公开(公告)号：US08887104B2

公开(公告)日：2014-11-11

申请号：US13823685

申请日：2011-09-01

申请人： Hua-Yu Liu ,  Jiangwei Li ,  Luoqi Chen ,  Wei Liu ,  Jiong Jiang

发明人： Hua-Yu Liu ,  Jiangwei Li ,  Luoqi Chen ,  Wei Liu ,  Jiong Jiang

IPC分类号： G06F17/50 ,  G03F7/20

CPC分类号： G06F17/5045 ,  G03F7/705 ,  G03F7/70941 ,  G06F17/5009

摘要： A method for reducing an effect of flare produced by a lithographic apparatus for imaging a design layout onto a substrate is described. A flare map in an exposure field of the lithographic apparatus is simulated by mathematically combining a density map of the design layout at the exposure field with a point spread function (PSF), wherein system-specific effects on the flare map may be incorporated in the simulation. Location-dependent flare corrections for the design layout are calculated by using the determined flare map, thereby reducing the effect of flare. Some of the system-specific effects included in the simulation are: a flare effect due to reflection from black border of a mask, a flare effect due to reflection from one or more reticle-masking blades defining an exposure slit, a flare effect due to overscan, a flare effect due reflections from a gas-lock sub-aperture of a dynamic gas lock (DGL) mechanism, and a flare effect due to contribution from neighboring exposure fields.

摘要翻译： 描述了一种用于降低由用于将设计布局成像到基板上的光刻设备产生的火炬的影响的方法。 通过将曝光场上的设计布局的密度图与点扩散函数（PSF）进行数学组合来模拟光刻设备的曝光区域中的耀斑图，其中可以在闪光图中对系统特定的影响 模拟。 通过使用确定的耀斑图计算设计布局的位置相关的光斑校正，从而减少了耀斑的影响。 仿真中包括的一些系统特定效果是：由于掩模的黑色边缘的反射引起的耀斑效应，由于限定曝光狭缝的一个或多个掩模版掩模片的反射引起的耀斑效应，由于 过扫描，来自动态气体锁（DGL）机构的气体锁定子孔的反射引起的闪光效应，以及由于来自相邻曝光场的贡献而产生的耀斑效果。

公开(公告)号：US20130185681A1

公开(公告)日：2013-07-18

申请号：US13823685

申请日：2011-09-01

申请人： Hua-Yu Liu ,  Jiangwei Li ,  Luoqi Chen ,  Wei Liu ,  Jiong Jiang

发明人： Hua-Yu Liu ,  Jiangwei Li ,  Luoqi Chen ,  Wei Liu ,  Jiong Jiang

IPC分类号： G06F17/50

CPC分类号： G06F17/5045 ,  G03F7/705 ,  G03F7/70941 ,  G06F17/5009

摘要： A method for reducing an effect of flare produced by a lithographic apparatus for imaging a design layout onto a substrate is described. A flare map in an exposure field of the lithographic apparatus is simulated by mathematically combining a density map of the design layout at the exposure field with a point spread function (PSF), wherein system-specific effects on the flare map may be incorporated in the simulation. Location-dependent flare corrections for the design layout are calculated by using the determined flare map, thereby reducing the effect of flare. Some of the system-specific effects included in the simulation are: a flare effect due to reflection from black border of a mask, a flare effect due to reflection from one or more reticle-masking blades defining an exposure slit, a flare effect due to overscan, a flare effect due reflections from a gas-lock sub-aperture of a dynamic gas lock (DGL) mechanism, and a flare effect due to contribution from neighboring exposure fields.

摘要翻译： 描述了一种用于降低由用于将设计布局成像到基板上的光刻设备产生的火炬的影响的方法。 通过将曝光场上的设计布局的密度图与点扩散函数（PSF）进行数学组合来模拟光刻设备的曝光区域中的耀斑图，其中可以在闪光图中对系统特定的影响 模拟。 通过使用确定的耀斑图计算设计布局的位置相关的光斑校正，从而减少了耀斑的影响。 仿真中包括的一些系统特定效果是：由于掩模的黑色边缘的反射引起的耀斑效应，由于限定曝光狭缝的一个或多个掩模版掩模片的反射引起的耀斑效应，由于 过扫描，来自动态气体锁（DGL）机构的气体锁定子孔的反射引起的闪光效应，以及由于来自相邻曝光场的贡献而产生的耀斑效果。

公开(公告)号：US20120216156A1

公开(公告)日：2012-08-23

申请号：US13505286

申请日：2010-10-26

申请人： Hua-Yu Liu ,  Luoqi Chen ,  Hong Chen ,  Zhi-Pan Li ,  Jun Ye ,  Min-Chun Tsai ,  Youping Zhang ,  Yen-Wen Lu ,  Jiangwei Li

发明人： Hua-Yu Liu ,  Luoqi Chen ,  Hong Chen ,  Zhi-Pan Li ,  Jun Ye ,  Min-Chun Tsai ,  Youping Zhang ,  Yen-Wen Lu ,  Jiangwei Li

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/144 ,  G03F1/36 ,  G03F7/70125 ,  G03F7/70425 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/50 ,  G06F17/5009

摘要： The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.

