, and a spraying process. An antibody which reacts specifically with an antigen to be measured is labeled with this ultrafine inorganic phosphor and reacted with a specimen, and the unreacted material is removed. The antibody bound to the specimen is detected by quantitatively observing fluorescence emitted by the phosphor.

摘要翻译： 公开了以超细无机荧光体1〜100nm标记的特定结合材料。超细无机荧光体的组成为Ln 2 O 3：Re，Ln 2 O 2 S：Re，ZnO，CaWO 4，MO x Al 2 O 3：Eu，Zn 2 SiO 4：Mn 和LaPO 4：Ce，Tb，其中Ln表示选自La，Gd，Lu和Y中的至少一种元素，Re表示选自镧系元素中的至少一种元素，M表示选自碱土金属的至少一种元素，和 x表示0.5至15的值。该超细无机磷光体通过以下方法之一制备包括RF热等离子体工艺，直流等离子体喷涂，溅射，玻璃结晶，溶胶 - 凝胶法在内的气体中的蒸发过程 ，包括水热合成的沉淀和喷雾过程。 用该超细无机荧光体标记与待测抗原特异性反应的抗体，并与样品反应，除去未反应物质。 通过定量观察由荧光体发出的荧光来检测与样品结合的抗体。

公开(公告)号：US07329867B2

公开(公告)日：2008-02-12

申请号：US11505872

申请日：2006-08-18

申请人： Nobuo Kochi ,  Hirotami Koike ,  Yasuko Tsuruga ,  Shinichi Okada

发明人： Nobuo Kochi ,  Hirotami Koike ,  Yasuko Tsuruga ,  Shinichi Okada

IPC分类号： H01J37/28

CPC分类号： H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2611

摘要： To provide an electron beam system capable of performing three-dimensional measurement of a sample with high precision irrespective of the tilt angle and height of the sample. The electron beam system has a correction factor storing section 32 for storing a correction factor at a reference tilt angle with respect to a plane which is used to tilt a sample by a sample tilting section 5, an approximate coordinate measuring section 28 for obtaining an approximate shape or approximate coordinate values of the sample based on an output corresponding to a stereo image from an electron beam detecting section 4, an image correcting section 30 for correcting the stereo image according to the tilt angle created by the sample tilting section 5 based on the shape or coordinate values of the sample obtained in the approximate coordinate measuring section 28 using a correction factor stored in the correction factor storing section 32, and a precise coordinate measuring section 34 for obtaining a shape or coordinate values of the sample which are more precise than those obtained in the approximate coordinate measuring section 28 based on a corrected stereo image obtained in the image correcting section 30.

摘要翻译： 提供能够以高精度执行样品的三维测量的电子束系统，而与样品的倾斜角度和高度无关。 电子束系统具有校正因子存储部分32，用于存储相对于用于通过样本倾斜部分5倾斜样本的平面的参考倾斜角的校正因子，用于获得近似坐标测量部分28的近似坐标测量部分28 基于与来自电子束检测部分4的立体图像相对应的输出的样本的形状或近似坐标值，用于根据由样本倾斜部分5产生的倾斜角校正立体图像的图像校正部分30 使用存储在校正因子存储部分32中的校正因子在近似坐标测量部分28中获得的样本的形状或坐标值，以及精确坐标测量部分34，用于获得样本的形状或坐标值，其比 基于所获得的校正立体图像在近似坐标测量部分28中获得的那些 在图像校正部30中。

公开(公告)号：US20050279937A1

公开(公告)日：2005-12-22

申请号：US11106707

申请日：2005-04-15

申请人： Hirotami Koike ,  Shinichi Okada

发明人： Hirotami Koike ,  Shinichi Okada

IPC分类号： G01N23/00 ,  G01N23/225

CPC分类号： H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J37/244 ,  H01J37/3174 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449

摘要： To provide a scanning electron microscope that can detect with high efficiency the secondary electrons generated from the entire surface of a target, in a scanning electron microscope with an objective lens having a retarding electric field near a sample, at least two detectors are arranged with axial symmetry to electron optical axis, a target that causes secondary electrons or reflected electrons to collide with the target is disposed near the detectors, and at least one electrode member having a negative potential lower than a potential of the target is formed almost with axial symmetry to the electron optical axis.

