公开(公告)号：US06399934B1

公开(公告)日：2002-06-04

申请号：US09642525

申请日：2000-08-18

申请人： Jeffrey S. Sullivan ,  Steven Coyle ,  Andres Fernandez ,  Marian Mankos

发明人： Jeffrey S. Sullivan ,  Steven Coyle ,  Andres Fernandez ,  Marian Mankos

IPC分类号： H01J4014

CPC分类号： H01J3/024 ,  H01J37/073

摘要： An electron source is disclosed in which control signals having transition times less than about 10 nanoseconds and electrically isolated from a gated photocathode control an electron beam supplied by the gated photocathode. In one embodiment, the electron source includes a transmissive substrate, a photoemitter on the substrate, a gate insulator on the photoemitter, a gate electrode on the gate insulator, a housing enclosing the photoemitter and the gate electrode, a light source located outside the housing, and a detector located in the housing to receive light from the light source. The detector is electrically coupled to control a voltage applied to one of the gate electrode or the photoemitter.

摘要翻译： 公开了一种电子源，其中具有小于约10纳秒的转换时间和与门控光电阴极电隔离的控制信号控制由门控光电阴极提供的电子束。 在一个实施例中，电子源包括透射衬底，衬底上的光发射器，光发射器上的栅极绝缘体，栅极绝缘体上的栅极电极，封装光电发生器和栅电极的壳体，位于壳体外部的光源 以及位于壳体中的用于接收来自光源的光的检测器。 检测器电耦合以控制施加到栅极电极或光电发射器之一的电压。

公开(公告)号：US06759800B1

公开(公告)日：2004-07-06

申请号：US09363926

申请日：1999-07-29

申请人： Andres Fernandez ,  Timothy Thomas ,  Xiaolan Chen ,  Steven T. Coyle ,  Ming Yu ,  Marian Mankos

发明人： Andres Fernandez ,  Timothy Thomas ,  Xiaolan Chen ,  Steven T. Coyle ,  Ming Yu ,  Marian Mankos

IPC分类号： H01J4006

CPC分类号： B82Y10/00 ,  H01J1/34

摘要： A photocathode as a source of electron beams, having a substrate of optically transmissive diamond and a photoemitter. A photocathode with a single emitting region provides a single electron beam; a photocathode with multiple emitting regions provides multiple electron beams. The photoemitter is positioned on the side of the diamond substrate opposite the surface on which the illumination is incident, and has an irradiation region at the contact with the optically transmissive diamond, and an emission region opposite the irradiation region, these regions being defined by the path of the illumination. The diamond substrate at the irradiation region/emission region interface conducts heat away from this focused region of illumination on the photocathode. Alternately, a diamond film is used for heat conduction, while another material is used as a substrate to provide structural support. The thermal conductivity of diamond is at least three orders of magnitude greater than that of fused silica, which is an alternative substrate material for photocathodes. This allows for efficient conduction of heat away from the irradiation region/emission region interface, and therefore allows higher currents to be achieved from the photocathode. This, in turn, permits higher throughput rates in applications including electron beam lithography.

摘要翻译： 作为电子束源的光电阴极，具有透光金刚石和光电发射体的基底。 具有单个发射区域的光电阴极提供单个电子束; 具有多个发射区域的光电阴极提供多个电子束。 光发射器位于与照射入射的表面相对的金刚石基底的一侧，并且具有与光学透射金刚石接触的照射区域和与照射区域相对的发射区域，这些区域由 照明路径。 在照射区域/发射区域界面处的金刚石基底将热量远离该聚焦照明区域在光电阴极上。 或者，金刚石膜用于热传导，而另一种材料用作基底以提供结构支撑。 金刚石的热导率比熔融石英的热导率高至少三个数量级，熔融石英是光电阴极的替代基材。 这允许热量从照射区域/发射区域界面有效地传导，因此允许从光电阴极获得更高的电流。 这反过来又允许在包括电子束光刻的应用中更高的生产率。

