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公开(公告)号：US20110197759A1
公开(公告)日：2011-08-18
申请号：US11990255
申请日：2006-07-27
IPC分类号： B03C3/34
CPC分类号： H01J37/32844 , H01J37/32192 , H01J37/32229 , Y02C20/30
摘要： A method is described for treating gas exhaust from a polysilicon etch process, which uses a plasma abatement device to treat the gas. The device comprises a stainless steel gas chamber having a gas inlet for receiving the gas and a gas outlet. As the gas may contain a halocompound and water vapour, the chamber is heated to a temperature that inhibits adsorption of water on the surface within the chamber, thereby inhibiting corrosion of the gas chamber. The gas is then conveyed to the gas chamber for treatment, and the temperature of the chamber is maintained above said temperature during treatment of the gas.
摘要翻译： 描述了一种用于处理来自多晶硅蚀刻工艺的排气的方法，其使用等离子体消除装置来处理气体。 该装置包括具有用于接收气体的气体入口和气体出口的不锈钢气室。 由于气体可能含有卤化合物和水蒸气，所以将该室加热到抑制室内表面上的水吸附的温度，从而抑制气室的腐蚀。 然后将气体输送到气室进行处理，并且在处理气体期间将室的温度保持在所述温度以上。
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公开(公告)号：US08518162B2
公开(公告)日：2013-08-27
申请号：US11990255
申请日：2006-07-27
IPC分类号： B01D53/00
CPC分类号： H01J37/32844 , H01J37/32192 , H01J37/32229 , Y02C20/30
摘要： A method is described for treating gas exhaust from a polysilicon etch process, which uses a plasma abatement device to treat the gas. The device comprises a stainless steel gas chamber having a gas inlet for receiving the gas and a gas outlet. As the gas may contain a halocompound and water vapor, the chamber is heated to a temperature that inhibits adsorption of water on the surface within the chamber, thereby inhibiting corrosion of the gas chamber. The gas is then conveyed to the gas chamber for treatment, and the temperature of the chamber is maintained above said temperature during treatment of the gas.
摘要翻译： 描述了一种用于处理来自多晶硅蚀刻工艺的排气的方法，其使用等离子体消除装置来处理气体。 该装置包括具有用于接收气体的气体入口和气体出口的不锈钢气室。 由于气体可能含有卤化合物和水蒸气，所以将该室加热到抑制室内表面上的水吸附的温度，从而抑制气室的腐蚀。 然后将气体输送到气室用于处理，并且在处理气体期间将室的温度保持在所述温度以上。
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公开(公告)号：US20100038230A1
公开(公告)日：2010-02-18
申请号：US12085205
申请日：2006-09-25
CPC分类号： B01D53/32 , B01D53/007 , B01D2259/806 , B01D2259/818 , B01J19/126
摘要： In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.
摘要翻译： 在包括微波发生器的微波等离子体消除装置的操作方法和用于从微波发生器接收微波能量的气室中，使用微波能量产生等离子体的微波能量的量， 对气室进行监控，微波发生器产生的微波能量的功率根据被监测的微波能量进行调整。
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公开(公告)号：US09044707B2
公开(公告)日：2015-06-02
申请号：US12085205
申请日：2006-09-25
CPC分类号： B01D53/32 , B01D53/007 , B01D2259/806 , B01D2259/818 , B01J19/126
摘要： In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.
摘要翻译： 在包括微波发生器的微波等离子体消除装置的操作方法和用于从微波发生器接收微波能量的气室中，使用微波能量产生等离子体的微波能量的量， 对气室进行监控，微波发生器产生的微波能量的功率根据被监测的微波能量进行调整。
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公开(公告)号：US08776719B2
公开(公告)日：2014-07-15
申请号：US11990257
申请日：2006-07-27
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01J37/32
CPC分类号： H01J37/32844 , H01J37/32192 , H01J37/32229 , Y02C20/30
摘要： A microwave plasma reactor (10) comprises a reactor chamber, a microwave resonant cavity (14) located within the reactor chamber, a waveguide (16) for conveying microwave radiation to the resonant cavity, the waveguide having a convergent tapered portion, means for forming an electromagnetic standing wave within the resonant cavity from the microwave radiation for initiating and sustaining a plasma within the resonant cavity, the resonant cavity having a gas inlet and a gas outlet, and conduit means extending from the gas outlet for containing a plasma conveyed from the resonant cavity with a gas flowing from the gas inlet to the gas outlet.
摘要翻译： 微波等离子体反应器（10）包括反应室，位于反应器室内的微波谐振腔（14），用于将微波辐射传送到谐振腔的波导（16），波导具有会聚锥形部分，用于形成 来自微波辐射的谐振腔内的电磁驻波，用于在谐振腔内引发和维持等离子体，谐振腔具有气体入口和气体出口，以及从气体出口延伸的管道装置，用于容纳从 谐振腔，其具有从气体入口到气体出口流动的气体。
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公开(公告)号：US08480861B2
公开(公告)日：2013-07-09
申请号：US12084361
申请日：2006-09-28
CPC分类号： B01D53/32 , B01D2257/204 , B01D2257/206 , B01D2258/0216 , B01D2259/818 , C23C16/4408 , C23C16/4412 , Y02C20/30
摘要： In a method of treating a gas exhausted from a process chamber, the exhaust gas is conveyed to a vacuum pump (20) and a nitrogen purge gas is added to the exhaust gas for pumping with the exhaust gas. Gas exhaust from the pump is conveyed to an abatement device (28) for abating the exhaust gas. The amount of purge gas added to the exhaust gas is adjusted in response to a variation of the composition of the exhaust gas, or the composition of the gas supplied to the process chamber, to optimise the abatement of the exhaust gas.
