公开(公告)号：US5518131A

公开(公告)日：1996-05-21

申请号：US250896

申请日：1994-07-07

申请人： Hsing H. Chen ,  Lawrence D. David ,  Derek B. Harris

发明人： Hsing H. Chen ,  Lawrence D. David ,  Derek B. Harris

IPC分类号： C23F1/26 ,  H01L21/3213 ,  C01G39/00

CPC分类号： C23F1/26 ,  H01L21/32134

摘要： A molybdenum etching process which reduces hazardous treatment waste is disclosed. Etchants which can be used are ferric sulfate and ferric ammonium sulfate. Waste products resulting from this etch are Fe(OH).sub.3 and CaSO.sub.4.

摘要翻译： 公开了减少危险废物处理废弃物的钼蚀刻工艺。 可以使用的是硫酸铁和硫酸亚铁铵。 由该蚀刻产生的废产物是Fe（OH）3和CaSO 4。

公开(公告)号：US5476575A

公开(公告)日：1995-12-19

申请号：US285371

申请日：1994-08-03

申请人： Denis J. Brophy ,  Madhav Datta ,  Derek B. Harris ,  Matthew T. Kurdziel ,  Frank S. Ryan

发明人： Denis J. Brophy ,  Madhav Datta ,  Derek B. Harris ,  Matthew T. Kurdziel ,  Frank S. Ryan

IPC分类号： C25F3/14 ,  G03F1/20 ,  G03F1/68 ,  H01L21/3063 ,  H01L21/308 ,  C25F3/02 ,  C25F7/00

CPC分类号： G03F1/20 ,  C25F3/14 ,  G03F1/68

摘要： Masks for microelectronics technology are fabricated by electrochemical etching. Molybdenum sheet or foil is masked with patterned photoresist on one side, and a mating, mirror-image pattern of photoresist is applied on the other side of the foil in exact registration with the first pattern. The foil is immersed in electrolyte (an aqueous solution of sodium nitrate, sodium hydroxide, thiourea, and surfactant) along with nickel anode plates held parallel to the foil surfaces 1-3 cm away. The anode plate is made slightly smaller than the mask area of the foil. When voltage is applied across the cell, the foil is etched through to form vias. The electrolyte is pumped across the surface of the foil and uniform flow velocity over the foil surface is achieved.

摘要翻译： 用于微电子技术的掩模是通过电化学蚀刻来制造的。 钼片或箔在一侧被图案化的光致抗蚀剂掩蔽，并且光刻胶的匹配的镜像图案被施加在与第一图案精确对准的箔的另一侧上。 将箔浸入电解液（硝酸钠，氢氧化钠，硫脲和表面活性剂的水溶液）以及与1-3cm距离的箔表面平行的镍阳极板。 使阳极板略微小于箔的掩模面积。 当跨过电池施加电压时，箔被蚀刻通过以形成通孔。 电解质被泵送穿过箔的表面并实现在箔表面上的均匀流速。

公开(公告)号：US5614076A

公开(公告)日：1997-03-25

申请号：US608891

申请日：1996-02-29

申请人： Denis J. Brophy ,  Madhav Datta ,  Derek B. Harris ,  Frank S. Ryan ,  Frank A. Spera

发明人： Denis J. Brophy ,  Madhav Datta ,  Derek B. Harris ,  Frank S. Ryan ,  Frank A. Spera

IPC分类号： C25F3/14 ,  C25F7/00 ,  H05K3/07 ,  C25F3/02

CPC分类号： C25F7/00 ,  H05K3/07

摘要： An electroetching tool using scanned localized application of flowing electrolyte against a workpiece such as a large area mask having high density features for the fabrication of microelectronic components. A masked molybdenum plate is suspended in a vertical direction within a tank which functions as a reservoir for a recirculating electrobyte. The electrolyte in the reservoir is filtered and pumped to a pair of travelling cathode assemblies from which the flowing electrolyte is simultaneously applied through respective charged orifices to both sides of the workpiece. The workpiece is masked on its opposite sides with mirror imaged mask apertures having corresponding opposite-sided features in registration with each other.Each orifice through which the electrolyte is applied comprises an open groove in the surface of a block of polyvinal chloride material which groove extends in a vertical direction relative to the tank. The bottom of the groove is adjacent to a conductive plate. The open top of the groove is held closely against the masked plate as the cathode assembly is moved along the guide rails. The fresh electrobyte is introduced to the groove at the upper end thereof while the used electrolyte exits from the groove at the lower end thereof and into the tank reservoir for recirculation.

