Vacuum system of semiconductor device manufacturing equipment
    4.
    发明申请
    Vacuum system of semiconductor device manufacturing equipment 审中-公开
    半导体器件制造设备的真空系统

    公开(公告)号:US20070193573A1

    公开(公告)日:2007-08-23

    申请号:US11542108

    申请日:2006-10-04

    IPC分类号: F24J1/00 F24J3/00

    摘要: Semiconductor device manufacturing equipment has a vacuum system that enhances the fluency of the gas being discharged from a chamber of the equipment. The vacuum system has a vent line, and a throttle valve that includes a vent line opening and closing member oriented so that it is readily opened by a concentrated flow of gas in the vent line. The vacuum system may include a heating unit that heats the vent line through which the gas passes. Still further, a bend in the vent line upstream of the vent line opening and closing member may have a gently curved shape and/or may subtend an angle of less than 90°. As a result, the efficiency of the ventilation of the process chamber is improved, making it easier to control the pressure of the process chamber and minimizing the contamination of the throttle valve and the vent line.

    摘要翻译: 半导体器件制造设备具有提高从设备的室排出的气体的流畅性的真空系统。 真空系统具有排气管线和节流阀,该节流阀包括排气管路开闭部件,其定向成容易通过排气管线中的浓缩的气流打开。 真空系统可以包括加热单元,加热气体通过的排放管线。 此外,通气线打开和关闭部件上游的通气线的弯曲部可以具有轻微弯曲的形状和/或可以对着小于90°的角度。 结果,提高了处理室的通风效率,使得更容易控制处理室的压力并最小化节流阀和排气管线的污染。

    BALL SUPPORTED SHADOW FRAME
    7.
    发明申请
    BALL SUPPORTED SHADOW FRAME 审中-公开
    球支撑阴影框架

    公开(公告)号:US20100122655A1

    公开(公告)日:2010-05-20

    申请号:US12614479

    申请日:2009-11-09

    IPC分类号: B05C11/00 B23P11/00

    摘要: Embodiments disclosed herein generally include an alignment assembly for aligning a shadow frame on a susceptor. For producing large area flat panel displays or solar panels, the shadow frame that protects the areas of the susceptor not covered by the substrate from deposition may be so large that the shadow frame bends and doesn't properly align. By utilizing an alignment assembly having one or more ball bearings, the shadow frame may roll on the susceptor to a proper alignment position. Thus, the shadow frame may be prevented from bending and also align on the susceptor.

    摘要翻译: 本文公开的实施例通常包括用于对准基座上的阴影框架的对准组件。 为了制造大面积平板显示器或太阳能电池板,保护未被基板覆盖的基座的区域沉积的阴影框架可能太大,使得阴影框架弯曲并且不能正确对准。 通过利用具有一个或多个球轴承的对准组件,阴影框架可以在基座上滚动到适当的对准位置。 因此,可以防止阴影框架弯曲并且在基座上对准。

    Transmitter and receiver for speech coding and decoding by using additional bit allocation method
    8.
    发明申请
    Transmitter and receiver for speech coding and decoding by using additional bit allocation method 有权
    发射机和接收机通过使用附加比特分配方法进行语音编码和解码

    公开(公告)号:US20080162124A1

    公开(公告)日:2008-07-03

    申请号:US12071587

    申请日:2008-02-22

    IPC分类号: G10L19/00

    CPC分类号: G10L19/24 G10L21/038

    摘要: The present invention relates to a transmitter and a receiver for speech coding and decoding by using an additional bit allocation method. The transmitter and the receiver according to the present invention realize a voice communication service of high quality by using additional bits permitted in system requirements while using a conventional speech coder as it is. In addition, the transmitter and the receiver according to the present invention have an advantage in that they enable insertion of additional quantization blocks while not changing the structure of the conventional standard speech coder, since they allocate additional bits by applying a multi-stage quantization procedure not in a speech signal domain but in a parameter domain.

    摘要翻译: 本发明涉及通过使用附加比特分配方法进行语音编码和解码的发射机和接收机。 根据本发明的发射机和接收机按照原来使用传统语音编码器,通过使用系统要求中允许的附加位来实现高质量的语音通信服务。 此外,根据本发明的发射机和接收机具有的优点在于,它们能够插入附加量化块,同时不改变常规标准语音编码器的结构,因为它们通过应用多级量化过程来分配附加比特 不在语音信号域,而是在参数域中。

    METHOD OF CLEANING A SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS
    9.
    发明申请
    METHOD OF CLEANING A SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS 审中-公开
    清洁半导体器件制造设备的方法

    公开(公告)号:US20130025624A1

    公开(公告)日:2013-01-31

    申请号:US13546645

    申请日:2012-07-11

    IPC分类号: B08B7/00

    CPC分类号: C23C16/4405

    摘要: According to example embodiments, there is provided a method of cleaning a semiconductor device manufacturing apparatus. In the method, a fluorine-containing gas is provided into a chamber to clean a byproduct formed on a surface of a chamber during formation of a layer structure therein. A material is provided into the chamber to chemisorb the material on the surface of the chamber. The material is substantially similar to or the same as a source gas for forming the layer structure. A plasma is generated in the chamber, and the chamber is purged.

    摘要翻译: 根据示例性实施例,提供了一种清洁半导体器件制造装置的方法。 在该方法中,在室内形成层状结构时,在室内设置含氟气体,以清洗形成在室的表面上的副产物。 将一种材料提供到腔室中以化学吸附腔室表面上的材料。 该材料基本上与形成层结构的源气体相似或相同。 在室中产生等离子体,并且室被清除。

    Shadow frame
    10.
    外观设计
    Shadow frame 有权
    阴影框架

    公开(公告)号:USD631858S1

    公开(公告)日:2011-02-01

    申请号:US29327995

    申请日:2008-11-17

    申请人: Kyung-Tae Kim

    设计人: Kyung-Tae Kim