摘要翻译： 本发明涉及从设计中选择模式子集的方法，以及执行源和掩码优化的方法以及用于执行从设计中选择模式子集的方法的计算机程序产品。 根据某些方面，本发明能够覆盖整个设计，同时降低计算成本，通过智能地从设计中选择图案子集，其中设计的设计或修改被配置为经由光刻成像到衬底上 处理。 从设计中选择图案子集的方法包括从与设计的预定义表示相关的设计中识别一组图案。 通过根据该方法选择模式子集，所选择的模式子集构成与模式集合相似的设计表示。

公开(公告)号：US08739082B2

公开(公告)日：2014-05-27

申请号：US13505286

申请日：2010-10-26

申请人： Hua-Yu Liu ,  Luoqi Chen ,  Hong Chen ,  Zhi-Pan Li ,  Jun Ye ,  Min-Chun Tsai ,  Youping Zhang ,  Yen-Wen Lu ,  Jiangwei Li

发明人： Hua-Yu Liu ,  Luoqi Chen ,  Hong Chen ,  Zhi-Pan Li ,  Jun Ye ,  Min-Chun Tsai ,  Youping Zhang ,  Yen-Wen Lu ,  Jiangwei Li

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/144 ,  G03F1/36 ,  G03F7/70125 ,  G03F7/70425 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/50 ,  G06F17/5009

摘要： The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.

摘要翻译： 本发明涉及从设计中选择模式子集的方法，以及执行源和掩码优化的方法以及用于执行从设计中选择模式子集的方法的计算机程序产品。 根据某些方面，本发明能够覆盖整个设计，同时降低计算成本，通过智能地从设计中选择图案子集，其中设计的设计或修改被配置为经由光刻成像到衬底上 处理。 从设计中选择图案子集的方法包括从与设计的预定义表示相关的设计中识别一组图案。 通过根据该方法选择模式子集，所选择的模式子集构成与模式集合相似的设计表示。

公开(公告)号：USD954883S1

公开(公告)日：2022-06-14

申请号：US29752441

申请日：2020-09-28

申请人： Jiangwei Li

设计人： Jiangwei Li

公开(公告)号：US09922241B2

公开(公告)日：2018-03-20

申请号：US14361372

申请日：2011-12-01

申请人： Jiangwei Li ,  Kongqiao Wang ,  Lei Xu

发明人： Jiangwei Li ,  Kongqiao Wang ,  Lei Xu

IPC分类号： G06K9/00 ,  G06K9/46

CPC分类号： G06K9/00355 ,  G06K9/46 ,  G06K9/4642 ,  G06K9/4671 ,  G06K2009/4666

摘要： The invention concerns a gesture recognition method for gesture-based interaction at an apparatus. The method comprises receiving one or more images of an object; creating feature images for the received one or more images; determining binary values for pixels in corresponding locations of said feature images and concatenating the binary values to form a binary string for said pixel; repeating the previous step for each corresponding pixel of said feature image to form a feature map and forming a histogram representation of the feature map. The invention also concerns an apparatus and a computer program.

公开(公告)号：US09251409B2

公开(公告)日：2016-02-02

申请号：US14351000

申请日：2011-10-18

申请人： Jiangwei Li ,  Kongqiao Wang ,  Lei Xu ,  Yikai Fang

发明人： Jiangwei Li ,  Kongqiao Wang ,  Lei Xu ,  Yikai Fang

IPC分类号： G06K9/00 ,  G06K9/38 ,  G06K9/72 ,  G06T7/00 ,  G06T7/20

CPC分类号： G06K9/00355 ,  G06K9/38 ,  G06K9/72 ,  G06T7/136 ,  G06T7/194 ,  G06T7/246 ,  G06T7/73 ,  G06T2207/10016 ,  G06T2207/20081

摘要： Methods, apparatuses, and computer program products are herein provided for enabling hand gesture recognition using an example infrared (IR) enabled mobile terminal. One example method may include determining a hand region in at least one captured frame using an adaptive omnidirectional edge operator (AOEO). The method may further include determining a threshold for hand region extraction using a recursive binarization scheme. The method may also include determining a hand location using the determined threshold for the extracted hand region in the at least one captured frame. The method may also include determining a fingertip location based on the determined hand location. Similar and related example apparatuses and example computer program products are also provided.

