公开(公告)号：US6160345A

公开(公告)日：2000-12-12

申请号：US979752

申请日：1997-11-26

申请人： Hiroyoshi Tanaka ,  Ryuichi Murai ,  Hideaki Yasui ,  Yoshiki Sasaki ,  Akira Shiokawa ,  Masatoshi Kudoh ,  Koichi Kotera ,  Masaki Aoki ,  Mitsuhiro Ohtani ,  Shigeo Suzuki ,  Kinzou Nonomura

发明人： Hiroyoshi Tanaka ,  Ryuichi Murai ,  Hideaki Yasui ,  Yoshiki Sasaki ,  Akira Shiokawa ,  Masatoshi Kudoh ,  Koichi Kotera ,  Masaki Aoki ,  Mitsuhiro Ohtani ,  Shigeo Suzuki ,  Kinzou Nonomura

IPC分类号： H01J17/49 ,  H01J1/90

CPC分类号： H01J11/12 ,  H01J9/02 ,  H01J11/38

摘要： A PDP does not suffer from dielectric breakdown even though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 .mu.m layer of a metallic oxide on whose surface OH groups exist, such as ZnO, ZrO.sub.2, MgO, TiO.sub.2, Al.sub.2 O.sub.3, and Cr.sub.2 O.sub.3. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is than coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

摘要翻译： 即使电介质层较薄，PDP也不会受到电介质击穿，同时避免了在制造PDP期间在玻璃基板中出现的常规PDP的问题。 为此，PDP的银电极的表面涂覆有其表面存在OH基的金属氧化物如ZnO，ZrO 2，MgO，TiO 2，Al 2 O 3和Cr 2 O 3的0.1-10μm层。 然后用电介质层涂覆金属氧化物层。 优选用CVD法形成金属氧化物层。 金属电极的表面可以涂覆有被涂覆有介电层的金属氧化物。 电介质层可以用真空处理方法或等离子体热喷涂方法由金属氧化物制成。 用CVD法形成在电极上的电介质层非常薄且无瑕疵。 当使用真空处理方法或等离子喷涂方法形成电介质层时，防止了通常由电介质层烘烤引起的翘曲和裂纹。 这里可以使用包含6.5重量％以下的碱的硼硅酸盐玻璃作为玻璃基板。

公开(公告)号：US06761608B2

公开(公告)日：2004-07-13

申请号：US09964837

申请日：2001-09-26

申请人： Hiroyoshi Tanaka ,  Ryuichi Murai ,  Hideaki Yasui ,  Yoshiki Sasaki ,  Akira Shiokawa ,  Masatoshi Kudoh ,  Koichi Kotera ,  Masaki Aoki ,  Mitsuhiro Ohtani ,  Shigeo Suzuki ,  Kinzou Nonomura

发明人： Hiroyoshi Tanaka ,  Ryuichi Murai ,  Hideaki Yasui ,  Yoshiki Sasaki ,  Akira Shiokawa ,  Masatoshi Kudoh ,  Koichi Kotera ,  Masaki Aoki ,  Mitsuhiro Ohtani ,  Shigeo Suzuki ,  Kinzou Nonomura

IPC分类号： H01J926

CPC分类号： H01J11/12 ,  H01J9/02 ,  H01J11/38

摘要： A PDP does not suffer from dielectric breakdown even though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 &mgr;m layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO2, MgO, TiO2, Al2O3, and Cr2O3. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

摘要翻译： 即使电介质层较薄，PDP也不会受到电介质击穿，同时避免了在制造PDP期间在玻璃基板中出现的常规PDP的问题。 为了这样做，PDP的银电极的表面涂覆有0.1-10μm的金属氧化物层，其表面上存在OH基团，例如ZnO，ZrO 2，MgO，TiO 2，Al 2 O 3和Cr 2 O 3。 然后用电介质层涂覆金属氧化物层。 优选用CVD法形成金属氧化物层。 金属电极的表面可以涂覆有金属氧化物，然后涂覆有介电层。 电介质层可以用真空处理方法或等离子体热喷涂方法由金属氧化物制成。 用CVD法形成在电极上的电介质层非常薄且无瑕疵。 当使用真空处理方法或等离子喷涂方法形成电介质层时，防止了通常由电介质层烘烤引起的翘曲和裂纹。 这里可以使用包含6.5重量％以下的碱的硼硅酸盐玻璃作为玻璃基板。

