利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

30 条记录 (耗时 0.028 秒)

    Apparatus for fabricating a conformal thin film on a substrate
    3.
    发明申请
    Apparatus for fabricating a conformal thin film on a substrate 审中-公开
    用于在基板上制造保形薄膜的装置

    公开(公告)号：US20050166843A1

    公开(公告)日：2005-08-04

    申请号：US11050201

    申请日：2005-02-03

    申请人： Jacques Kools ,  Randhir Bubber ,  Ming Mao ,  Thomas Schneider ,  Jinsong Wang

    发明人： Jacques Kools ,  Randhir Bubber ,  Ming Mao ,  Thomas Schneider ,  Jinsong Wang

    IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/00

    CPC分类号： C23C16/45544 ,  C23C16/45565 ,  C23C16/45591

    摘要： An apparatus for fabricating a conformal thin film on a substrate are disclosed. The apparatus includes a top shield having a top surface and a bottom surface and a bottom shield having an aperture formed therein and a thickness. The bottom shield is coupled to the bottom surface of the top shield such that the top shield covers the aperture. The apparatus further includes a substrate holder that may hold a substrate. The substrate holder is in contact with the bottom shield such that a reaction chamber is formed having a volume defined by the aperture and the thickness of the bottom shield.

    摘要翻译： 公开了一种在衬底上制造保形薄膜的装置。 该装置包括具有顶部表面和底部表面的顶部屏蔽以及具有形成在其中的孔的厚度的底部屏蔽件。 底部屏蔽件联接到顶部屏蔽的底部表面，使得顶部屏蔽罩覆盖孔。 该装置还包括可以保持衬底的衬底保持器。 衬底保持器与底部屏蔽件接触，使得形成具有由孔的尺寸和底部屏蔽件的厚度的反应室。

    Method and apparatus for decreasing deposition time of a thin film
    7.
    发明申请
    Method and apparatus for decreasing deposition time of a thin film 审中-公开
    降低薄膜沉积时间的方法和装置

    公开(公告)号：US20060272577A1

    公开(公告)日：2006-12-07

    申请号：US11145273

    申请日：2005-06-03

    申请人： Ming Mao ,  Randhir Bubber ,  Thomas Schneider

    发明人： Ming Mao ,  Randhir Bubber ,  Thomas Schneider

    IPC分类号： C23C16/00

    CPC分类号： C23C16/45544 ,  C23C16/403 ,  C23C16/45504 ,  C23C16/4585 ,  C23C16/4586

    摘要： A method and apparatus for decreasing deposition time of a thin film are disclosed. The apparatus includes a removable shield assembly disposed in a vacuum chamber. The shield assembly forms an enclosure to house a substrate during an ALD process. A gas line coupled to the shield assembly introduces a gas into the enclosure to form a thin film on a surface of the substrate. A final valve is associated with the gas line and located proximate the shield assembly such that placement of the final valve with respect to the shield assembly provides fast delivery of the gas into the enclosure.

    摘要翻译： 公开了减少薄膜沉积时间的方法和装置。 该装置包括设置在真空室中的可移除的屏蔽组件。 屏蔽组件在ALD过程期间形成用于容纳衬底的外壳。 耦合到屏蔽组件的气体线将气体引入外壳中以在基板的表面上形成薄膜。 最终的阀与气体管线相关联并且位于屏蔽组件附近，使得最终阀相对于屏蔽组件的放置提供气体快速传送到外壳中。

    Method and system for providing a hard bias structure in a magnetic recording transducer
    8.
    发明授权
    Method and system for providing a hard bias structure in a magnetic recording transducer 有权
    在磁记录传感器中提供硬偏置结构的方法和系统

    公开(公告)号：US08547667B1

    公开(公告)日：2013-10-01

    申请号：US12324735

    申请日：2008-11-26

    申请人： Anup Ghosh Roy ,  Ming Mao ,  Mahendra Pakala

    发明人： Anup Ghosh Roy ,  Ming Mao ,  Mahendra Pakala

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3932

    摘要： A method and system for providing a magnetic transducer is described. The method and system include providing a seed layer and providing at least one adjustment layer on the seed layer. The method and system also include providing a hard bias structure on the at least one adjustment layer. The seed layer has a first template including a first template dimension and a first texture. The at least one adjustment layer has a second template including a second template dimension and a second texture. The hard bias structure has a third template including a third template dimension and a third texture. The second template is between the first template and the third template.