摘要翻译： 在处理从处理室排出的气体的方法中，排气被输送到真空泵（20），氮气净化气体被添加到排气中以与废气一起泵送。 来自泵的排气被输送到减排装置（28）以减轻废气。 响应于废气的组成的变化或供给到处理室的气体的组成而调整排出气体中的净化气体的量，以优化废气的减少。
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公开(公告)号：US07494633B2
公开(公告)日：2009-02-24
申请号：US11659641
申请日：2005-08-02
CPC分类号： B01D53/68 , B01D53/30 , B01D2257/2047 , Y02C20/30
摘要： Apparatus is described for treating an effluent fluid stream from a semiconductor manufacturing process tool. The apparatus comprises a combustion chamber, means for heating the combustion chamber, and a nozzle for injecting the effluent stream into the combustion chamber. The apparatus is configured to enable a fuel and an oxidant to be selectively injected into the effluent stream as required to optimise the combustion conditions for a particular effluent stream. In one to embodiment, a lance projecting into the nozzle selectively injects an oxidant into the effluent stream, and a sleeve surrounding the nozzle selectively injects a fuel into the effluent stream.
摘要翻译： 描述了用于处理来自半导体制造工艺工具的流出物流的装置。 该装置包括燃烧室，用于加热燃烧室的装置和用于将流出物流注入燃烧室的喷嘴。 该装置被配置为使燃料和氧化剂能够根据需要选择性地注入流出物流中，以优化特定流出物流的燃烧条件。 在一个实施例中，突出到喷嘴中的喷枪选择性地将氧化剂注入流出物流中，并且围绕喷嘴的套筒选择性地将燃料喷射到流出物流中。
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公开(公告)号：US07819635B2
公开(公告)日：2010-10-26
申请号：US10594402
申请日：2005-03-08
IPC分类号： F04B3/00
CPC分类号： F04D19/04
摘要： A multi-stage vacuum pump comprises, between adjacent stages of the pump, a continuous ignition source for igniting a fuel within a pumped fluid. This can ensure that the concentration of the fuel in fluid exhaust from the pump is below its lower explosive limit.
摘要翻译： 多级真空泵在泵的相邻级之间包括用于点燃泵送流体内的燃料的连续点火源。 这可以确保来自泵的流体排出物中的燃料浓度低于其较低的爆炸极限。
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公开(公告)号：US5938422A
公开(公告)日：1999-08-17
申请号：US840326
申请日：1997-04-16
CPC分类号： F23D14/18 , F23G7/065 , F23G2209/142 , F23L2900/07005 , Y02E20/344
摘要： A process for the combustive destruction of noxious substances from a gas stream in which the gas stream and added fuel gas as a mixture into a combustion zone that is surrounded by an exit surface of a foraminous gas burner. A fuel gas and air/oxygen mixture are simultaneously supplied to the foraminous gas burner to effect combustion at the exit surface. The resulting combustion product stream is discharged from the combustion zone. The oxygen is added to the gas stream and the fuel gas prior to the introduction of the mixture to the combustion zone and the oxygen/fuel gas mixture burns at the point of injection.
摘要翻译： 一种从气流中燃烧破坏有害物质的过程，其中将气流和作为混合物的燃料气体添加到由有孔气体燃烧器的出口表面包围的燃烧区中。 燃料气体和空气/氧气混合物同时供给到有孔气体燃烧器中以在出口表面进行燃烧。 所得燃烧产物流从燃烧区排出。 在将混合物引入燃烧区之前，将氧气加入到气流和燃料气体中，并且氧/燃料气体混合物在注射点处燃烧。
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公开(公告)号：US20100006227A1
公开(公告)日：2010-01-14
申请号：US11990257
申请日：2006-07-27
IPC分类号： H01L21/3065
CPC分类号： H01J37/32844 , H01J37/32192 , H01J37/32229 , Y02C20/30
摘要： A microwave plasma reactor (10) comprises a reactor chamber, a microwave resonant cavity (14) located within the reactor chamber, a waveguide (16) for conveying microwave radiation to the resonant cavity, the waveguide having a convergent tapered portion, means for forming an electromagnetic standing wave within the resonant cavity from the microwave radiation for initiating and sustaining a plasma within the resonant cavity, the resonant cavity having a gas inlet and a gas outlet, and conduit means extending from the gas outlet for containing a plasma conveyed from the resonant cavity with a gas flowing from the gas inlet to the gas outlet.
摘要翻译： 微波等离子体反应器（10）包括反应室，位于反应器室内的微波谐振腔（14），用于将微波辐射传送到谐振腔的波导（16），波导具有会聚锥形部分，用于形成 来自微波辐射的谐振腔内的电磁驻波，用于在谐振腔内引发和维持等离子体，谐振腔具有气体入口和气体出口，以及从气体出口延伸的管道装置，用于容纳从 谐振腔，其具有从气体入口到气体出口流动的气体。
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