摘要翻译： 为了提供能够高效地检测从靶的整个表面产生的二次电子的扫描电子显微镜，在具有在样品附近具有延迟电场的物镜的扫描电子显微镜中，至少两个检测器被轴向地布置 对称于电子光轴，使二次电子或反射电子与靶碰撞的靶设置在检测器附近，并且具有低于目标电位的负电位的至少一个电极部件几乎以轴对称形成 电子光轴。

公开(公告)号：US06852974B2

公开(公告)日：2005-02-08

申请号：US10086625

申请日：2002-03-04

申请人： Nobuo Kochi ,  Hirotami Koike

发明人： Nobuo Kochi ,  Hirotami Koike

IPC分类号： H01J37/26 ,  G01N23/00

CPC分类号： H01J37/26 ,  H01J2237/2611

摘要： An electron beam device according to the present invention is made up of an electron beam source for emitting an electron beam, an electron optical system for irradiating the electron beam onto a specimen, a specimen holder for holding the specimen, a specimen tilting section for producing relative tilt angles between the specimen holder and the electron beam, an electron beam detecting section for detecting electron beam emitted from the specimen, and a data correcting section for correcting the three-dimensional detection data to have specified relationship under the condition of a relative tilt angle between the specimen holder and the electron beam.

公开(公告)号：US07592604B2

公开(公告)日：2009-09-22

申请号：US11637946

申请日：2006-12-13

申请人： Hirotami Koike ,  Shinichi Okada ,  Akira Higuchi ,  Masahiro Inoue ,  Masahiro Yamamoto ,  Sumio Sasaki

发明人： Hirotami Koike ,  Shinichi Okada ,  Akira Higuchi ,  Masahiro Inoue ,  Masahiro Yamamoto ,  Sumio Sasaki

IPC分类号： G01K1/08 ,  H01J3/14 ,  H01J3/16

CPC分类号： H01J37/02 ,  H01J2237/004 ,  H01J2237/31744

摘要： The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 illuminates a specimen 21 with a charged particle beam via a charged particle optical system arranged in a column. According to the present invention, the scanning electron microscope 100 has a charge preventive member 110 disposed between the objective lens 14 and the specimen 21. The charge preventive member 110 has an electrically conductive portion and an opening 113 to transmit the charged particle beam. The charge preventive member 110 is formed so as to partly cover the charged particle optical system when viewed from the charged particle beam irradiation spot on the specimen. In addition, the charge preventive member 110 has gas inflow paths 114 and 115 formed therein. These gas inflow paths have gas injection outlets 116 formed to inject gas toward the charged particle beam irradiation spot on the specimen.

摘要翻译： 本发明提供一种能够防止在不使用大规模设备的情况下对样本进行充电的带电粒子束装置。 扫描电子显微镜100通过配置在列中的带电粒子光学系统用带电粒子束照射样本21。 根据本发明，扫描电子显微镜100具有设置在物镜14和试样21之间的防电荷部件110.电荷阻止部件110具有导电部分和用于透射带电粒子束的开口113。 当从样本上的带电粒子束照射点观察时，电荷抑制部件110形成为部分地覆盖带电粒子光学系统。 此外，电荷阻止部件110具有形成在其中的气体流入路径114和115。 这些气体流入路径具有气体注入口116，其形成为朝向样品上的带电粒子束照射点注入气体。

