Monolithic visible-infrared focal plane array on silicon

    公开(公告)号:US10043845B2

    公开(公告)日:2018-08-07

    申请号:US15416301

    申请日:2017-01-26

    摘要: A structure includes a silicon substrate; silicon readout circuitry disposed on a first portion of a top surface of the substrate and a radiation detecting pixel disposed on a second portion of the top surface of the substrate. The pixel has a plurality of radiation detectors connected with the readout circuitry. The plurality of radiation detectors are composed of at least one visible wavelength radiation detector containing germanium and at least one infrared wavelength radiation detector containing a Group III-V semiconductor material. A method includes providing a silicon substrate; forming silicon readout circuitry on a first portion of a top surface of the substrate and forming a radiation detecting pixel, on a second portion of the top surface of the substrate, that has a plurality of radiation detectors formed to contain a visible wavelength detector composed of germanium and an infrared wavelength detector composed of a Group III-V semiconductor material.

    Monolithic visible-infrared focal plane array on silicon
    10.
    发明授权
    Monolithic visible-infrared focal plane array on silicon 有权
    硅片上的单片可见红外焦平面阵列

    公开(公告)号:US09472588B1

    公开(公告)日:2016-10-18

    申请号:US14744210

    申请日:2015-06-19

    摘要: A structure includes a silicon substrate; silicon readout circuitry disposed on a first portion of a top surface of the substrate and a radiation detecting pixel disposed on a second portion of the top surface of the substrate. The pixel has a plurality of radiation detectors connected with the readout circuitry. The plurality of radiation detectors are composed of at least one visible wavelength radiation detector containing germanium and at least one infrared wavelength radiation detector containing a Group III-V semiconductor material. A method includes providing a silicon substrate; forming silicon readout circuitry on a first portion of a top surface of the substrate and forming a radiation detecting pixel, on a second portion of the top surface of the substrate, that has a plurality of radiation detectors formed to contain a visible wavelength detector composed of germanium and an infrared wavelength detector composed of a Group III-V semiconductor material.

    摘要翻译: 一种结构包括硅衬底; 硅读出电路设置在衬底的顶表面的第一部分上,辐射检测像素设置在衬底顶表面的第二部分上。 像素具有与读出电路相连的多个辐射检测器。 多个辐射检测器由至少一个含有锗的可见波长辐射检测器和至少一个含有III-V族半导体材料的红外波长辐射检测器组成。 一种方法包括提供硅衬底; 在所述衬底的顶表面的第一部分上形成硅读出电路,并在所述衬底的顶表面的第二部分上形成辐射检测像素,所述第二部分具有多个辐射检测器,所述辐射检测器形成为容纳可见波长检测器,所述可见波长检测器由 锗和由III-V族半导体材料组成的红外波长检测器。