摘要:
The present invention relates to a continuous shear deformation device. In order to occur shear deformation at the position at which a material is inserted into a molding path from a rotary guide apparatus for the purpose of solving the problem that the amount of shear deformation of a material is non-uniform and insufficient due to the gap between the curved portion of the molding path and the lower parts of the material, there is provided a continuous shear deformation device, characterized in that a curved portion is constructed by collaboration between the rotary guide apparatus and the molding path. In addition, there are provided additional constructions for effectively performing shear deformation by a small power by reducing the friction at the molding path excepting the curved portion. The present invention thusly constructed can be utilized for continuously and effectively mass-produce sheared materials.
摘要:
The present invention relates to a shear deformation device. To improve the productivity by solving the problem that the amount of shear deformation of a material is not uniform and sufficient due to the gap between the curved portion of the molding path and the lower parts of the material and omitting any additional process for removing irregularity and surface products on the surface of the material, there is provided a shear deformation device capable of scalping, characterized in that a scalping guide path which allows the surface of the material to be separated from the other portions of the material as the material is scalped at a predetermined thickness when passing through the curved portion during shear deformation is formed in the curved portion in communication with the molding path. In addition, there are provided additional constructions for effectively performing shear deformation by a small power by reducing the friction at the molding path excepting the curved portion. The present invention thusly constructed can be utilized for continuously and effectively mass-produce sheared materials.
摘要:
In a method for fabricating a Si—Al alloy packaging material, by adding Al—Si alloy powders to Si powders and pressurizing-forming it, or by pressurizing-filling Si powders or a preforming body of Si powders with Al—Si alloy melt, a Si—Al alloy packaging material having good characteristics can be obtained.
摘要:
Disclosed is (S)-(−)-amlodipine camsylate or a hydrate thereof having good photostability and high solubility, and a pharmaceutical composition comprising same, which can be efficiently used in treating cardiovascular diseases.
摘要:
The present invention relates to a novel microorganism, Corynebacterium ammoniagenes strain CJIP009 having Accession No. KCCM-10226, which is capable of producing 5′-inosinic acid and a process for producing 5′-inosinic acid using the same.
摘要:
3R-carboxylate enantiomer derivative of formula (III) can be prepared easily and selectively by the method of the present invention, and a highly pure D-erythro-2,2-difluoro-2-deoxy-1-oxoribose derivative can be prepared efficiently from the compound of formula (III) as an intermediate.
摘要:
A method of cleaning a reaction chamber is provided. In the method, a wafer is removed from the reaction chamber, and a nitrogen triflouride (NF3) gas or NF3 plasma is implanted into the reaction chamber. The NF3 gas or NF3 plasma reacts with a phosphorous polymer located in the reaction chamber, and the phosphorus polymer is removed from the reaction chamber.
摘要翻译:提供一种清洁反应室的方法。 在该方法中,将晶片从反应室中取出,并将氮三氟化氮(NF 3 3)气体或者NF 3等离子体注入到反应室中。 NF 3气体或NF 3 N 3等离子体与位于反应室中的磷聚合物反应,并将磷聚合物从反应室中除去。
摘要:
An apparatus and method for schedule setting in a portable communication system are provided. The apparatus includes an event manager for performing a process to set a schedule by appointing a duration of a day intended to perform schedule setting by a touch, or a process to set a schedule by a touch input defining a predefined menu input for the schedule setting.
摘要:
Disclosed is a device for sensing the opening degree of a valve, which can easily determine the upper and lower limits without using upper and lower limit switches so that, besides simplifying the mechanical structure, the device can be easily installed, maintained, and repaired. The device can avoid basic errors and improve the opening degree sensing performance without using upper and lower limit switches, cams, and a spline so that, by simplifying the mechanical structure, the device can be manufactured, installed, maintained, and repaired at a low cost, and its long-term durability is improved. The device has a main gear adapted to disengage from the meter gear when the main gear is rotated excessively so that any damage to the meter gear and potentiometer, which may occur during installation or use, is prevented.
摘要:
There are provided a method and an apparatus of forming an insulating layer including silicon oxynitride. The method includes performing a plasma treatment process for supplying a plasma reaction gas to a substrate to be treated after completing the annealing process. The apparatus includes as sealed processing room having gas supply and exhaust lines running thereto. A quartz inner tube and quartz inlet pipe both include holes therethrough, but in orthogonal directions to one another, to flow a reaction gas onto the wafers loaded within the sealed processing room.