摘要翻译： 一种电蚀工具，其使用流动的电解液局部应用于工件，例如具有高密度特征的大面积掩模，用于制造微电子部件。 屏蔽的钼板在用作再循环电池的储存器的罐内沿垂直方向悬挂。 将储存器中的电解质过滤并泵送到一对行进的阴极组件，通过相应的带电孔同时将流动的电解液施加到工件的两侧。 工件在其相对侧上被掩模，镜面成像的掩模孔具有彼此对准的相应的相对侧面特征。 施加电解质的每个孔包括在聚氯乙烯材料块的表面中的开槽，该槽在相对于罐的垂直方向上延伸。 槽的底部与导电板相邻。 当阴极组件沿着导轨移动时，凹槽的开口顶部紧密地保持在屏蔽板上。 新鲜的电解质在其上端被引入到槽中，而所用的电解质在其下端从槽中排出并进入储罐用于再循环。

公开(公告)号：US5531874A

公开(公告)日：1996-07-02

申请号：US261170

申请日：1994-06-17

申请人： Denis J. Brophy ,  Madhav Datta ,  Derek B. Harris ,  Frank S. Ryan ,  Frank A. Spera

发明人： Denis J. Brophy ,  Madhav Datta ,  Derek B. Harris ,  Frank S. Ryan ,  Frank A. Spera

IPC分类号： C25F3/14 ,  C25F7/00 ,  H05K3/07

CPC分类号： C25F7/00 ,  H05K3/07

摘要： An electroetching tool using scanned localized application of flowing electrolyte against a workpiece such as a large area mask having high density features for the fabrication of microelectronic components. A masked molybdenum plate is suspended in a vertical direction within a tank which functions as a reservoir for a recirculating electrobyte. The electrolyte in the reservoir is filtered and pumped to a pair of travelling cathode assemblies from which the flowing electrolyte is simultaneously applied through respective charged orifices to both sides of the workpiece. The workpiece is masked on its opposite sides with mirror imaged mask apertures having corresponding opposite-sided features in registration with each other.Each orifice through which the electrolyte is applied comprises an open groove in the surface of a block of polyvinal chloride material which groove extends in a vertical direction relative to the tank. The bottom of the groove is adjacent to a conductive plate. The open top of the groove is held closely against the masked plate as the cathode assembly is moved along the guide rails. The fresh electrobyte is introduced to the groove at the upper end thereof while the used electrolyte exits from the groove at the lower end thereof and into the tank reservoir for recirculation.

摘要翻译： 一种电蚀工具，其使用流动的电解液局部应用于工件，例如具有高密度特征的大面积掩模，用于制造微电子部件。 屏蔽的钼板在用作再循环电池的储存器的罐内沿垂直方向悬挂。 将储存器中的电解质过滤并泵送到一对行进的阴极组件，通过相应的带电孔同时将流动的电解液施加到工件的两侧。 工件在其相对侧上被掩模，镜面成像的掩模孔具有彼此对准的相应的相对侧面特征。 施加电解质的每个孔包括在聚氯乙烯材料块的表面中的开槽，该槽在相对于罐的垂直方向上延伸。 槽的底部与导电板相邻。 当阴极组件沿着导轨移动时，凹槽的开口顶部紧密地保持在屏蔽板上。 新鲜的电解质在其上端被引入到槽中，而所用的电解质在其下端从槽中排出并进入储罐用于再循环。