公开(公告)号：US07959776B2

公开(公告)日：2011-06-14

申请号：US12323287

申请日：2008-11-25

申请人： Jörg Krempel-Hesse ,  Andreas Jischke ,  Uwe Schüβler ,  Hans Wolf

发明人： Jörg Krempel-Hesse ,  Andreas Jischke ,  Uwe Schüβler ,  Hans Wolf

IPC分类号： C23C14/34

CPC分类号： C23C14/3407

摘要： Claimed is a sputtering target system comprising a plurality of backing plates to be individually cooled. Each backing plate is provided on its back side with a meandering groove that is closed off by a sealing plate. The sealing plate is welded around its circumference to the backing plate and at the same time is welded to at least one ridge located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate.

摘要翻译： 所要求的是一种溅射靶系统，其包括要单独冷却的多个背板。 每个背板在其背侧设置有由密封板封闭的曲折槽。 密封板围绕其圆周焊接到背板上，并且同时被焊接到位于与框架相距一定距离的至少一个脊部，其将两个凹槽部分彼此分开。 这样焊接到背板上的密封板不仅封闭了凹槽以形成冷却通道，而且还用于加固相对平坦的背板。

公开(公告)号：US08715471B2

公开(公告)日：2014-05-06

申请号：US11284439

申请日：2005-11-21

申请人： Jörg Krempel-Hesse ,  Andreas Jischke ,  Uwe Schüssler ,  Hans Wolf

发明人： Jörg Krempel-Hesse ,  Andreas Jischke ,  Uwe Schüssler ,  Hans Wolf

IPC分类号： C23C14/35

CPC分类号： H01J37/3497 ,  C23C14/3407 ,  H01J37/3408

摘要： To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).

摘要翻译： 为了能够实现相对宽的磁控溅射阴极，提出在载体（2）的真空侧上设置带有背板（3）的溅射靶（4），其将间隙（14）从 载体（2）。 背板（3）显影为冷却板。 在其中设置有冷却装置通道（15），其通过载体（2）的入口（16）被供应冷却流体，冷却流体可以经由出口（17）再次通过载体（2）流出。 在大气一侧设有磁铁配置（5）。

公开(公告)号：US20060108217A1

公开(公告)日：2006-05-25

申请号：US11068538

申请日：2005-02-28

申请人： Jorg Krempel-Hesse ,  Andreas Jischke ,  Uwe Schussler ,  Hans Wolf

发明人： Jorg Krempel-Hesse ,  Andreas Jischke ,  Uwe Schussler ,  Hans Wolf

IPC分类号： C23C14/00

CPC分类号： C23C14/3407

摘要： Claimed is a sputtering target system comprising a plurality of backing plates (2, 3, 4) to be individually cooled. Each backing plate (2, 3, 4) is provided on its back side with a meandering groove (5) that is closed off by a sealing plate. The sealing plate (9) is welded around its circumference to the backing plate (2), and at the same time is welded to at least one ridge (7), located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate (3) not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate (20).

摘要翻译： 所要求的是一种溅射靶系统，包括要单独冷却的多个背板（2,3,4）。 每个背板（2,3,4）在其后侧设置有由密封板封闭的曲折槽（5）。 密封板（9）围绕其圆周焊接到背板（2）上，并且同时被焊接到至少一个与框架一定距离的脊（7），所述脊（7）将两个凹槽部分与一个 另一个。 这样焊接到背板（3）的密封板不仅封闭凹槽以形成冷却通道，而且还用于加强相对平坦的背板（20）。

公开(公告)号：US20060118412A1

公开(公告)日：2006-06-08

申请号：US11284439

申请日：2005-11-21

申请人： Jorg Krempel-Hesse ,  Andreas Jischke ,  Uwe Schussler ,  Hans Wolf

发明人： Jorg Krempel-Hesse ,  Andreas Jischke ,  Uwe Schussler ,  Hans Wolf

IPC分类号： C23C14/00

CPC分类号： H01J37/3497 ,  C23C14/3407 ,  H01J37/3408

摘要： To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).