摘要翻译： 本文提供了方法，装置和计算机程序产品，以使用启用示例红外（IR）功能的移动终端来实现手势识别。 一个示例性方法可以包括使用自适应全向边缘算子（AOEO）来确定至少一个捕获帧中的手区域。 该方法还可以包括使用递归二值化方案来确定手区域提取的阈值。 该方法还可以包括使用所确定的在至少一个拍摄帧中提取的手区域的阈值来确定手位置。 该方法还可以包括基于所确定的手位置来确定指尖位置。 还提供了类似和相关的示例设备和示例性计算机程序产品。

公开(公告)号：US09196055B2

公开(公告)日：2015-11-24

申请号：US13996751

申请日：2010-12-31

申请人： Kongqiao Wang ,  Lei Xu ,  Jiangwei Li ,  Yingfei Liu

发明人： Kongqiao Wang ,  Lei Xu ,  Jiangwei Li ,  Yingfei Liu

IPC分类号： G06T7/20 ,  G06K9/00 ,  G06K9/46

CPC分类号： G06T7/2033 ,  G06K9/00355 ,  G06K9/4642 ,  G06T7/223 ,  G06T2207/10024 ,  G06T2207/20016 ,  G06T2207/20021 ,  G06T2207/20068 ,  G06T2207/30196

摘要： A method for providing a mechanism for gesture recognition may include causing down-sampling of image data received to generate down-sampled image blocks for a plurality of image frames, causing extraction of a plurality of features from the down-sampled image blocks, determining a moving status of the down-sampled image blocks based on changes in values of respective features in consecutive frames, and determining a direction of motion of an object in the image data based on movement of a first border and a second border of a projection histogram determined based on the moving status of respective down-sampled image blocks. A corresponding apparatus and computer program product are also provided.

摘要翻译： 提供用于手势识别的机构的方法可以包括：对接收到的图像数据进行下采样，以生成用于多个图像帧的下采样图像块，从而从下采样图像块中提取多个特征，确定 基于连续帧中的各个特征值的变化，下采样图像块的移动状态，以及基于确定的投影直方图的第一边界和第二边界的移动来确定图像数据中的对象的运动方向 基于各自的下采样图像块的移动状态。 还提供了相应的装置和计算机程序产品。

公开(公告)号：US08413081B2

公开(公告)日：2013-04-02

申请号：US12709373

申请日：2010-02-19

申请人： Jun Ye ,  Jiangwei Li ,  Stefan Hunsche

发明人： Jun Ye ,  Jiangwei Li ,  Stefan Hunsche

IPC分类号： G06F17/50

CPC分类号： G06F17/50 ,  G03F1/144 ,  G03F1/36

摘要： One embodiment of a method for process window optimized optical proximity correction includes applying optical proximity corrections to a design layout, simulating a lithography process using the post-OPC layout and models of the lithography process at a plurality of process conditions to produce a plurality of simulated resist images. A weighted average error in the critical dimension or other contour metric for each edge segment of each feature in the design layout is determined, wherein the weighted average error is an offset between the contour metric at each process condition and the contour metric at nominal condition averaged over the plurality of process conditions. A retarget value for the contour metric for each edge segment is determined using the weighted average error and applied to the design layout prior to applying further optical proximity corrections.

摘要翻译： 用于处理窗口优化的光学邻近校正的方法的一个实施例包括将光学邻近校正应用于设计布局，使用后OPC布局模拟光刻处理和在多个工艺条件下的光刻工艺的模型，以产生多个模拟 抵抗图像。 确定设计布局中每个特征的每个边缘段的关键尺寸或其他轮廓度量的加权平均误差，其中加权平均误差是在每个处理条件下的轮廓度量与标称条件下的轮廓度量之间的偏移平均 在多个工艺条件下。 使用加权平均误差确定每个边缘段的轮廓度量的重定向值，并在应用进一步的光学邻近校正之前应用于设计布局。

公开(公告)号：US08144945B2

公开(公告)日：2012-03-27

申请号：US12328375

申请日：2008-12-04

申请人： Kongqiao Wang ,  Jiangwei Li ,  Lei Xu

发明人： Kongqiao Wang ,  Jiangwei Li ,  Lei Xu

IPC分类号： G06K9/48 ,  G06K9/32 ,  G06F21/00 ,  G05B19/00

CPC分类号： G06K9/00248

摘要： A method for providing orientation independent face detection may include generating multiple mosaic images from an input image in which each of the multiple mosaic images has a different scale, employing a plurality of differently oriented edge detectors to perform edge detection on the multiple mosaic images including combining edges of the multiple mosaic images having the different scales, and performing face detection in regions corresponding to the differently oriented edge detectors based on respective feature maps produced by the differently oriented edge detectors. An apparatus and computer program product corresponding to the method are also provided.

摘要翻译： 用于提供取向独立面部检测的方法可以包括从其中每个多个马赛克图像具有不同标度的输入图像生成多个马赛克图像，其中采用多个不同方向的边缘检测器对多个马赛克图像执行边缘检测，包括组合 具有不同尺度的多个马赛克图像的边缘，以及基于由不同定向的边缘检测器产生的各个特征图，在对应于不同定向的边缘检测器的区域中执行面部检测。 还提供了一种与该方法对应的装置和计算机程序产品。