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公开(公告)号:US6139973A
公开(公告)日:2000-10-31
申请号:US90334
申请日:1998-06-04
申请人: Iwao Kawasaki , Yutaka Okabayashi , Masatake Higashi
发明人: Iwao Kawasaki , Yutaka Okabayashi , Masatake Higashi
IPC分类号: C25D9/10
CPC分类号: C25D9/10
摘要: A thin sulfurizing layer having high iron-sulfide content is formed by an electrolytic deposition method using an alkaline electrolytic solution which contains ferric ions, sulfide and a chelating agent of the ferric ions.
摘要翻译: 通过使用含有铁离子,硫化物和铁离子的螯合剂的碱性电解液的电解沉积法形成具有高硫化铁含量的薄硫化层。