公开(公告)号：US20090087615A1

公开(公告)日：2009-04-02

申请号：US12290437

申请日：2008-10-29

申请人： Jennifer Y. Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh N. Pham

发明人： Jennifer Y. Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh N. Pham

IPC分类号： B32B3/24

CPC分类号： C23C16/45565 ,  C04B41/009 ,  C04B41/5353 ,  C04B41/91 ,  C23C16/4404 ,  C23C16/4407 ,  C30B35/00 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/32862 ,  Y10T428/24273 ,  Y10T428/24314 ,  C04B35/505

摘要： Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 μm to about 25 μm. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.

摘要翻译： 本文公开了一种用于处理室的气体分配组件中的气体分配板，其中气体分配板由可能还包括氧化铝的固体含氧化钇衬底制成。 气体分配板包括通常为月牙形的多个通孔。 通过超声波钻孔在固体含氧化钇基质中形成的通孔特别好。 固体含氧化钇的衬底通常包含至少99.9％的氧化钇，并且具有至少4.92g / cm 3的密度，约0.02％或更低的吸水率，以及在约10μm范围内的平均晶粒尺寸 到大约25个妈妈。 本文还公开了用于制造和清洁含氧化钇气体分配板的方法。

公开(公告)号：US07479304B2

公开(公告)日：2009-01-20

申请号：US10918232

申请日：2004-08-13

申请人： Jennifer Y. Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh N. Pham

发明人： Jennifer Y. Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh N. Pham

IPC分类号： C23C16/00 ,  B05D3/12

CPC分类号： C23C16/45565 ,  C04B41/009 ,  C04B41/5353 ,  C04B41/91 ,  C23C16/4404 ,  C23C16/4407 ,  C30B35/00 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/32862 ,  Y10T428/24273 ,  Y10T428/24314 ,  C04B35/505

摘要： Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 μm to about 25 μm. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.

摘要翻译： 本文公开了一种用于处理室的气体分配组件中的气体分配板，其中气体分配板由可能还包括氧化铝的固体含氧化钇衬底制成。 气体分配板包括通常为月牙形的多个通孔。 通过超声波钻孔在固体含氧化钇基质中形成的通孔特别好。 固体含氧化钇的衬底通常包含至少99.9％的氧化钇，并且具有至少4.92g / cm 3的密度，约0.02％或更低的吸水率，以及在约10μm的范围内的平均晶粒尺寸 到大约25个妈妈。 本文还公开了用于制造和清洁含氧化钇气体分配板的方法。

公开(公告)号：US20050056218A1

公开(公告)日：2005-03-17

申请号：US10918232

申请日：2004-08-13

申请人： Jennifer Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh Pham

发明人： Jennifer Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh Pham

IPC分类号： C23C16/44 ,  C23C28/00 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C04B41/009 ,  C04B41/5353 ,  C04B41/91 ,  C23C16/4404 ,  C23C16/4407 ,  C30B35/00 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/32862 ,  Y10T428/24273 ,  Y10T428/24314 ,  C04B35/505

摘要： Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate-typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 μm to about 25 μm. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.

摘要翻译： 本文公开了一种用于处理室的气体分配组件中的气体分配板，其中气体分配板由可能还包括氧化铝的固体含氧化钇衬底制成。 气体分配板包括通常为月牙形的多个通孔。 通过超声波钻孔在固体含氧化钇基质中形成的通孔特别好。 含固体氧化钇的基材通常包含至少99.9％的氧化钇，其密度为至少4.92g / cm 3，吸水率为约0.02％或更低，平均晶粒尺寸为 约10毫米至约25毫米。 本文还公开了用于制造和清洁含氧化钇气体分配板的方法。

公开(公告)号：US07672110B2

公开(公告)日：2010-03-02

申请号：US11214286

申请日：2005-08-29

申请人： Jennifer Y. Sun ,  James Dempster ,  Semyon L. Kats ,  Allen Fox

发明人： Jennifer Y. Sun ,  James Dempster ,  Semyon L. Kats ,  Allen Fox

IPC分类号： H01L21/683 ,  H01T23/00 ,  B23B31/28

CPC分类号： H01L21/6833 ,  Y10T279/23

摘要： An electrostatic chuck has an electrode embedded in a dielectric which is mounted on a pedestal. The dielectric has a contact surface with an average surface roughness of less than about 0.5 μm, a surface peak waviness of less than about 0.12 μm, and a surface peak waviness material ratio of greater than about 20%. The surface texture can be formed by lapping the dielectric surface with a slurry of abrasive particles.

摘要翻译： 静电吸盘具有嵌入在基座上的电介质中的电极。 电介质具有平均表面粗糙度小于约0.5μm的接触表面，小于约0.12μm的表面波峰波纹，以及大于约20％的表面波峰厚度材料比。 可以通过用研磨颗粒的浆料研磨电介质表面来形成表面纹理。

公开(公告)号：US20070047170A1

公开(公告)日：2007-03-01

申请号：US11214286

申请日：2005-08-29

申请人： Jennifer Sun ,  James Dempster ,  Semyon Kats ,  Allen Fox

发明人： Jennifer Sun ,  James Dempster ,  Semyon Kats ,  Allen Fox

IPC分类号： H01L21/683

CPC分类号： H01L21/6833 ,  Y10T279/23

摘要： An electrostatic chuck has an electrode embedded in a dielectric which is mounted on a pedestal. The dielectric has a contact surface with an average surface roughness of less than about 0.5 μm, a surface peak waviness of less than about 0.12 μm, and a surface peak waviness material ratio of greater than about 20%. The surface texture can be formed by lapping the dielectric surface with a slurry of abrasive particles.

摘要翻译： 静电吸盘具有嵌入在基座上的电介质中的电极。 电介质具有平均表面粗糙度小于约0.5μm的接触表面，小于约0.12μm的表面峰波纹度以及大于约20％的表面峰波纹度材料比。 可以通过用研磨颗粒的浆料研磨电介质表面来形成表面纹理。