公开(公告)号：US20090087615A1

公开(公告)日：2009-04-02

申请号：US12290437

申请日：2008-10-29

申请人： Jennifer Y. Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh N. Pham

发明人： Jennifer Y. Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh N. Pham

IPC分类号： B32B3/24

CPC分类号： C23C16/45565 ,  C04B41/009 ,  C04B41/5353 ,  C04B41/91 ,  C23C16/4404 ,  C23C16/4407 ,  C30B35/00 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/32862 ,  Y10T428/24273 ,  Y10T428/24314 ,  C04B35/505

摘要： Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 μm to about 25 μm. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.

摘要翻译： 本文公开了一种用于处理室的气体分配组件中的气体分配板，其中气体分配板由可能还包括氧化铝的固体含氧化钇衬底制成。 气体分配板包括通常为月牙形的多个通孔。 通过超声波钻孔在固体含氧化钇基质中形成的通孔特别好。 固体含氧化钇的衬底通常包含至少99.9％的氧化钇，并且具有至少4.92g / cm 3的密度，约0.02％或更低的吸水率，以及在约10μm范围内的平均晶粒尺寸 到大约25个妈妈。 本文还公开了用于制造和清洁含氧化钇气体分配板的方法。

公开(公告)号：US07479304B2

公开(公告)日：2009-01-20

申请号：US10918232

申请日：2004-08-13

申请人： Jennifer Y. Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh N. Pham

发明人： Jennifer Y. Sun ,  Senh Thach ,  James Dempster ,  Li Xu ,  Thanh N. Pham

IPC分类号： C23C16/00 ,  B05D3/12

CPC分类号： C23C16/45565 ,  C04B41/009 ,  C04B41/5353 ,  C04B41/91 ,  C23C16/4404 ,  C23C16/4407 ,  C30B35/00 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/32862 ,  Y10T428/24273 ,  Y10T428/24314 ,  C04B35/505

摘要： Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 μm to about 25 μm. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.

摘要翻译： 本文公开了一种用于处理室的气体分配组件中的气体分配板，其中气体分配板由可能还包括氧化铝的固体含氧化钇衬底制成。 气体分配板包括通常为月牙形的多个通孔。 通过超声波钻孔在固体含氧化钇基质中形成的通孔特别好。 固体含氧化钇的衬底通常包含至少99.9％的氧化钇，并且具有至少4.92g / cm 3的密度，约0.02％或更低的吸水率，以及在约10μm的范围内的平均晶粒尺寸 到大约25个妈妈。 本文还公开了用于制造和清洁含氧化钇气体分配板的方法。

公开(公告)号：US20090162647A1

公开(公告)日：2009-06-25

申请号：US12004907

申请日：2007-12-21

申请人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

发明人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

IPC分类号： B32B15/04 ,  B05D3/00

CPC分类号： C23C16/4404 ,  H01J37/32467 ,  H01J37/32477

摘要： An article which is resistant to corrosion or erosion by chemically active plasmas and a method of making the article are described. The article is comprised of a metal or metal alloy substrate having on its surface a coating which is an oxide of the metal or metal alloy. The structure of the oxide coating is columnar in nature. The grain size of the crystals which make up the oxide is larger at the surface of the oxide coating than at the interface between the oxide coating and the metal or metal alloy substrate, and wherein the oxide coating is in compression at the interface between the oxide coating and the metal or metal alloy substrate. Typically the metal is selected from the group consisting of yttrium, neodymium, samarium, terbium, dysprosium, erbium, ytterbium, scandium, hafnium, niobium or combinations thereof.

摘要翻译： 描述了耐化学活性等离子体腐蚀或侵蚀的制品以及制造该制品的方法。 该制品由金属或金属合金基材组成，其表面上具有金属或金属合金的氧化物的涂层。 氧化物涂层的结构本质上是柱状的。 构成氧化物的晶体的晶粒尺寸在氧化物涂层的表面比在氧化物涂层和金属或金属合金基底之间的界面处的晶粒尺寸大，并且其中氧化物涂层在氧化物之间的界面处被压缩 涂层和金属或金属合金基材。 通常，金属选自钇，钕，钐，铽，镝，铒，镱，钪，铪，铌或其组合。

公开(公告)号：US20090056745A1

公开(公告)日：2009-03-05

申请号：US11845620

申请日：2007-08-27

申请人： JENNIFER Y. SUN ,  Senh Thach ,  Xi Zhu ,  Li Xu ,  Anisul Khan

发明人： JENNIFER Y. SUN ,  Senh Thach ,  Xi Zhu ,  Li Xu ,  Anisul Khan

IPC分类号： C23G1/02

CPC分类号： C23C16/4407 ,  C11D7/08 ,  C11D7/10 ,  C11D11/0047 ,  C11D11/0064

摘要： A cleaning process for recovering an anodized aluminum part is particularly useful when the part has been exposed to a fluorine-containing plasma in etch reactor. The part is bathed in an agitated solution of a fluoride acid, such as ammonium fluoride, which converts aluminum fluoride to a soluble fluoride. The part is rinsed in water. The pores of the cleaned anodization may be resealed by a submerging the part in hot agitated deionized water.