    摘要翻译： 描述了一种用于提供磁换能器的方法和系统。 该方法和系统包括提供种子层并在种子层上提供至少一个调节层。 该方法和系统还包括在至少一个调节层上提供硬偏压结构。 种子层具有包括第一模板尺寸和第一纹理的第一模板。 所述至少一个调整层具有包括第二模板尺寸和第二纹理的第二模板。 硬偏置结构具有包括第三模板尺寸和第三纹理的第三模板。 第二个模板位于第一个模板和第三个模板之间。

    Sputter deposition system and methods of use
    9.
    发明申请
    Sputter deposition system and methods of use 审中-公开
    溅射沉积系统及其使用方法

    公开(公告)号：US20070209932A1

    公开(公告)日：2007-09-13

    申请号：US11372517

    申请日：2006-03-10

    申请人： Piero Sferlazzo ,  Ming Mao ,  Jinliang Chen ,  David Felsenthal ,  Robert Hieronymi ,  Miroslav Eror

    发明人： Piero Sferlazzo ,  Ming Mao ,  Jinliang Chen ,  David Felsenthal ,  Robert Hieronymi ,  Miroslav Eror

    IPC分类号： C23C14/00

    CPC分类号： C23C14/352 ,  C23C14/505 ,  C23C14/568 ,  C23C14/5833

    摘要： The present invention relates to a sputter deposition system and to methods of use thereof for processing substrates using planetary sputter deposition methods. The sputter deposition system includes a deposition chamber having an azimuthal axis. A rotatable member is situated in the chamber and includes a plurality of magnetrons provided thereon. Each magnetron includes a corresponding one of a plurality of sputtering targets. The rotatable member is configured to position each of the magnetrons to direct sputtered material from the corresponding one of the sputtering targets to a deposition zone defined in the deposition chamber. A transport mechanism is situated in the deposition chamber and includes an arm rotatable about the azimuthal axis. A substrate holder is attached to the arm of the transport mechanism and supports the substrate as the arm rotates the substrate holder to intersect the deposition zone for depositing sputtered material on the substrate.

    摘要翻译： 溅射沉积系统技术领域本发明涉及一种溅射沉积系统及其使用方法，用于使用行星式溅射沉积方法来处理衬底 溅射沉积系统包括具有方位角轴的沉积室。 可旋转构件位于腔室中并且包括设置在其上的多个磁控管。 每个磁控管包括多个溅射靶中相应的一个。 可旋转构件被构造成定位每个磁控管以将溅射的材料从相应的一个溅射靶引导到在沉积室中限定的沉积区。 输送机构位于沉积室中并且包括可围绕方位轴线旋转的臂。 衬底保持器附接到输送机构的臂上并且当臂旋转衬底保持器以与沉积区相交以在基底上沉积溅射材料时支撑衬底。

    Method and system for defining a read sensor using an ion mill planarization
    10.
    发明授权
    Method and system for defining a read sensor using an ion mill planarization 有权
    使用离子磨机平面化定义读取传感器的方法和系统

    公开(公告)号：US08597528B1

    公开(公告)日：2013-12-03

    申请号：US13076103

    申请日：2011-03-30

    申请人： Anup G. Roy ,  Ming Mao

    发明人： Anup G. Roy ,  Ming Mao

    IPC分类号： B44C1/22

    CPC分类号： H01L43/12 ,  G01R33/093 ,  G01R33/098 ,  G11B5/3163 ,  G11B5/3932

    摘要： A method and system for fabricating a magnetic transducer is described. A magnetic junction is defined from the magnetoresistive stack. The magnetic junction has a top and a plurality of sides. The step of defining the magnetic junction redeposits a portion of the magnetoresistive stack and forms fencing adjacent to the top of the magnetic junction. At least one hard bias structure is provided after the magnetic junction is defined. A first portion of the at least one hard bias structure is substantially adjacent to the magnetoresistive junction in a track-width direction. The magnetic junction is ion beam planarized, thereby substantially removing the fencing.

    摘要翻译： 描述了用于制造磁换能器的方法和系统。 从磁阻叠层定义磁结。 磁性接头具有顶部和多个侧面。 限定磁结的步骤重新沉积磁阻堆叠的一部分并且形成与磁结的顶部相邻的围栏。 在确定了磁结后，提供了至少一个硬偏置结构。 至少一个硬偏压结构的第一部分基本上与轨道宽度方向上的磁阻结相邻。 磁结是离子束平坦化的，从而基本上除去围栏。