公开(公告)号：US06419540B1

公开(公告)日：2002-07-16

申请号：US09965278

申请日：2001-09-26

申请人： Hiroyoshi Tanaka ,  Ryuichi Murai ,  Hideaki Yasui ,  Yoshiki Sasaki ,  Akira Shiokawa ,  Masatoshi Kudoh ,  Koichi Kotera ,  Masaki Aoki ,  Mitsuhiro Ohtani ,  Shigeo Suzuki ,  Kinzou Nonomura

发明人： Hiroyoshi Tanaka ,  Ryuichi Murai ,  Hideaki Yasui ,  Yoshiki Sasaki ,  Akira Shiokawa ,  Masatoshi Kudoh ,  Koichi Kotera ,  Masaki Aoki ,  Mitsuhiro Ohtani ,  Shigeo Suzuki ,  Kinzou Nonomura

IPC分类号： H01J902

CPC分类号： H01J11/12 ,  H01J9/02 ,  H01J11/38

摘要： A PDP does not suffer from dielectric breakdown though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 &mgr;m layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO2, MgO, TiO2, Al2O3, and Cr2O3. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

摘要翻译： 尽管电介质层较薄，PDP不会遭受电介质击穿，而在PDP的制造过程中出现玻璃基板中的裂纹等常规PDP的问题。 为了这样做，PDP的银电极的表面涂覆有0.1-10μm的金属氧化物层，其表面上存在OH基团，例如ZnO，ZrO 2，MgO，TiO 2，Al 2 O 3和Cr 2 O 3。 然后用电介质层涂覆金属氧化物层。 优选用CVD法形成金属氧化物层。 金属电极的表面可以涂覆有金属氧化物，然后涂覆有介电层。 电介质层可以用真空处理方法或等离子体热喷涂方法由金属氧化物制成。 用CVD法形成在电极上的电介质层非常薄且无瑕疵。 当使用真空处理方法或等离子喷涂方法形成电介质层时，防止了通常由电介质层烘烤引起的翘曲和裂纹。 这里可以使用包含6.5重量％以下的碱的硼硅酸盐玻璃作为玻璃基板。

公开(公告)号：US5684574A

公开(公告)日：1997-11-04

申请号：US550853

申请日：1995-10-31

申请人： Akira Shiokawa ,  Hideaki Yasui ,  Koichi Kotera ,  Yuuji Mukai ,  Hiroyoshi Tanaka ,  Takashi Hirao

发明人： Akira Shiokawa ,  Hideaki Yasui ,  Koichi Kotera ,  Yuuji Mukai ,  Hiroyoshi Tanaka ,  Takashi Hirao

IPC分类号： C23C14/54 ,  G01N21/31 ,  G01B11/06

CPC分类号： G01N21/314 ,  C23C14/544

摘要： A beam emitted from a light source including the characteristic wavelength of flown particles in a film forming system is interrupted by a beam chopper in a predetermined cycle, and is then divided into a probing beam and a reference beam by a beam divider. The probing beam passes through a particle flight area and is then injected into a photo detector through an optical filter, and a probing signal is outputted. A reference signal is obtained from the reference beam in the same manner. A data processor detects the phase and level of both signals, so that an absorbance, i.e., a film forming rate for the flown particles is estimated. The film forming rate is integrated with time so that a film thickness is estimated. Thus, the range of the applicable film forming rate is wide. In addition, it is possible to perform continuous monitoring with high precision also in an atmosphere where a large amount of light having the same wavelength as the characteristic wavelength of the flown particles is generated, as in sputtering systems.

摘要翻译： 从包含成膜系统中的流动粒子的特征波长的光源发射的光束以预定的周期由光束斩波器中断，然后由分束器分割成探测光束和参考光束。 探测光束通过粒子飞行区域，然后通过滤光片注入光电检测器，并输出探测信号。 以相同的方式从参考光束获得参考信号。 数据处理器检测两个信号的相位和电平，从而估计用于飞行粒子的吸光度，即成膜速率。 成膜速度与时间相结合，从而估计膜厚度。 因此，适用的成膜速率的范围很宽。 此外，如在溅射系统中那样，在具有与流动粒子的特征波长相同波长的大量的光的气氛中也可以高精度地进行连续监视。

公开(公告)号：US07235928B2

公开(公告)日：2007-06-26

申请号：US10472406

申请日：2002-05-31

申请人： Akira Shiokawa ,  Koji Akiyama ,  Tetsuya Imai ,  Katsutoshi Shindo ,  Hidetaka Higashino ,  Koichi Kotera ,  Kanako Miyashita

发明人： Akira Shiokawa ,  Koji Akiyama ,  Tetsuya Imai ,  Katsutoshi Shindo ,  Hidetaka Higashino ,  Koichi Kotera ,  Kanako Miyashita

