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    HOLLOW CELL ARRAY STRUCTURE AND METHOD AND APPARATUS FOR PRODUCING HOLLOW CELL ARRAY STRUCTURE
    5.
    发明申请
    HOLLOW CELL ARRAY STRUCTURE AND METHOD AND APPARATUS FOR PRODUCING HOLLOW CELL ARRAY STRUCTURE 有权
    中空细胞阵列结构及其制造方法和装置，用于生产中空细胞阵列结构

    公开(公告)号：US20120114876A1

    公开(公告)日：2012-05-10

    申请号：US13376797

    申请日：2010-07-08

    申请人： Toshihiro Kanematsu ,  Masaru Ohgaki ,  Shinji Aoki ,  Shinya Seno ,  Masahiro Masuzawa ,  Hisayoshi Ohshima ,  Yukie Inoue

    发明人： Toshihiro Kanematsu ,  Masaru Ohgaki ,  Shinji Aoki ,  Shinya Seno ,  Masahiro Masuzawa ,  Hisayoshi Ohshima ,  Yukie Inoue

    IPC分类号： B05D5/00 ,  B05D3/06 ,  B05C9/14 ,  B05D3/02

    CPC分类号： B29D11/00365 ,  B29D11/00298 ,  B29D22/00 ,  G02F2001/1672

    摘要： A disclosed method for producing a hollow cell array structure includes a first step of layering a deformable material capable of being plastically deformed under a predetermined condition on a first substrate, the first substrate having plural, mutually separated depressions in a surface thereof, such that the deformable material forms mutually isolated spaces in the corresponding depressions; a second step of expanding the spaces in the plural depressions by inducing a gas pressure of the spaces while extending the deformable material on the first substrate, such that plural hollow cells are simultaneously formed in correspondence to the plural depressions in predetermined directions; and a third step of selectively solidifying portions of the plural hollow cells by selectively applying ultraviolet rays thereto.

    摘要翻译： 所公开的中空电池阵列结构的制造方法包括：第一工序，在第一衬底上，将可在规定的条件下塑性变形的可变形材料分层，第一衬底在其表面上具有多个相互分开的凹部， 可变形材料在相应的凹陷中形成相互隔离的空间; 通过在第一基板上延伸可变形材料的同时引导空间的气体压力来使多个凹部中的空间膨胀的第二步骤，使得与预定方向上的多个凹部对应地同时形成多个中空单元; 以及通过选择性地施加紫外线来选择性地固化多个中空室的部分的第三步骤。

    HOLLOW STRUCTURE FORMING SUBSTRATE, METHOD OF PRODUCING HOLLOW STRUCTURE FORMING SUBSTRATE, AND METHOD OF PRODUCING HOLLOW STRUCTURE USING HOLLOW STRUCTURE FORMING SUBSTRATE
    9.
    发明申请
    HOLLOW STRUCTURE FORMING SUBSTRATE, METHOD OF PRODUCING HOLLOW STRUCTURE FORMING SUBSTRATE, AND METHOD OF PRODUCING HOLLOW STRUCTURE USING HOLLOW STRUCTURE FORMING SUBSTRATE 有权
    中空结构形成基板，形成基底的中空结构的方法和使用中空结构形成基板的中空结构的制造方法

    公开(公告)号：US20100035040A1

    公开(公告)日：2010-02-11

    申请号：US12518981

    申请日：2008-01-10

    申请人： Masahiro Masuzawa ,  Masaru Ohgaki

    发明人： Masahiro Masuzawa ,  Masaru Ohgaki

    IPC分类号： B32B3/26 ,  B28B7/16 ,  B28B7/38 ,  B29D22/00

    CPC分类号： B29C44/3403 ,  B29C49/0042 ,  B29C49/58 ,  B29C2791/006 ,  B29D22/02 ,  B29L2011/00 ,  B29L2031/756 ,  Y10T428/24562 ,  Y10T428/24661 ,  Y10T428/249975

    摘要： A hollow structure forming substrate includes: a surface on which a plastic-deformation film is formed by using a plastic-deformable material; a plurality of regularly-arranged gas-retaining spaces; a plurality of gas leading-out parts each having a first opening which faces corresponding one of the gas-retaining spaces and a second opening which faces the surface, the gas leading-out parts leads out gas retained in the gas-retaining spaces toward the surface under depressurized environmental condition; and a plurality of infiltration preventing spaces each provided in a space between corresponding one of the first openings and corresponding one of the second openings, in which the infiltration preventing spaces prevent infiltration of the plastic-deformable material from the surface into the gas-retaining spaces.

    摘要翻译： 中空结构形成基板包括：通过使用塑性变形材料在其上形成塑性变形膜的表面; 多个规则排列的气体保持空间; 多个气体导出部，其各自具有面对相对应的一个气体保持空间的第一开口和面向所述表面的第二开口，所述气体导出部将保持在所述气体保持空间中的气体导向所述气体保持空间 减压环境条件下的表面; 以及多个防渗漏空间，其各自设置在相应的一个第一开口和相应的一个第二开口之间的空间中，其中防渗透空间防止塑性可变形材料从表面渗透进入气体保持空间 。