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公开(公告)号:US20110300488A1
公开(公告)日:2011-12-08
申请号:US12792994
申请日:2010-06-03
申请人: Huirong Yao , Jain Yin , Guanyang Lin , Mark Neisser , David Abdallah
发明人: Huirong Yao , Jain Yin , Guanyang Lin , Mark Neisser , David Abdallah
CPC分类号: G03F7/091 , G02B1/04 , G02B1/111 , G03F7/0046 , C08L33/16 , C08L33/24 , C08L33/066 , C08L61/20 , C08L79/08
摘要: The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image.
摘要翻译: 本发明涉及包含第一聚合物和第二聚合物和热酸产生剂的混合物的抗反射涂层,其中第一聚合物包含至少一个氟代醇部分,至少一个脂族羟基部分和至少一个酸部分其它 而pKa在约8至约11的范围内的氟代醇; 其中第二聚合物是氨基塑料化合物与包含至少一个羟基和/或至少一个酸基团的化合物的反应产物。 本发明还涉及使用该组合物形成图像的方法。
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公开(公告)号:US08445181B2
公开(公告)日:2013-05-21
申请号:US12792994
申请日:2010-06-03
申请人: Huirong Yao , Jain Yin , Guanyang Lin , Mark Neisser , David Abdallah
发明人: Huirong Yao , Jain Yin , Guanyang Lin , Mark Neisser , David Abdallah
IPC分类号: G03F7/30 , C09D5/33 , C09D125/02 , C09D133/14 , C09D179/04 , C09D179/08
CPC分类号: G03F7/091 , G02B1/04 , G02B1/111 , G03F7/0046 , C08L33/16 , C08L33/24 , C08L33/066 , C08L61/20 , C08L79/08
摘要: The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image.
摘要翻译: 本发明涉及包含第一聚合物和第二聚合物和热酸产生剂的混合物的抗反射涂层,其中第一聚合物包含至少一个氟代醇部分,至少一个脂族羟基部分和至少一个酸部分其它 而pKa在约8至约11的范围内的氟代醇; 其中第二聚合物是氨基塑料化合物与包含至少一个羟基和/或至少一个酸基团的化合物的反应产物。 本发明还涉及使用该组合物形成图像的方法。
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公开(公告)号:US08465902B2
公开(公告)日:2013-06-18
申请号:US13023291
申请日:2011-02-08
申请人: Huirong Yao , Zachary Bogusz , Guanyang Lin , Mark Neisser
发明人: Huirong Yao , Zachary Bogusz , Guanyang Lin , Mark Neisser
CPC分类号: G03F7/091 , C09D161/24 , G03F7/0046 , G03F7/11 , C08L67/00
摘要: The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV.
摘要翻译: 本发明涉及包含聚合物的底层涂料组合物,其中聚合物包含聚合物苯酚的主链中至少一个羟基芳族单元,其具有包含氟或碘部分的侧基和至少一个包含氨基塑料的单元。 本发明还涉及使用该组合物形成图像的方法,特别是用于EUV。
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公开(公告)号:US20100009297A1
公开(公告)日:2010-01-14
申请号:US12133567
申请日:2008-07-08
申请人: Huirong Yao , Guanyang Lin , Jian Yin , Hengpeng Wu , Mark Neisser , Ralph Dammel
发明人: Huirong Yao , Guanyang Lin , Jian Yin , Hengpeng Wu , Mark Neisser , Ralph Dammel
IPC分类号: G03F7/20 , C08G75/04 , C08G69/08 , C08G75/00 , C08G73/00 , B05D5/06 , C08G73/06 , C08G18/71 , C08G16/00
CPC分类号: G03F7/091 , C08G63/6854 , C08G73/0273 , C08G73/06 , C08G73/0638 , C08G73/0644 , C08G73/0677 , C08L79/04 , C09D167/00 , C09D179/04
摘要: Antireflective coatings and related polymers are disclosed.
