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    Photovoltaics optimized for laser remote power applications at eye-safer wavelengths
    1.
    发明申请
    Photovoltaics optimized for laser remote power applications at eye-safer wavelengths 审中-公开
    为更安全的波长的激光远程电源应用优化的光伏

    公开(公告)号：US20160079810A1

    公开(公告)日：2016-03-17

    申请号：US14850465

    申请日：2015-09-10

    申请人： Jesse A. Frantz ,  Jason D. Myers ,  Steven R. Bowman ,  L. Brandon Shaw ,  Jasbinder S. Sanghera

    发明人： Jesse A. Frantz ,  Jason D. Myers ,  Steven R. Bowman ,  L. Brandon Shaw ,  Jasbinder S. Sanghera

    IPC分类号： H02J17/00 ,  H02S40/38 ,  H02S40/34 ,  H02S10/00

    摘要： A system for transmitting power to a remote equipment, the system including a first laser source that generates a first laser beam; a first tracking device operatively connected to the first laser source, wherein the first tracking device controls a direction of the first laser beam; and a first photovoltaic device operatively connected to the remote equipment located remotely from the first laser source and the first tracking device, wherein the first photovoltaic device includes a semiconductor material that generates an electric current in response to absorbing the first laser beam, and wherein a first wavelength of the first laser beam is within an eye-safer range.

    摘要翻译： 一种用于向远程设备发送电力的系统，所述系统包括产生第一激光束的第一激光源; 第一跟踪装置，其可操作地连接到所述第一激光源，其中所述第一跟踪装置控制所述第一激光束的方向; 以及可操作地连接到远离所述第一激光源和所述第一跟踪装置的所述远程设备的第一光伏器件，其中所述第一光伏器件包括响应于吸收所述第一激光束而产生电流的半导体材料，并且其中 第一激光束的第一波长在更安全的范围内。

    Wet-Etchable, Sacrificial Liftoff Layer Compatible with High Temperature Processing
    7.
    发明申请
    Wet-Etchable, Sacrificial Liftoff Layer Compatible with High Temperature Processing 有权
    耐腐蚀性，牺牲性，与高温加工兼容

    公开(公告)号：US20140263171A1

    公开(公告)日：2014-09-18

    申请号：US14201009

    申请日：2014-03-07

    申请人： Jesse A. Frantz ,  Jason D. Myers ,  Robel Y. Bekele ,  Jasbinder S. Sanghera

    发明人： Jesse A. Frantz ,  Jason D. Myers ,  Robel Y. Bekele ,  Jasbinder S. Sanghera

    IPC分类号： B44C1/22

    CPC分类号： B44C1/227 ,  H01L21/02002 ,  H01L31/03928 ,  H01L31/1896 ,  Y02E10/541

    摘要： A method for forming a wet-etchable, sacrificial lift-off layer or layers compatible with high temperature processing, a sacrificial layer, defined as consisting of a single film of one material or multiple films of multiple materials, that can tolerate high temperatures, is deposited on a substrate, called the original substrate, by sputtering or another suitable technique (e.g. evaporation, pulsed laser deposition, wet chemistry, etc.). Intermediate steps result in a lift-off layer attached to the lift-off substrate, that allow for separating the product from the original substrate.

    摘要翻译： 用于形成可耐蚀刻的牺牲剥离层或与高温处理兼容的层的方法，定义为由耐受高温的一种材料的单个膜或多个材料的多个膜组成的牺牲层的方法是 通过溅射或其他合适的技术（例如蒸发，脉冲激光沉积，湿化学等）沉积在基底上，称为原始基底。 中间步骤导致附接到剥离基底的剥离层，其允许将产物与原始基底分离。