公开(公告)号：US06724002B2

公开(公告)日：2004-04-20

申请号：US10055121

申请日：2002-01-22

申请人： Marian Mankos ,  Steven T. Coyle ,  Andres Fernandez ,  Allan L. Sagle ,  Paul C. Allen ,  Xiaolan Chen ,  Douglas Holmgren ,  Windsor Owens ,  Jeffrey Sullivan ,  Tim Thomas ,  Mark A. Gesley

发明人： Marian Mankos ,  Steven T. Coyle ,  Andres Fernandez ,  Allan L. Sagle ,  Paul C. Allen ,  Xiaolan Chen ,  Douglas Holmgren ,  Windsor Owens ,  Jeffrey Sullivan ,  Tim Thomas ,  Mark A. Gesley

IPC分类号： H01J4016

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J37/3175 ,  H01J2237/31779

摘要： An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.

摘要翻译： 电子束光刻系统包括用于产生激光束的激光器和用于将激光束分成多个光束的分束器。 光束的强度被单独调制。 光束具有足够的能量，使得当它们撞击光电阴极时，发射电子。 光束的调制控制所得电子束的调制。 电子束被提供到用于聚焦和扫描控制的电子柱。 最后，使用电子束来写入扫描表面，例如使用隔行写入策略。

公开(公告)号：US06429443B1

公开(公告)日：2002-08-06

申请号：US09589029

申请日：2000-06-06

申请人： Marian Mankos ,  Steven T Coyle ,  Andres Fernandez ,  Tai-Hon P Chang

发明人： Marian Mankos ,  Steven T Coyle ,  Andres Fernandez ,  Tai-Hon P Chang

IPC分类号： H01J37075

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  G21K5/04 ,  H01J37/075 ,  H01J37/3177 ,  H01J2237/31779

摘要： Multiple beam electron beam lithography uses an array of vertical cavity surface emitting lasers (VCSELS) to generate laser beams, which are then converted to electron beams using a photocathode. The electron beams are scanned across a semiconductor substrate or lithography mask to imprint a pattern thereon. The use of VCSELs simplifies the design of the electron beam column and improves the throughput and writing resolution of the lithography system.

摘要翻译： 多束电子束光刻使用垂直腔表面发射激光器阵列（VCSELS）来产生激光束，然后使用光电阴极转换成电子束。 电子束在半导体衬底或光刻掩模上扫描以在其上印刷图案。 VCSEL的使用简化了电子束柱的设计，并提高了光刻系统的吞吐量和写入分辨率。

公开(公告)号：US06376984B1

公开(公告)日：2002-04-23

申请号：US09364274

申请日：1999-07-29

申请人： Andres Fernandez ,  Marian Mankos ,  Tai-Hon Philip Chang ,  Kim Lee ,  Steven T. Coyle

发明人： Andres Fernandez ,  Marian Mankos ,  Tai-Hon Philip Chang ,  Kim Lee ,  Steven T. Coyle

IPC分类号： H01J3150

CPC分类号： B82Y10/00 ,  H01J1/34 ,  H01J37/073 ,  H01J2201/02 ,  H01J2237/31779

摘要： A photocathode emitter as a source of electron beams, having an optically transmissive substrate patterned to define a protrusion, heat conducting material occupying the space surrounding the protrusion, and a photoemitter layer over the protrusion. The photoemitter is positioned on the side of the substrate opposite the surface on which the illumination is incident, and has an irradiation region at the contact with the top of the protrusion patterned on the substrate, and an emission region opposite the irradiation region, these regions being defined by the path of the illumination. The heat conducting material around the protrusion conducts heat away from this focused region of illumination on the photocathode to allow higher currents to be achieved from the photocathode and thus permits higher throughput rates in applications including electron beam lithography. In one version, the photocathode is fabricated using microfabrication techniques, to achieve a small emission spot size.

