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1.发明申请Method for etching glass or metal substrates using negative photoresist and method for fabricating cliche using the same 审中-公开使用负性光致抗蚀剂蚀刻玻璃或金属基板的方法以及使用其制造立方体的方法公开(公告)号：US20100126367A1
公开(公告)日：2010-05-27
申请号：US12451225
申请日：2008-09-22
申请人： Ji-Su Kim , Kyoung-Su Jeon , Kyung-Soo Choi , Gi-Ra Yi , Seung-Heon Lee , Dong-Myung Shin
发明人： Ji-Su Kim , Kyoung-Su Jeon , Kyung-Soo Choi , Gi-Ra Yi , Seung-Heon Lee , Dong-Myung Shin
CPC分类号： G03F1/34 , C03C15/00 , C03C17/06 , C03C17/23 , C03C17/3665 , C03C2217/219 , C03C2217/26 , C03C2218/355 , G03F1/80
摘要： The present invention relates to a method for etching glass or metal using a negative photoresist and a method for fabricating a cliche using the same. In the method for etching glass or metal according to the present invention, since adhesion strength between the negative photoresist and the metal or the metal oxide is excellent, the photoresist layer is not corroded by the metal or metal oxide etching solution, it is unnecessary to produce an inverse photomask, the fabrication process is simple, and a low resolution light source such as mixed wavelength type light source is capable of being used, thus, economic efficiency is ensured.
摘要翻译： 本发明涉及一种使用负性光致抗蚀剂蚀刻玻璃或金属的方法，以及使用该光致抗蚀剂制造方法。 在根据本发明的用于蚀刻玻璃或金属的方法中，由于负性光致抗蚀剂和金属或金属氧化物之间的粘合强度优异，因此光致抗蚀剂层不被金属或金属氧化物蚀刻溶液腐蚀，因此不需要 产生反光掩模，制造工艺简单，并且能够使用诸如混合波长型光源的低分辨率光源，从而确保经济效率。
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公开(公告)号：US08211222B2
公开(公告)日：2012-07-03
申请号：US12451702
申请日：2008-12-19
申请人： Dae-Hyun Kim , Jin-Woo Cho , Dong-Myung Shin , Ji-Su Kim , Sung-Hyun Kim
发明人： Dae-Hyun Kim , Jin-Woo Cho , Dong-Myung Shin , Ji-Su Kim , Sung-Hyun Kim
IPC分类号： C09D11/00
CPC分类号： C09D11/03 , Y10T428/24802
摘要： The present invention provides an ink composition for roll printing, which comprises one or more first fluorine surfactants that comprise a hydrophilic component, a lipophilic component, and a fluorine component; and one or more second fluorine surfactants that comprise a fluorine component, and any one of a hydrophilic component and a lipophilic component.
摘要翻译： 本发明提供一种用于辊印的油墨组合物，其包含一种或多种包含亲水组分，亲油组分和氟组分的第一氟表面活性剂; 和一种或多种第二氟表面活性剂，其包含氟组分，以及亲水组分和亲油组分中的任一种。
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公开(公告)号：US20100136301A1
公开(公告)日：2010-06-03
申请号：US12451702
申请日：2008-12-19
申请人： Dae-Hyun Kim , Jin-Woo Cho , Dong-Myung Shin , Ji-Su Kim , Sung-Hyun Kim
发明人： Dae-Hyun Kim , Jin-Woo Cho , Dong-Myung Shin , Ji-Su Kim , Sung-Hyun Kim
CPC分类号： C09D11/03 , Y10T428/24802
摘要： The present invention provides an ink composition for roll printing, which comprises one or more first fluorine surfactants that comprise a hydrophilic component, a lipophilic component, and a fluorine component; and one or more second fluorine surfactants that comprise a fluorine component, and any one of a hydrophilic component and a lipophilic component.
