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    Processing system
    1.
    发明授权
    Processing system 有权
    处理系统

    公开(公告)号：US08350227B2

    公开(公告)日：2013-01-08

    申请号：US13336155

    申请日：2011-12-23

    申请人： Holger Doemer ,  Stefan Martens ,  Walter Mack

    发明人： Holger Doemer ,  Stefan Martens ,  Walter Mack

    IPC分类号： G21K5/04

    CPC分类号： G21K5/04 ,  B23K26/032 ,  B23K26/082 ,  B23K26/083 ,  B23K26/1224 ,  B23K26/705 ,  G21K5/00 ,  H01J37/20 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/20221 ,  H01J2237/3151 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01J2237/31744

    摘要： A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.

    摘要翻译： 处理系统包括用于产生指向第一处理位置的粒子束的粒子束列; 用于产生指向位于距离所述第一处理位置一定距离的第二处理位置的激光束的激光系统; 以及包括致动器和连接到致动器的板的保护器。 所述致动器构造成使所述板在第一位置和第二位置之间移动，所述第一位置在所述第一位置和所述第二位置之间移动，所述第一位置通过所述激光束来保护所述粒子束柱的部件与从所述物体释放的粒子之间， 通过激光束从物体释放的颗粒。

    Processing system
    2.
    发明授权
    Processing system 有权
    处理系统

    公开(公告)号：US08115180B2

    公开(公告)日：2012-02-14

    申请号：US12542926

    申请日：2009-08-18

    申请人： Holger Doemer ,  Stefan Martens ,  Walter Mack

    发明人： Holger Doemer ,  Stefan Martens ,  Walter Mack

    IPC分类号： G21K5/04

    CPC分类号： G21K5/04 ,  B23K26/032 ,  B23K26/082 ,  B23K26/083 ,  B23K26/1224 ,  B23K26/705 ,  G21K5/00 ,  H01J37/20 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/20221 ,  H01J2237/3151 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01J2237/31744

    摘要： A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.

    摘要翻译： 处理系统包括用于产生指向第一处理位置的粒子束的粒子束列; 用于产生指向位于距离所述第一处理位置一定距离的第二处理位置的激光束的激光系统; 以及包括致动器和连接到致动器的板的保护器。 所述致动器构造成使所述板在第一位置和第二位置之间移动，所述第一位置在所述第一位置和所述第二位置之间移动，所述第一位置通过所述激光束来保护所述粒子束柱的部件与从所述物体释放的粒子之间， 通过激光束从物体释放的颗粒。

    PROCESSING SYSTEM
    3.
    发明申请
    PROCESSING SYSTEM 有权
    加工系统

    公开(公告)号：US20120091363A1

    公开(公告)日：2012-04-19

    申请号：US13336155

    申请日：2011-12-23

    申请人： Holger Doemer ,  Stefan Martens ,  Walter Mack

    发明人： Holger Doemer ,  Stefan Martens ,  Walter Mack

    IPC分类号： G21K5/08

    CPC分类号： G21K5/04 ,  B23K26/032 ,  B23K26/082 ,  B23K26/083 ,  B23K26/1224 ,  B23K26/705 ,  G21K5/00 ,  H01J37/20 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/20221 ,  H01J2237/3151 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01J2237/31744

    摘要： A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.

    摘要翻译： 处理系统包括用于产生指向第一处理位置的粒子束的粒子束列; 用于产生指向位于距离所述第一处理位置一定距离的第二处理位置的激光束的激光系统; 以及包括致动器和连接到致动器的板的保护器。 所述致动器构造成使所述板在第一位置和第二位置之间移动，所述第一位置在所述第一位置和所述第二位置之间移动，所述第一位置通过所述激光束来保护所述粒子束柱的部件与从所述物体释放的粒子之间， 通过激光束从物体释放的颗粒。

    PROCESSING SYSTEM
    4.
    发明申请
    PROCESSING SYSTEM 有权
    加工系统

    公开(公告)号：US20100051828A1

    公开(公告)日：2010-03-04

    申请号：US12542926

    申请日：2009-08-18

    申请人： Holger Doemer ,  Stefan Martens ,  Walter Mack

    发明人： Holger Doemer ,  Stefan Martens ,  Walter Mack

    IPC分类号： G21K5/04

    CPC分类号： G21K5/04 ,  B23K26/032 ,  B23K26/082 ,  B23K26/083 ,  B23K26/1224 ,  B23K26/705 ,  G21K5/00 ,  H01J37/20 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/20221 ,  H01J2237/3151 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01J2237/31744

    摘要： A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.