摘要翻译： 作为电子束源的光电阴极发射体，具有图案化以限定突起的光学透射基底，占据突起周围的空间的导热材料，以及突出部上的光电发射体层。 光发射器位于与照射入射的表面相对的一侧上，并且具有与在基板上图案化的突起的顶部接触的照射区域和与照射区域相对的发射区域，这些区域 由照明的路径定义。 突起周围的导热材料将热量从该聚焦光照射区域传导到光电阴极上，以允许从光电阴极获得更高的电流，从而在包括电子束光刻的应用中允许较高的生产率。 在一个版本中，使用微细加工技术制造光电阴极，以实现小的发射点尺寸。

公开(公告)号：US07095037B2

公开(公告)日：2006-08-22

申请号：US10803352

申请日：2004-03-18

申请人： Andres Fernadez ,  Marian Mankos ,  Jeffrey S. Sullivan ,  Paul C. Allen

发明人： Andres Fernadez ,  Marian Mankos ,  Jeffrey S. Sullivan ,  Paul C. Allen

IPC分类号： H01J40/06 ,  H01J37/08 ,  H01J27/02

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J37/073 ,  H01J37/3175 ,  H01J2237/06333 ,  H01J2237/31779

摘要： An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.

公开(公告)号：US08258474B1

公开(公告)日：2012-09-04

申请号：US13071412

申请日：2011-03-24

申请人： Marian Mankos

发明人： Marian Mankos

IPC分类号： H01J37/26

CPC分类号： H01J37/261 ,  H01J37/04 ,  H01J37/252 ,  H01J2237/04926 ,  H01J2237/2538

摘要： One embodiment relates to an apparatus for generating two spatially overlapping electron beams on a specimen. A first electron beam source is configured to generate a low-energy electron beam, and an energy-dispersive device bends the low-energy electron beam towards an semitransparent electron mirror. The semitransparent electron mirror is biased to reflect the low-energy electron beam. A second electron beam source is configured to generate a high-energy electron beam that passes through an opening in the semitransparent electron mirror. Both the low- and high-energy electron beams enter the same energy-dispersive device that bends both beams towards the specimen. A deflection system positioned between the high-energy electron source and semitransparent electron mirror is configured to deflect the high-energy electron beam by an angle that compensates for the difference in bending angles between the low- and high-energy electron beams introduced by the energy-dispersive device. Other embodiments are also disclosed.

摘要翻译： 一个实施例涉及用于在样本上产生两个空间上重叠的电子束的装置。 第一电子束源被配置为产生低能电子束，并且能量分散器件将低能电子束弯曲成半透明电子镜。 半透明电子镜被偏置以反射低能电子束。 第二电子束源被配置为产生穿过半透明电子反射镜中的开口的高能电子束。 低能量和高能量电子束都进入同样的能量分散装置，使两个光束朝向样品弯曲。 位于高能电子源和半透明电子反射镜之间的偏转系统被配置为使高能电子束偏转角度，该角度补偿由能量引入的低能量和高能量电子束之间的弯曲角度的差异 - 分散设备 还公开了其他实施例。

公开(公告)号：US07692167B1

公开(公告)日：2010-04-06

申请号：US11588492

申请日：2006-10-26

申请人： Marian Mankos

发明人： Marian Mankos

IPC分类号： H01J37/302

CPC分类号： H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30483 ,  H01J2237/31789

摘要： One embodiment pertains to an apparatus for reflection electron beam lithography, including at least illumination electron-optics, an electron-reflective pattern generator, projection electron-optics, a moving stage holding a target substrate, control circuitry, and a deflection system. The illumination electron-optics is configured to form an illumination electron beam. The electron-reflective pattern generator configured to generate an electron-reflective pattern of pixels and to reflect the illumination electron beam using the pattern to form a patterned electron beam. The projection electron-optics is configured to project the patterned electron beam onto the moving target substrate. The control circuitry is configured to shift the generated pattern in discrete steps in synchronization with the stage motion. The deflection system is configured to deflect said projected patterned electron beam so as to compensate for said stage motion in between discrete shifts of said generated pattern. Other features and embodiments are also disclosed.