摘要翻译： 本发明提供一种用于辊印的油墨组合物，其包含一种或多种包含亲水组分，亲油组分和氟组分的第一氟表面活性剂; 和一种或多种第二氟表面活性剂，其包含氟组分，以及亲水组分和亲油组分中的任一种。
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4.发明申请Substrate adhesion improver for photosensitive resin composition and photosensitive resin composition containing the same 审中-公开用于感光性树脂组合物的底物粘合改进剂和含有其的感光性树脂组合物公开(公告)号：US20070003860A1
公开(公告)日：2007-01-04
申请号：US10551211
申请日：2004-04-05
IPC分类号： G03C1/00
CPC分类号： G03F7/085 , G03F7/0226
摘要： This invention provides an improver for adhesion of a photosensitive resin composition consisting of an N-phenyl-2H-benzotriazole compound represented by the general formula (1) below. This improver is added for example to a photosensitive resin composition containing an alkali-soluble resin and a photosensitizer: wherein R1 to R4 each independently represent a hydrogen atom, a halogen atom or a C1-5 alkyl group; R5 to R9 each independently represent a hydrogen atom, a hydroxyl group, a C1-10 alkyl group, an aryl group, a C7-12 aralkyl group, —R10COOR11, or —R10CO—(OCH2CH2)n-OH provided that at least one of R5 and R9 is a hydroxyl group; R10 represents a C2-5 alkylene group; R11 represents a C1-8 alkyl group; and n is an integer of 2 to 20.
摘要翻译： 本发明提供由下述通式（1）表示的N-苯基-2H-苯并三唑化合物组成的感光性树脂组合物的粘合改性剂。 该改进剂例如添加到含有碱溶性树脂和光敏剂的光敏树脂组合物中：其中R 1至R 4各自独立地表示氢原子，卤素 原子或C 1-5烷基; R 9至R 9各自独立地表示氢原子，羟基，C 1-10烷基，芳基， C 7-12-12芳烷基，-R 10 COOR 11或-R 10 CO-（OCH 3） 其中R 5和R 9中的至少一个是羟基;其中R 1，R 2，R 2，R 3， R 10表示C 2-5亚烷基; R 11表示C 1-8烷基; n为2〜20的整数。
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公开(公告)号：US20120045758A1
公开(公告)日：2012-02-23
申请号：US13129352
申请日：2009-11-16
IPC分类号： C12Q1/68
CPC分类号： C12N5/0607 , C12Q1/6881 , C12Q2600/154
摘要： Methods for determining a degree of pluripotency in a first putative stem cell relative to a second putative stem cell are provided. In some embodiments the methods include comparing the imprinting status in the first versus the second putative stem cell of a locus selected from among Igf2-H19, Rasgrf1, lgf2R, Kcnq1, and Peg1/Mest. Also provided are methods for distinguishing very small embryonic like (VSEL) stem cells from hematopoietic stem cells (HSCs) and mesenchymal stem cells (MSCs), methods for isolating VSELs from sources expected to include VSELs, methods for assessing the purity of a very small embryonic like stem cell (VSEL) preparation, and kits that include oligonucleotide primers that can be employed in the practice of the claimed methods.
摘要翻译： 提供了确定第一推定干细胞相对于第二推定干细胞的多能性程度的方法。 在一些实施方案中，所述方法包括比较选自Igf2-H19，Rasgrf1，IgG2R，Kcnq1和Peg1 / Mest的基因座的第一和第二推定干细胞中的印记状态。 还提供了将非常小的胚胎样（VSEL）干细胞与造血干细胞（HSC）和间充质干细胞（MSC）区分开的方法，从预期包括VSEL的来源分离VSEL的方法，评估非常小的纯度的方法 胚胎样干细胞（VSEL）制剂，以及包括可用于所要求保护的方法的实践中的寡核苷酸引物的试剂盒。
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6.发明申请Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same 审中-公开感光性树脂组合物的粘合改性剂和含有它的感光性树脂组合物公开(公告)号：US20060222997A1
公开(公告)日：2006-10-05
申请号：US10557305
申请日：2004-06-04
IPC分类号： G03C5/18
CPC分类号： G03F7/0226 , G03F7/085
摘要： An adhesion-improving agent comprising a sulfonyl group substituted nitrogen compound represented by the below described general formulae (1) to (5) or a thiadiazole compound represented by the below described general formulae (6) to (8) and a photosensitive resin composition containing an alkali-soluble resin and a photosensitizer, comprising said adhesion-improving agent.
摘要翻译： 包含由下述通式（1）至（5）表示的磺酰基取代的氮化合物或由下述通式（6）至（8）表示的噻二唑化合物的粘附改进剂和含有 碱溶性树脂和光敏剂，其包含所述粘合改进剂。
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