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公开(公告)号：US20110262625A1
公开(公告)日：2011-10-27
申请号：US13176701
申请日：2011-07-05
申请人： Hyun-Sook PARK , Chang-Mog Jo , Hee-Cheol Kang , Yun-Mi Lee , Un-Cheol Sung , Yong-Sup Choi , Jong-Heon Kim , Jae-Kwang Ryu
发明人： Hyun-Sook PARK , Chang-Mog Jo , Hee-Cheol Kang , Yun-Mi Lee , Un-Cheol Sung , Yong-Sup Choi , Jong-Heon Kim , Jae-Kwang Ryu
CPC分类号： C23C14/042 , C23C14/12 , C23C14/24
摘要： A thin film deposition apparatus including a chamber; a deposition source accommodated in the chamber and configured to discharge a deposition material; a deposition source nozzle unit located at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet located opposite the deposition source nozzle unit inside the chamber and including a plurality of patterning slits arranged in a second direction perpendicular to the first direction, the patterning slit sheet being spaced apart from the substrate, and the thin film deposition apparatus being configured to perform a deposition while at least one of the substrate or the thin film deposition apparatus moves relative to the other in the first direction.
摘要翻译： 一种薄膜沉积设备，包括：室; 沉积源，其容纳在所述室中并且构造成排出沉积材料; 沉积源喷嘴单元，位于沉积源的一侧并且包括沿第一方向布置的多个沉积源喷嘴; 以及图案化缝隙片，其与所述腔室内的所述沉积源喷嘴单元相对，并且包括沿垂直于所述第一方向的第二方向布置的多个图案化狭缝，所述图案化缝隙片与所述衬底间隔开，并且所述薄膜沉积设备 被配置为在所述基板或所述薄膜沉积装置中的至少一个在所述第一方向上相对于另一个移动时执行沉积。
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公开(公告)号：US20110165327A1
公开(公告)日：2011-07-07
申请号：US12979656
申请日：2010-12-28
申请人： Hyun-Sook PARK , Chang-Mog JO , Hee-Cheol KANG , Yun-Mi LEE , Un-Cheol SUNG , Yong-Sun CHOI , Jong-Heon KIM , Jae-Kwang RYU
发明人： Hyun-Sook PARK , Chang-Mog JO , Hee-Cheol KANG , Yun-Mi LEE , Un-Cheol SUNG , Yong-Sun CHOI , Jong-Heon KIM , Jae-Kwang RYU
CPC分类号： C23C14/24 , C23C14/042 , H01L51/001
摘要： A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.
摘要翻译： 一种薄膜沉积装置，其可以简单地应用于大规模生产大尺寸显示装置并且提高制造产量。 薄膜沉积装置包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 以及与沉积源喷嘴单元相对设置并包括沿垂直于第一方向的第二方向布置的多个图案化狭缝的图案化缝隙片。 当基板或薄膜沉积装置在第一方向上相对移动时进行沉积，并且沉积源，沉积源喷嘴单元和图案化缝隙片彼此一体地形成。
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3.发明申请公开(公告)号：US20110042659A1
公开(公告)日：2011-02-24
申请号：US12836760
申请日：2010-07-15
申请人： Jong-Heon KIM , Hyun-Sook PARK , Jae-Kwang RYU , Hee-Cheol KANG , Ji-Sook OH
发明人： Jong-Heon KIM , Hyun-Sook PARK , Jae-Kwang RYU , Hee-Cheol KANG , Ji-Sook OH
CPC分类号： C23C14/042 , C23C14/12 , C23C14/243 , H01L51/0011 , H01L51/56
摘要： A thin film deposition apparatus that includes a thin film deposition assembly incorporating: a deposition source that discharges a deposition material; a deposition source nozzle unit that is disposed at a side of the deposition source and includes a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet that is disposed opposite to the deposition source nozzle unit and includes a plurality of patterning slits arranged in the first direction; and a barrier plate assembly including a plurality of barrier plates that are disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, and partition a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces, wherein each of the barrier plates is separate from the patterning slit sheet.
摘要翻译： 一种薄膜沉积设备，包括：薄膜沉积组件，其包括：沉积源，其沉积沉积材料; 沉积源喷嘴单元，其设置在沉积源的一侧并且包括沿第一方向布置的多个沉积源喷嘴; 图案化缝隙片，其与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的多个图案化狭缝; 以及阻挡板组件，其包括沿着所述第一方向设置在所述沉积源喷嘴单元和所述图案化缝隙片之间的多个阻挡板，并且将所述沉积源喷嘴单元和所述图案化缝隙片之间的空间分隔成多个子 - 沉积空间，其中每个阻挡板与图案化缝隙片分离。
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