摘要翻译: 公开了抗反射涂层和相关聚合物。
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公开(公告)号:US08568958B2
公开(公告)日:2013-10-29
申请号:US13164869
申请日:2011-06-21
申请人: Huirong Yao , Guanyang Lin , Zachary Bogusz , PingHung Lu , WooKyu Kim , Mark Neisser
发明人: Huirong Yao , Guanyang Lin , Zachary Bogusz , PingHung Lu , WooKyu Kim , Mark Neisser
CPC分类号: C08K5/0091 , G03F7/091 , G03F7/094 , C08L33/16 , C08L101/06
摘要: The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
摘要翻译: 本发明涉及包含聚合物,有机钛酸盐化合物和任选的热酸发生剂的底层组合物,其中聚合物包含至少一个氟代醇基团和至少一个环氧基团。 本发明还涉及使用该底层材料作为抗反射涂料组合物和/或用于图案转印的硬掩模的方法。
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公开(公告)号:US08329387B2
公开(公告)日:2012-12-11
申请号:US12133567
申请日:2008-07-08
申请人: Huirong Yao , Guanyang Lin , Jian Yin , Hengpeng Wu , Mark Neisser , Ralph Dammel
发明人: Huirong Yao , Guanyang Lin , Jian Yin , Hengpeng Wu , Mark Neisser , Ralph Dammel
CPC分类号: G03F7/091 , C08G63/6854 , C08G73/0273 , C08G73/06 , C08G73/0638 , C08G73/0644 , C08G73/0677 , C08L79/04 , C09D167/00 , C09D179/04
摘要: The present invention relates to an antireflective coating composition comprising a novel polymer without an aromatic chromophore, where the polymer comprises a structural unit derived from an aminoplast and a structural unit derived from a diol, triol, dithiol, trithiol, other polyols, diacid, triacid, other polyacids, diimide or mixture thereof, where the diol, dithiol, triol, trithiol, diacid, triacid, diimide, diamide or imide-amide optionally contain one or more nitrogen and/or sulfur atoms or contain one or more alkene groups. The invention also relates to the novel polymer and a process for using the novel antireflective coating composition in a lithographic process.
摘要翻译: 本发明涉及一种抗反射涂料组合物,其包含没有芳族发色团的新型聚合物,其中聚合物包含衍生自氨基塑料的结构单元和衍生自二醇,三醇,二硫醇,三硫醇,其它多元醇,二酸,三酸的结构单元 ,其它多元酸,二酰亚胺或其混合物,其中二醇,二硫醇,三醇,三硫醇,二酸,三酸,二酰亚胺,二酰胺或酰亚胺 - 酰胺任选地含有一个或多个氮和/或硫原子或含有一个或多个烯烃基团。 本发明还涉及新型聚合物和在光刻工艺中使用新型抗反射涂料组合物的方法。
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公开(公告)号:US20120202155A1
公开(公告)日:2012-08-09
申请号:US13023291
申请日:2011-02-08
申请人: Huirong Yao , Zachary Bogusz , Guanyang Lin , Mark Neisser
发明人: Huirong Yao , Zachary Bogusz , Guanyang Lin , Mark Neisser
IPC分类号: G03F7/20 , C08L67/00 , C08L61/24 , C09D179/00 , C08L79/04
CPC分类号: G03F7/091 , C09D161/24 , G03F7/0046 , G03F7/11 , C08L67/00
摘要: The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV.