公开(公告)号：US06642520B2

公开(公告)日：2003-11-04

申请号：US10209718

申请日：2002-08-01

申请人： Kouji Kimura ,  Hirotami Koike

发明人： Kouji Kimura ,  Hirotami Koike

IPC分类号： H01J3726

CPC分类号： H01J37/244 ,  H01J37/28

摘要： A scanning electron microscope comprises: an electron beam source, an electron beam acceleration device for accelerating primary electrons generated by the electron beam source, a deflector 5 for scanning and deflecting the accelerated primary electrons, a magnetic-electrostatic compound objective lens 2, 3 for focusing the scanned and deflected primary electrons onto a specimen 4 mounted on a specimen support, a reflection electron detector 10 for detecting reflection electrons generated from the specimen due to focusing and irradiating the primary electrons onto the specimen 4, a secondary electron detector 20 for detecting secondary electrons generated from the specimen due to focusing and irradiating the primary electrons onto the specimen 4, and an image display device for displaying a specimen image from detection signals from each detector 10, 20. Moreover, there is provided an aperture 17 around an axis for passing an electron beam and secondary electrons around the axis through the reflection electron detector 10. This gives a: scanning electron microscope device which can separate and detect on an electron beam axis, reflection electrons and secondary electrons from a specimen, with a device of a simple construction.

公开(公告)号：US3978338A

公开(公告)日：1976-08-31

申请号：US565628

申请日：1975-04-07

申请人： Katsuyoshi Ueno ,  Hirotami Koike

发明人： Katsuyoshi Ueno ,  Hirotami Koike

IPC分类号： H01J37/141 ,  G01Q20/02 ,  G01Q30/02 ,  H01J37/04 ,  H01J37/28 ,  G21K1/08 ,  G21K7/00

CPC分类号： H01J37/04

摘要： A scanning electron microscope comprising a double gap lens in its electron beam irradiating system. The double gap lens is arranged between the electron gun and the final stage condenser lens, and is excited by a lens current such that a large change of electron beam diameter may be controlled by a small change of lens excitation current.

公开(公告)号：US20080121799A1

公开(公告)日：2008-05-29

申请号：US11932083

申请日：2007-10-31

申请人： Chohei Kanno ,  Hirotami Koike ,  Toru Tojo

发明人： Chohei Kanno ,  Hirotami Koike ,  Toru Tojo

IPC分类号： G21K5/00

CPC分类号： H01J37/28 ,  H01J37/228 ,  H01J2237/047 ,  H01J2237/21 ,  H01J2237/2808 ,  H01J2237/281

摘要： A sample analyzing apparatus includes: an irradiation system which irradiates a charged particle onto a sample having a concave portion partially on a surface thereof; a light condensing reflecting mirror which condenses luminescence obtained from the surface based on the irradiation of the charged particle; a light detector which detects the luminescence guided to the light condensing reflecting mirror; a charged particle detector which detects the charged particle reflected from the surface of the sample as a reflection charged particle; and a signal processor which controls the irradiation system to irradiate the charged particle intermittently, which obtains a shape of the sample on the basis of a detection signal outputted from the charged particle detector, and which identifies a material of the sample on the basis of an attenuation characteristic of a detection signal outputted from the light detector in a period from a time point in which the intermittent irradiation of the charged particle by the irradiation system is ended to a time point in which the intermittent irradiation of the charged particle by the irradiation system is started.

摘要翻译： 样品分析装置包括：照射系统，其将带电粒子照射到其表面上部分地具有凹部的样品上; 聚光反射镜，其基于带电粒子的照射而凝结从表面获得的发光; 光检测器，其检测被引导到聚光反射镜的发光; 检测从样品表面反射的带电粒子作为反射带电粒子的带电粒子检测器; 以及信号处理器，其控制照射系统间歇地照射带电粒子，其基于从带电粒子检测器输出的检测信号获得样本的形状，并且基于以下方式识别样品的材料 在从照射系统的带电粒子的间歇照射的时间点到达照射系统的带电粒子的间歇照射的时间点的期间，从光检测器输出的检测信号的衰减特性 开始了