摘要翻译： 当在蚀刻反应器中暴露于含氟等离子体时，用于回收阳极氧化铝部件的清洁方法是特别有用的。 将该部分浸渍在氟化物酸如氟化铵的搅拌溶液中，其将氟化铝转化为可溶性氟化物。 该部件在水中冲洗。 清洁的阳极氧化的孔可以通过将部件浸没在热的搅拌去离子水中来重新密封。

公开(公告)号：US20100140222A1

公开(公告)日：2010-06-10

申请号：US12632712

申请日：2009-12-07

申请人： Jennifer Y. Sun ,  Ren-Guan Duan ,  Senh Thach ,  Li Xu

发明人： Jennifer Y. Sun ,  Ren-Guan Duan ,  Senh Thach ,  Li Xu

IPC分类号： C08K3/10 ,  C08K3/16 ,  C08K3/28 ,  C08K3/08 ,  C08K3/34 ,  C08K3/22 ,  B32B7/12 ,  C23F1/02 ,  C23F1/08

CPC分类号： C09K3/10 ,  Y10T428/2857

摘要： A filled polymer composition having improved plasma resistance is disclosed. The composition includes a particle filler dispersed in a polymer matrix. The particle filler can be Nb2O5, YF3, AlN, SiC or Si3N4 and rare earth oxides. In an embodiment, the composition is utilized as a bonding adhesive for electrostatic chuck, bonding adhesive for shower head, bonding adhesive for liner, sealing material, O-ring, or plastic component.

摘要翻译： 公开了具有改善的等离子体电阻的填充聚合物组合物。 该组合物包括分散在聚合物基质中的颗粒填料。 颗粒填料可以是Nb2O5，YF3，AlN，SiC或Si3N4和稀土氧化物。 在一个实施方案中，组合物用作静电卡盘的粘合剂，用于喷头的粘合剂，衬垫的粘合剂，密封材料，O形环或塑料组分。

公开(公告)号：US20080029211A1

公开(公告)日：2008-02-07

申请号：US11461689

申请日：2006-08-01

申请人： JENNIFER Y. SUN ,  Li Xu ,  Senh Thach ,  Kelly A. McDonough ,  Robert Scott Clark

发明人： JENNIFER Y. SUN ,  Li Xu ,  Senh Thach ,  Kelly A. McDonough ,  Robert Scott Clark

IPC分类号： B32B37/00

CPC分类号： C23C16/4409 ,  H01J37/32467

摘要： Embodiments of the invention provide a robust bonding material suitable for joining semiconductor processing chamber components. Other embodiments provide semiconductor processing chamber components joined using a bonding material having metal filler disposed in an adhesive layer. Other embodiments include methods for manufacturing a semiconductor processing chamber component having a bonding material that includes metal filled disposed in an adhesive layer. The metal filler is suitable for reacting with halogen containing plasmas such that a halogen based metal layer is formed on the exposed portion of the bonding material upon exposure to the plasma.

摘要翻译： 本发明的实施例提供了适用于接合半导体处理室部件的坚固的接合材料。 其他实施例提供使用布置在粘合剂层中的具有金属填料的接合材料连接的半导体处理室部件。 其他实施例包括用于制造半导体处理室部件的方法，所述半导体处理室部件具有包括设置在粘合剂层中的填充金属的接合材料。 金属填料适于与含卤素的等离子体反应，使得在暴露于等离子体时在接合材料的暴露部分上形成卤素基金属层。

公开(公告)号：US20120125488A1

公开(公告)日：2012-05-24

申请号：US13374980

申请日：2012-01-25

申请人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

发明人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

IPC分类号： C23C8/10

CPC分类号： C23C16/4404 ,  H01J37/32467 ,  H01J37/32477

摘要： A method of creating a plasma-resistant thermal oxide coating on a surface of an article, where the article is comprised of a metal or metal alloy which is typically selected from the group consisting of yttrium, neodymium, samarium, terbium, dysprosium, erbium, ytterbium, scandium, hafnium, niobium or combinations thereof. The oxide coating is formed using a time-temperature profile which includes an initial rapid heating rage, followed by a gradual decrease in heating rate, to produce an oxide coating structure which is columnar in nature. The grain size of the crystals which make up the oxide coating is larger at the surface of the oxide coating than at the interface between the oxide coating and the metal or metal alloy substrate, and the oxide coating is in compression at the interface between the oxide coating and the metal or metal alloy substrate.