IPC分类号： H01J17/20

CPC分类号： H01J11/50 ,  H01J11/12

摘要： A gas discharge panel capable of high-speed driving at a low drive voltage, while suppressing the occurrence of write errors in a write period, and a manufacturing method for the same. To achieve this, in the gas discharge panel of the present invention, a secondary gas formed from at least one of carbon dioxide, water vapor, oxygen and nitrogen is induced into discharge spaces 30 evacuated until the residual gas pressure is 0.02 mPa or less, and an He—Xe or Ne—Xe rare gas (discharge gas) is induced into discharge spaces 30. The amount of the secondary gas included within discharge spaces 30 when, for example, carbon dioxide is included therein, is suitably set in terms of both a discharge starting voltage and an electron emission ability, so that the partial pressure of the carbon dioxide is in a range of 0.05 mPa to 0.5 mPa inclusive.

摘要翻译： 一种能够在低驱动电压下高速驱动的气体放电面板及其制造方法，同时抑制写入期间的写入错误的发生。 为此，在本发明的气体放电面板中，将由二氧化碳，水蒸气，氧气和氮气中的至少一种形成的二次气体引入排气空间30中，直至残留气体压力为0.02mPa以下， 并且将He-Xe或Ne-Xe稀有气体（放电气体）引入放电空间30。 包括在放电空间30内的二次气体的量例如在其中包含二氧化碳时，根据放电起始电压和电子发射能力来适当地设定，使得二氧化碳的分压为 0.05mPa〜0.5mPa的范围。

公开(公告)号：US07348729B2

公开(公告)日：2008-03-25

申请号：US10362853

申请日：2001-08-28

申请人： Kanako Miyashita ,  Koichi Kotera ,  Akira Shiokawa

发明人： Kanako Miyashita ,  Koichi Kotera ,  Akira Shiokawa

IPC分类号： H01J17/49

CPC分类号： H01J11/12 ,  H01J9/02 ,  H01J11/40

摘要： A plasma display panel having excellent electron emission properties and a method of making the same. A plasma display panel is provided with a protective layer having a dense growth of columnar crystals formed on a dielectric layer. A middle layer can be provided for improving orientation of the columnar crystals. A heating step creates seed crystals to increase the width and growth of columnar crystals with a selective orientation and greater diameter. The area of any exposed surfaces on the protective layer becomes smaller and absorption of impurities decreases. A layer of grain crystals or an amorphic crystal layer is initially deposited on the dielectric layer to establish wider area seed crystals of a desired orientation. A vacuum evaporated complimentary protective layer can then be grown with the improved configuration.

摘要翻译： 具有优异的电子发射特性的等离子体显示面板及其制造方法。 等离子体显示面板设置有在电介质层上形成的柱状晶体致密生长的保护层。 可以提供中间层以改善柱状晶体的取向。 加热步骤产生晶种以增加具有选择性取向和更大直径的柱状晶体的宽度和生长。 保护层上的任何暴露表面的面积变小，杂质的吸收降低。 最初在电介质层上沉积晶粒晶体层或非晶态晶体层，以形成具有所需取向的更宽面积的晶种。 然后可以用改进的构型生长真空蒸发的互补保护层。

公开(公告)号：US5984752A

公开(公告)日：1999-11-16

申请号：US47131

申请日：1998-03-24

申请人： Hiroyoshi Tanaka ,  Koichi Kotera ,  Masao Uchida

发明人： Hiroyoshi Tanaka ,  Koichi Kotera ,  Masao Uchida

IPC分类号： H01J1/304 ,  H01J9/02

CPC分类号： B82Y10/00 ,  H01J1/3042 ,  H01J9/025 ,  H01J2201/30403 ,  H01J2201/30457 ,  H01J2329/00

摘要： An electron emission cathode includes: an n-type semiconductor film including diamond particles partially projecting from a surface of the n-type semiconductor film; and an anode opposing the n-type semiconductor film with a vacuum interposed therebetween. Electrons are emitted by applying a voltage between the anode and the n-type semiconductor film.