    摘要翻译： 处理系统包括用于产生指向第一处理位置的粒子束的粒子束列; 用于产生指向位于距离所述第一处理位置一定距离的第二处理位置的激光束的激光系统; 以及包括致动器和连接到致动器的板的保护器。 所述致动器构造成使所述板在第一位置和第二位置之间移动，所述第一位置在所述第一位置和所述第二位置之间移动，所述第一位置通过所述激光束来保护所述粒子束柱的部件与从所述物体释放的粒子之间， 通过激光束从物体释放的颗粒。

    METHOD FOR OPERATING A LASER SCANNER AND PROCESSING SYSTEM WITH LASER SCANNER
    8.
    发明申请
    METHOD FOR OPERATING A LASER SCANNER AND PROCESSING SYSTEM WITH LASER SCANNER 有权
    使用激光扫描仪操作激光扫描仪和处理系统的方法

    公开(公告)号：US20130057874A1

    公开(公告)日：2013-03-07

    申请号：US13565147

    申请日：2012-08-02

    申请人： Holger Doemer ,  Ruediger Rosenkranz

    发明人： Holger Doemer ,  Ruediger Rosenkranz

    IPC分类号： G01B11/14

    CPC分类号： B23K26/042 ,  B23K26/082 ,  B23K26/1224 ,  B23K26/705 ,  H01J2237/30433

    摘要： A method includes using a scanner to scan a laser beam along a scan path, and detecting light intensities caused by laser light of the laser beam incident on a detection cross-section. The method also includes determining a position of the detection cross-section relative to the laser scanner based on the detected light intensities. The scan path includes, in a plane which includes the detection cross-section, a first partial path and a second partial path which extend adjacent to each other and at a distance from each other which is: a) smaller than a diameter of the detection cross-section plus a diameter of the laser beam in the plane which includes the detection cross-section; and b) greater than 0.3 times the diameter of the laser beam in the plane which includes the detection cross-section or greater than 0.3 times the diameter of the detection cross-section.

    摘要翻译： 一种方法包括使用扫描仪沿着扫描路径扫描激光束，以及检测由入射到检测横截面上的激光束的激光引起的光强度。 该方法还包括基于检测到的光强度来确定检测横截面相对于激光扫描仪的位置。 扫描路径在包括检测横截面的平面中包括第一部分路径和第二部分路径，该第一部分路径和第二部分路径彼此相邻延伸并且彼此间隔一定距离，该距离是：a）小于检测的直径 横截面加上包括检测横截面的平面中的激光束的直径; 和b）大于包括检测横截面的平面中的激光束的直径的0.3倍或大于检测横截面直径的0.3倍。

    Laser processing system, object mount and laser processing method
    9.
    发明授权
    Laser processing system, object mount and laser processing method 有权
    激光加工系统，对象安装和激光加工方法

    公开(公告)号：US08841579B2

    公开(公告)日：2014-09-23

    申请号：US13029453

    申请日：2011-02-17

    申请人： Holger Doemer

    发明人： Holger Doemer

    IPC分类号： B23K26/16 ,  A61N5/00 ,  B23K26/30 ,  B23K26/03 ,  B23K26/36 ,  B23K26/08 ,  B23K26/12

    CPC分类号： H01J37/226 ,  B23K26/032 ,  B23K26/082 ,  B23K26/1224 ,  B23K26/36 ,  B23K26/705 ,  H01J37/3045 ,  H01J2237/2482 ,  H01J2237/31732 ,  H01J2237/3174

    摘要： A processing system includes a common base, an object mount configured to hold an object for inspection or processing, and at least one aperture plate provided on the object mount. The aperture plate has at least one aperture The processing system also includes a laser device mounted on the common base and configured to scan a laser beam across a scan region, and a transport device configured to displace the object mount relative to the common base from a first position to a second position. When the object mount is in the first position, the object and the at least one aperture are positioned within the scan region of the laser device. The processing system also includes at least one light guide provided on the object mount. The light guide has an input port provided by the at least one aperture, and an output port. The processing system also includes at least one light detector mounted at a fixed position relative to the common base and configured to detect light emerging from the output port of the light guide.

    摘要翻译： 处理系统包括公共基座，被配置为保持用于检查或处理的物体的物体安装件，以及设置在物体安装件上的至少一个孔板。 孔板具有至少一个孔。 所述处理系统还包括安装在所述公共基座上并且被配置为扫描穿过扫描区域的激光束的激光装置，以及被配置为使所述物体安装件相对于所述公共基座从第一位置移动到第二位置的传送装置。 当物体安装件处于第一位置时，物体和至少一个孔定位在激光装置的扫描区域内。 处理系统还包括设置在物体安装件上的至少一个光导。 光导具有由至少一个孔提供的输入端口和输出端口。 处理系统还包括安装在相对于公共基座的固定位置处的至少一个光检测器，并被配置为检测从光导的输出端口出射的光。