摘要翻译： 一种在制品的表面上产生耐等离子体热氧化物涂层的方法，其中制品由金属或金属合金组成，金属或金属合金通常选自钇，钕，钐，铽，镝，铒， 镱，钪，铪，铌或其组合。 使用时间 - 温度曲线形成氧化物涂层，其包括初始的快速加热，然后逐渐降低加热速率，以产生本质上为柱状的氧化物涂层结构。 构成氧化物涂层的晶体的晶粒尺寸在氧化物涂层的表面比在氧化物涂层和金属或金属合金衬底之间的界面处大，并且氧化物涂层在氧化物之间的界面处被压缩 涂层和金属或金属合金基材。

公开(公告)号：US08758858B2

公开(公告)日：2014-06-24

申请号：US13374980

申请日：2012-01-25

申请人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

发明人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

IPC分类号： B05D3/02

CPC分类号： C23C16/4404 ,  H01J37/32467 ,  H01J37/32477

摘要： A method of creating a plasma-resistant thermal oxide coating on a surface of an article, where the article is comprised of a metal or metal alloy which is typically selected from the group consisting of yttrium, neodymium, samarium, terbium, dysprosium, erbium, ytterbium, scandium, hafnium, niobium or combinations thereof. The oxide coating is formed using a time-temperature profile which includes an initial rapid heating rage, followed by a gradual decrease in heating rate, to produce an oxide coating structure which is columnar in nature. The grain size of the crystals which make up the oxide coating is larger at the surface of the oxide coating than at the interface between the oxide coating and the metal or metal alloy substrate, and the oxide coating is in compression at the interface between the oxide coating and the metal or metal alloy substrate.

摘要翻译： 一种在制品的表面上产生耐等离子体热氧化物涂层的方法，其中制品由金属或金属合金组成，金属或金属合金通常选自钇，钕，钐，铽，镝，铒， 镱，钪，铪，铌或其组合。 使用时间 - 温度曲线形成氧化物涂层，其包括初始的快速加热，然后逐渐降低加热速率，以产生本质上为柱状的氧化物涂层结构。 构成氧化物涂层的晶体的晶粒尺寸在氧化物涂层的表面比在氧化物涂层和金属或金属合金衬底之间的界面处大，并且氧化物涂层在氧化物之间的界面处被压缩 涂层和金属或金属合金基材。

公开(公告)号：US08231736B2

公开(公告)日：2012-07-31

申请号：US11845620

申请日：2007-08-27

申请人： Jennifer Y. Sun ,  Senh Thach ,  Xi Zhu ,  Li Xu ,  Anisul Khan

发明人： Jennifer Y. Sun ,  Senh Thach ,  Xi Zhu ,  Li Xu ,  Anisul Khan

IPC分类号： B08B3/00

CPC分类号： C23C16/4407 ,  C11D7/08 ,  C11D7/10 ,  C11D11/0047 ,  C11D11/0064

摘要： A cleaning process for recovering an anodized aluminum part is particularly useful when the part has been exposed to a fluorine-containing plasma in etch reactor. The part is bathed in an agitated solution of a fluoride acid, such as ammonium fluoride, which converts aluminum fluoride to a soluble fluoride. The part is rinsed in water. The pores of the cleaned anodization may be resealed by a submerging the part in hot agitated deionized water.

摘要翻译： 当在蚀刻反应器中暴露于含氟等离子体时，用于回收阳极氧化铝部件的清洁方法是特别有用的。 将该部分浸渍在氟化物酸如氟化铵的搅拌溶液中，其将氟化铝转化为可溶性氟化物。 该部件在水中冲洗。 清洁的阳极氧化的孔可以通过将部件浸没在热的搅拌去离子水中来重新密封。

公开(公告)号：US07718029B2

公开(公告)日：2010-05-18

申请号：US11461689

申请日：2006-08-01

申请人： Jennifer Y. Sun ,  Li Xu ,  Senh Thach ,  Kelly A. McDonough ,  Robert Scott Clark

发明人： Jennifer Y. Sun ,  Li Xu ,  Senh Thach ,  Kelly A. McDonough ,  Robert Scott Clark

IPC分类号： C04B37/00 ,  B29C65/00 ,  B32B37/00 ,  B32B38/04 ,  H01L21/00

CPC分类号： C23C16/4409 ,  H01J37/32467

摘要： Embodiments of the invention provide a robust bonding material suitable for joining semiconductor processing chamber components. Other embodiments provide semiconductor processing chamber components joined using a bonding material having metal filler disposed in an adhesive layer. Other embodiments include methods for manufacturing a semiconductor processing chamber component having a bonding material that includes metal filled disposed in an adhesive layer. The metal filler is suitable for reacting with halogen containing plasmas such that a halogen based metal layer is formed on the exposed portion of the bonding material upon exposure to the plasma.

摘要翻译： 本发明的实施例提供了适用于接合半导体处理室部件的坚固的接合材料。 其他实施例提供使用布置在粘合剂层中的具有金属填料的接合材料连接的半导体处理室部件。 其他实施例包括用于制造半导体处理室部件的方法，所述半导体处理室部件具有包括设置在粘合剂层中的填充金属的接合材料。 金属填料适于与含卤素的等离子体反应，使得在暴露于等离子体时在接合材料的暴露部分上形成卤素基金属层。