摘要翻译： 为了能够实现相对宽的磁控溅射阴极，提出在载体（2）的真空侧上设置带有背板（3）的溅射靶（4），其将间隙（14）从 载体（2）。 背板（3）显影为冷却板。 在其中设置有冷却装置通道（15），其通过载体（2）的入口（16）被供应冷却流体，冷却流体可以经由出口（17）再次通过载体（2）流出。 在大气一侧设有磁铁配置（5）。

公开(公告)号：US20050178660A1

公开(公告)日：2005-08-18

申请号：US10797925

申请日：2004-03-10

申请人： Andreas Lopp ,  Andreas Jischke ,  Michael Geisler ,  Herbert Pfeiffer ,  Jorg Krempel-Hesse

发明人： Andreas Lopp ,  Andreas Jischke ,  Michael Geisler ,  Herbert Pfeiffer ,  Jorg Krempel-Hesse

IPC分类号： C23C14/35 ,  H01J37/34 ,  H01L21/285

CPC分类号： H01J37/3408 ,  C23C14/35 ,  H01J37/3452

摘要： The invention relates to a sputter arrangement with a magnetron and a target, with the magnetron and the target being movable relative to one another. The magnetron comprises a magnet system, which forms a quasi-rectangular plasma tube, whose two longitudinal sides have a distance C from one another. If target and magnet system are moved relative to one another by a path corresponding approximately to the distance C, the magnet system is laid out such that the width at the end of the plasma tube is smaller or equal to the diameter of the plasma tube. However, if the path of the relative movement is less than C, the magnet system is laid out such that the width d of the ends of the plasma tube is less or equal to twice the diameter of the plasma tube.

摘要翻译： 本发明涉及一种具有磁控管和靶的溅射装置，其中磁控管和靶可相对于彼此移动。 磁控管包括形成准矩形等离子体管的磁体系统，其两个纵向边彼此具有距离C. 如果目标和磁体系统通过相当于距离C的路径相对移动，则磁体系统布置成等离子体管末端的宽度小于或等于等离子体管的直径。 然而，如果相对运动的路径小于C，则磁体系统布置成等离子体管的端部的宽度d小于等于等离子体管的直径的两倍。

公开(公告)号：US20070231111A1

公开(公告)日：2007-10-04

申请号：US11709929

申请日：2007-02-21

申请人： Oliver Heimel ,  Andreas Jischke ,  Dieter Haas

发明人： Oliver Heimel ,  Andreas Jischke ,  Dieter Haas

IPC分类号： H01L21/677

CPC分类号： B65G49/061 ,  B65G2249/02

摘要： The present invention concerns a device for transporting substrates through vacuum chambers, especially coating machines with a substrate carrier on or at which the substrates can be arranged, wherein the substrate carrier has at least one guide raid which extends along at least one side of the substrate carrier, and wherein the guide rail is kept spaced apart from the substrate carrier by one or just a few spaced bearings.

摘要翻译： 本发明涉及一种用于通过真空室输送基材的装置，特别是具有可以布置基板的基板载体的涂布机，其中基板载体具有沿基板的至少一侧延伸的至少一个导向突起 载体，并且其中导轨通过一个或仅几个间隔的轴承与衬底载体保持间隔开。

公开(公告)号：US08282089B2

公开(公告)日：2012-10-09

申请号：US11709929

申请日：2007-02-21

申请人： Oliver Heimel ,  Andreas Jischke ,  Dieter Haas

发明人： Oliver Heimel ,  Andreas Jischke ,  Dieter Haas

IPC分类号： B23P17/04

CPC分类号： B65G49/061 ,  B65G2249/02

摘要： The present invention concerns a device for transporting substrates through vacuum chambers, especially coating machines with a substrate carrier on or at which the substrates can be arranged, wherein the substrate carrier has at least one guide rail which extends along at least one side of the substrate carrier, and wherein the guide rail is kept spaced apart from the substrate carrier by one or just a few spaced bearings.

摘要翻译： 本发明涉及一种用于通过真空室输送基材的装置，特别是具有可以布置基板的基板载体的涂布机，其中基板载体具有沿基板的至少一侧延伸的至少一个导轨 载体，并且其中导轨通过一个或仅几个间隔的轴承与衬底载体保持间隔开。