公开(公告)号：US5514259A

公开(公告)日：1996-05-07

申请号：US158821

申请日：1993-11-26

申请人： Junji Shiota ,  Ichiro Ohno ,  Hidetaka Uchiumi

发明人： Junji Shiota ,  Ichiro Ohno ,  Hidetaka Uchiumi

IPC分类号： C23C14/35 ,  H01J37/34 ,  H01L21/203 ,  H01L21/285 ,  C23C14/34

CPC分类号： H01J37/3405

摘要： A sputtering apparatus has a pressure resistant vessel, from which gas in discharged and into which gas for sputtering is supplied, a substrate disposed in the vessel to be formed with a film at one surface thereof, a target disposed oppositely to one surface of the substrate to be formed of a substance to become a material of the film, a magnet provided on the surface of the target oppositely to the substrate to generate a magnetic field for confining a plasma in the vicinity of the surface of the target opposed to the substrate, a plate-shaped anode disposed between the substrate and the target to be formed with an opening of the shape in which at least one side is larger than the profile of the substrate at a position opposed to the substrate, and a sputtering current supplier between the anode and the target. The anode is made of a conductor. An opening larger than the profile of the substrate is formed at a position of the anode opposed to the substrate.

摘要翻译： 溅射装置具有耐压容器，从其中排出的气体和用于溅射的气体被供应到设置在容器中的基板，以在其一个表面形成膜，与基板的一个表面相对设置的靶 由成为该材料的物质形成，与该基板相对地设置在该靶的表面上的磁体，以产生用于将等离子体限制在与该基板相对的靶的表面附近的磁场， 设置在所述基板和所述靶材之间的板状阳极，以形成所述形状的开口，其中至少一侧比所述基板的与所述基板相对的位置处的所述基板的轮廓大，以及所述溅射电流供应器 阳极和目标。 阳极由导体制成。 在与基板相对的阳极的位置处形成大于基板的轮廓的开口。

公开(公告)号：US4975168A

公开(公告)日：1990-12-04

申请号：US339474

申请日：1989-04-17

申请人： Ichiro Ohno ,  Junji Shiota ,  Hidetaka Uchiumi

发明人： Ichiro Ohno ,  Junji Shiota ,  Hidetaka Uchiumi

IPC分类号： C23C14/08 ,  C23C14/00 ,  C23C14/34 ,  C23C14/54 ,  H01J37/32

CPC分类号： H01J37/3244 ,  C23C14/0042 ,  C23C14/547

摘要： A method of forming a transparent conductive thin film by sputtering includes the step of placing a target consisting of a conductive oxide material and a substrate on which the thin film is to be formed in a pressure vessel, the step of supplying argon gas and oxygen gas after the pressure vessel is substantially evacuated, the step of supplying a sputtering current to the target to maintain a discharge state, the step of detecting the partial pressure of oxygen in the gas mixture in the pressure chamber, and the step of controlling the flow rate of oxygen gas. The flow rate of the oxygen gas is controlled by a control unit such that the value of the partial pressure of oxygen which is detected in the partial pressure detection step is always kept constant.

摘要翻译： 通过溅射形成透明导电薄膜的方法包括将由导电氧化物材料构成的靶和在其上形成薄膜的基板放置在压力容器中的步骤，提供氩气和氧气的步骤 在压力容器基本抽真空之后，向靶提供溅射电流以维持放电状态的步骤，检测压力室中的气体混合物中的氧分压的步骤和控制流量的步骤 的氧气。 氧气的流量由控制单元控制，使得在分压检测步骤中检测到的氧的分压值总是保持恒定。