摘要翻译: 本发明涉及包含聚合物的底层涂料组合物,其中聚合物包含聚合物苯酚的主链中至少一个羟基芳族单元,其具有包含氟或碘部分的侧基和至少一个包含氨基塑料的单元。 本发明还涉及使用该组合物形成图像的方法,特别是用于EUV。
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公开(公告)号:US09170494B2
公开(公告)日:2015-10-27
申请号:US13527156
申请日:2012-06-19
申请人: Huirong Yao , Guanyang Lin , JoonYeon Cho
发明人: Huirong Yao , Guanyang Lin , JoonYeon Cho
摘要: The present invention relates to a novel antireflective coating composition comprising a polymer obtained from a reaction product of at least one amino compound chosen from the group consisting of a polymer with repeat unit of structure (1), structure (2) and mixtures thereof reacted with a hydroxy compound chosen from the group consisting of structure (3), structure (4) and mixtures thereof, and, a thermal acid generator. The invention also relates to a process for using the novel composition in lithography.
摘要翻译: 本发明涉及一种新型抗反射涂料组合物,其包含由至少一种氨基化合物的反应产物获得的聚合物,所述反应产物选自具有结构(1)的重复单元的聚合物,结构(2)及其与 选自结构(3),结构(4)及其混合物的羟基化合物,以及热酸产生剂。 本发明还涉及在光刻中使用该新型组合物的方法。
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公开(公告)号:US20110200938A1
公开(公告)日:2011-08-18
申请号:US12708205
申请日:2010-02-18
申请人: Huirong Yao , Guanyang Lin , Jianhui Shan , Joon Yeon Cho , Salem K. Mullen
发明人: Huirong Yao , Guanyang Lin , Jianhui Shan , Joon Yeon Cho , Salem K. Mullen
CPC分类号: G03F7/091
摘要: A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein U1 and U2 are independently a C1-C10 alkylene group; V is selected from a C1-C10 alkylene, arylene and aromatic alkylene; W is selected from H, C1-C10 alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.
摘要翻译: 提供了一种新型抗反射涂料组合物,所述抗反射涂料组合物包含a)式1化合物,b)热酸产生剂,(c)至少一种聚合物,其中U1和U2独立地为C1-C10亚烷基; V选自C 1 -C 10亚烷基,亚芳基和芳族亚烷基; W选自H,C 1 -C 10烷基,芳基,烷基芳基和V-OH; Y选自H,W和U3C(O)OW,其中U3独立地为C1-C10亚烷基,m为1至10.还提供了使用所述组合物作为光刻工艺中的底物的抗反射涂层的方法。
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公开(公告)号:US08551686B2
公开(公告)日:2013-10-08
申请号:US12609222
申请日:2009-10-30
申请人: Huirong Yao , Guanyang Lin , Mark O. Neisser
发明人: Huirong Yao , Guanyang Lin , Mark O. Neisser
IPC分类号: G03F7/11 , G03F7/38 , G03F7/40 , C09D167/00 , H01L21/027
CPC分类号: C09D167/02 , C08G63/16 , G03F7/091
摘要: The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, X is a linking moiety selected from a nonaromatic (A) moiety, aromatic (P) moiety and mixture thereof, R′ is a group of structure (2), R″ is independently selected from hydrogen, a moiety of structure (2), Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbylene linking moiety, and, Y′ is independently a (C1-C20) hydrocarbylene linking moiety, where structure (2) is where R1 and R2 are independently selected from H and C1-C4alkyl and L is an organic hydrocarbyl group. The invention further relates to a process for imaging the antireflective coating composition.
摘要翻译: 本发明涉及一种用于光致抗蚀剂层的抗反射涂料组合物,其包含聚合物,交联剂和酸产生剂,其中聚合物包含至少一个结构单元1,其中X是选自非芳族(A) 部分,芳族(P)部分及其混合物,R'是结构(2)的基团,R“独立地选自氢,结构(2)的部分,Z和W-OH,其中Z是( C1-C20)烃基部分,W是(C1-C20)亚烃基连接部分,Y'独立地是(C1-C20)亚烃基连接部分,其中结构(2)是其中R 1和R 2独立地选自H 和C 1 -C 4烷基,L是有机烃基。 本发明还涉及一种用于对抗反射涂料组合物进行成像的方法。
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