摘要翻译： 一个实施例涉及用于反射电子束光刻的装置，至少包括照明电子光学，电子反射图案发生器，投射电子光学，保持目标衬底的移动台，控制电路和偏转系统。 照明电子光学被配置为形成照明电子束。 电子反射型图形发生器被配置为产生像素的电子反射图案并且使用该图案反射照射电子束以形成图案化的电子束。 投影电子学被配置为将图案化电子束投影到移动目标衬底上。 控制电路被配置为与台阶运动同步地以离散步进移位生成的图案。 偏转系统被配置为偏转所述投影的图案化电子束，以补偿所述生成图案的离散位移之间的所述阶段运动。 还公开了其它特征和实施例。

公开(公告)号：US07217924B1

公开(公告)日：2007-05-15

申请号：US11205367

申请日：2005-08-16

申请人： Marian Mankos ,  Eric Munro

发明人： Marian Mankos ,  Eric Munro

IPC分类号： H01J37/26 ,  G01N23/225

CPC分类号： H01J37/05 ,  H01J37/147 ,  H01J37/153 ,  H01J37/26 ,  H01J37/29 ,  H01J2237/0044 ,  H01J2237/063 ,  H01J2237/151 ,  H01J2237/2446 ,  H01J2237/262

摘要： One embodiment relates to an apparatus for generating a dual-energy electron beam. A first electron beam source is configured to generate a lower-energy electron beam, and a second electron beam source is configured to generate a higher-energy electron beam. A holey mirror is biased to reflect the lower-energy electron beam. The holey mirror also includes an opening therein through which passes the higher-energy electron beam, thereby forming the dual-energy electron beam. A prism array combiner introduces a first dispersion between the lower-energy electron beam and the higher-energy electron beam within the dual-energy electron beam. A prism array separator is configured to separate the dual-energy electron beam traveling to a substrate from a scattered electron beam traveling away from the substrate. The prism array separator introduces a second dispersion which compensates for the dispersion of the prism array combiner. Other embodiments are also disclosed.

摘要翻译： 一个实施例涉及一种用于产生双能量电子束的装置。 第一电子束源被配置为产生较低能量的电子束，并且第二电子束源被配置为产生较高能量的电子束。 有孔镜被偏置以反射较低能量的电子束。 多孔镜还包括其中通过高能电子束的开口，从而形成双能电子束。 棱镜阵列组合器在双能电子束内引入低能电子束与高能电子束之间的第一色散。 棱镜阵列分离器被配置为将从衬底传播的散射电子束分离到衬底行进的双能电子束。 棱镜阵列分离器引入补偿棱镜阵列组合器的色散的第二色散。 还公开了其他实施例。

公开(公告)号：US06538256B1

公开(公告)日：2003-03-25

申请号：US09641099

申请日：2000-08-17

申请人： Marian Mankos ,  Vidhya Krishnamurthi ,  Kim Y. Lee

发明人： Marian Mankos ,  Vidhya Krishnamurthi ,  Kim Y. Lee

IPC分类号： H01J3708

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J1/34 ,  H01J37/073 ,  H01J37/3175 ,  H01J2237/31779

摘要： A method and system for electron beam lithography at high throughput with shorter electron beam column length, reduced electron-electron interactions, and higher beam current. The system includes a photocathode having a pattern composed of a periodic array of apertures with a specific geometry. The spacing of the apertures is chosen so as to maximize the transmission of the laser beam through apertures significantly smaller than the photon wavelength. The patterned photocathode is illuminated by an array of laser beams to allow blanking and gray-beam modulation of the individual beams at the source level by the switching of the individual laser beams in the array. Potential applications for this invention include electron beam direct write on wafers and mask patterning.

摘要翻译： 用于电子束光刻的方法和系统，其具有较短的电子束柱长度，减少的电子 - 电子相互作用和更高的束电流。 该系统包括具有由具有特定几何形状的周期性孔径阵列组成的图案的光电阴极。 选择孔的间距以便通过明显小于光子波长的孔的最大化激光束的透射。 图案化的光电阴极被激光束阵列照射，以通过阵列中的各个激光束的切换来允许源极处的各个光束的消隐和灰光束调制。 本发明的潜在应用包括晶片上的电子束直接写入和掩模图案化。