STRUCTURING OF ANTISTATIC AND ANTIREFLECTION COATINGS AND OF CORRESPONDING STACKED LAYERS
    5.
    发明申请
    STRUCTURING OF ANTISTATIC AND ANTIREFLECTION COATINGS AND OF CORRESPONDING STACKED LAYERS 审中-公开
    抗静电和抗反射涂层的结构和相应的堆叠层的结构

    公开(公告)号:US20140166613A1

    公开(公告)日:2014-06-19

    申请号:US14233464

    申请日:2012-06-19

    IPC分类号: H01B13/00

    摘要: The present invention relates to compositions which are particularly suitable for the etching and structuring of transparent, conductive antireflection coatings and of corresponding stacked layers, which are preferably present in touch-sensitive display screens or display elements. The latter are generally also known as touch-sensitive displays, touch panels or touch screens. In particular, these are compositions by means of which fine structures can be etched selectively into conductive transparent oxidic layers and into corresponding layer stacks.

    摘要翻译: 本发明涉及特别适用于蚀刻和结构化透明导电抗反射涂层和相应叠层的组合物,其优选存在于触敏显示屏或显示元件中。 后者通常也称为触敏显示器,触摸面板或触摸屏。 特别地,这些是通过这些组合物可以将精细结构选择性地蚀刻到导电透明氧化物层中并进入相应的层叠层。

    Edge deletion of thin-layer solar modules by etching
    9.
    发明授权
    Edge deletion of thin-layer solar modules by etching 失效
    通过蚀刻边缘删除薄层太阳能电池组件

    公开(公告)号:US08497215B2

    公开(公告)日:2013-07-30

    申请号:US13061274

    申请日:2009-08-05

    摘要: The present invention relates to a method for the wet-chemical edge deletion of solar cells. An etching paste is applied to the edge of a solar cell substrate surface and after the reaction is complete, the paste residue is removed. Optionally, the substrate surface is cleaned and dried. The etching paste comprises 85% H3PO4, NH4HF2 and 65% HNO3 in a ratio in the range from 7:1:1.5 to 10:1:3.5, based on the weight.

    摘要翻译: 本发明涉及太阳能电池湿化学边缘缺失的方法。 将蚀刻膏施加到太阳能电池基板表面的边缘,反应完成后,除去糊状残留物。 任选地,清洁和干燥基底表面。 基于重量,蚀刻浆料包含85%H 3 PO 4,NH 4 HF 2和65%HNO 3,其比例为7:1:1.5至10:1:3.5。

    Two component etching
    10.
    发明授权
    Two component etching 失效
    双组分刻蚀

    公开(公告)号:US08647526B2

    公开(公告)日:2014-02-11

    申请号:US13375812

    申请日:2010-05-12

    IPC分类号: C09K13/04 B44C1/22

    摘要: The object of the present invention is a new inkjet printable etching composition comprising an etchant, which is activated by a second component. Thus, a further object is the use of this new composition in a process for the etching of surfaces semiconductor devices or surfaces of solar cell devices.

    摘要翻译: 本发明的目的是一种新的可喷墨印刷蚀刻组合物,其包括由第二组分激活的蚀刻剂。 因此,另一个目的是在用于蚀刻表面半导体器件或太阳能电池器件表面的工艺中使用这种新组合物。