摘要翻译： 电子发射阴极包括：n型半导体膜，包括从n型半导体膜的表面部分地突出的金刚石颗粒; 以及与之间的真空相对的n型半导体膜的阳极。 通过在阳极和n型半导体膜之间施加电压来发射电子。

公开(公告)号：US06595623B2

公开(公告)日：2003-07-22

申请号：US09953965

申请日：2001-09-18

申请人： Koichi Kotera ,  Hiroyoshi Tanaka ,  Isamu Inoue ,  Osamu Watanabe

发明人： Koichi Kotera ,  Hiroyoshi Tanaka ,  Isamu Inoue ,  Osamu Watanabe

IPC分类号： B41J2135

CPC分类号： C08J7/123 ,  B41J2/14 ,  B41J2/14129 ,  B41J2/14201 ,  B41J2/16 ,  B41J2/1601 ,  B41J2/1603 ,  B41J2/1607 ,  B41J2/1623 ,  B41J2/164 ,  B41J2202/03 ,  C08J7/126 ,  Y10T428/31721

摘要： There is provided a plastic base material having a reformed layer 2 formed on a plastic substrate 1 by reforming the surface layer thereof into a component containing fluorine at the ratio of the number of fluorine atoms to the number of carbon atoms, F/C, of 0.85 or more and 1.30 or less, and having highly durable water repellency and ink repellency. The method of manufacturing such a plastic base material comprises a step of reforming the surface of the plastic substrate 1 into a fluorine-containing carbon layer by imparting a specific energy to fluorine-containing plasma by applying an RF bias voltage to the plastic substrate 1 to form a surface having highly durable water repellency and ink repellency. A highly durable ink-jet printer that enables high-quality printing can be provided by the use of a head for an ink-jet printer fabricated by using this plastic base material.

公开(公告)号：US5777427A

公开(公告)日：1998-07-07

申请号：US539699

申请日：1995-10-05

申请人： Hiroyoshi Tanaka ,  Koichi Kotera ,  Masao Uchida

发明人： Hiroyoshi Tanaka ,  Koichi Kotera ,  Masao Uchida

IPC分类号： H01J1/304 ,  H01J9/02 ,  H01J1/02

CPC分类号： B82Y10/00 ,  H01J1/3042 ,  H01J9/025 ,  H01J2201/30403 ,  H01J2201/30457 ,  H01J2329/00

摘要： An electron emission cathode includes: an n-type semiconductor film including diamond particles partially projecting from a surface of the n-type semiconductor film; and an anode opposing the n-type semiconductor film with a vacuum interposed therebetween. Electrons are emitted by applying a voltage between the anode and the n-type semiconductor film.

摘要翻译： 电子发射阴极包括：n型半导体膜，包括从n型半导体膜的表面部分地突出的金刚石颗粒; 以及与之间的真空相对的n型半导体膜的阳极。 通过在阳极和n型半导体膜之间施加电压来发射电子。

公开(公告)号：US06296946B1

公开(公告)日：2001-10-02

申请号：US09269794

申请日：1999-04-01

申请人： Koichi Kotera ,  Hiroyoshi Tanaka ,  Isamu Inoue ,  Osamu Watanabe

发明人： Koichi Kotera ,  Hiroyoshi Tanaka ,  Isamu Inoue ,  Osamu Watanabe

IPC分类号： B41J216

CPC分类号： C08J7/123 ,  B41J2/14 ,  B41J2/14129 ,  B41J2/14201 ,  B41J2/16 ,  B41J2/1601 ,  B41J2/1603 ,  B41J2/1607 ,  B41J2/1623 ,  B41J2/164 ,  B41J2202/03 ,  C08J7/126 ,  Y10T428/31721

摘要： There is provided a plastic base material having a reformed layer 2 formed on a plastic substrate 1 by reforming the surface layer thereof into a component containing fluorine at the ratio of the number of fluorine atoms to the number of carbon atoms, F/C, of 0.85 or more and 1.30 or less, and having highly durable water repellency and ink repellency. The method of manufacturing such a plastic base material comprises a step of reforming the surface of the plastic substrate 1 into a fluorine-containing carbon layer by imparting a specific energy to fluorine-containing plasma by applying an RF bias voltage to the plastic substrate 1 to form a surface having highly durable water repellency and ink repellency. A highly durable ink-jet printer that enables high-quality printing can be provided by the use of a head for an ink-jet printer fabricated by using this plastic base material.

摘要翻译： 提供了一种塑料基材，其具有通过将其表面层以氟原子数与碳原子数（F / C）的比例重整为含氟成分，形成在塑料基板1上的重整层2 0.85以上且1.30以下，具有高耐久性的防水性和拒墨性。 制造这种塑料基材的方法包括通过向塑料基板1施加RF偏置电压向含氟等离子体赋予比能量将塑料基板1的表面重整为含氟碳层的步骤， 形成具有高耐久性的防水性和拒墨性的表面。 可以通过使用通过使用该塑料基材制造的喷墨打印头的头部来提供能够进行高质量打印的高度耐用的喷墨打印机。