公开(公告)号：US08278028B2

公开(公告)日：2012-10-02

申请号：US12098180

申请日：2008-04-04

申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

IPC分类号： G03F7/20

CPC分类号： C09K19/544 ,  Y10T428/24802

摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.

摘要翻译： 本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。 根据本发明的形成材料图案的方法包括以下步骤： （a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。 根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们简单地形成模具，金属薄膜和金属图案。

公开(公告)号：US20080248264A1

公开(公告)日：2008-10-09

申请号：US12098180

申请日：2008-04-04

申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

IPC分类号： G03F7/00 ,  C09K19/00 ,  B32B5/00

CPC分类号： C09K19/544 ,  Y10T428/24802

摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.

摘要翻译： 本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。 根据本发明的形成材料图案的方法包括以下步骤： （a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。 根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们形成简单的模具，金属薄膜和金属图案。

公开(公告)号：US07989154B2

公开(公告)日：2011-08-02

申请号：US11911897

申请日：2006-11-06

申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

IPC分类号： G03F7/26

CPC分类号： G03F7/201 ,  G03F7/70291 ,  G03F7/70308 ,  G03F7/7035 ,  G03F7/70383 ,  Y10T428/24802

摘要： A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.

摘要翻译： 在衬底上制造聚合物或抗蚀剂图案的方法包括在衬底上涂覆光敏聚合物或抗蚀剂以形成聚合物或抗蚀剂层，确定要暴露于光的聚合物或抗蚀剂层的一部分，将光调节层 在光聚合物或抗蚀剂层上照射的光路中，并且调整光调节层以调节聚合物或抗蚀剂层上的光照的方向或强度。 基于该方法，通过调节入射光的方向或强度，容易制造聚合物或抗蚀剂图案，金属膜图案，金属图案结构和聚合物模具，每个具有各种斜率或形状的三维结构 当进行光刻工艺时。

公开(公告)号：US20090167963A1

公开(公告)日：2009-07-02

申请号：US11994816

申请日：2006-06-26

申请人： O-Deuk Kwon ,  Koeng Su Lim ,  Joon-Yong Choi ,  Dae-Hyun Kim ,  Jun-Bo Yoon ,  Jin-Wan Jeon

发明人： O-Deuk Kwon ,  Koeng Su Lim ,  Joon-Yong Choi ,  Dae-Hyun Kim ,  Jun-Bo Yoon ,  Jin-Wan Jeon

IPC分类号： H04N9/31

CPC分类号： H04N5/7458

摘要： A projection display apparatus using a microlens array and a micromirror array comprises a substrate, multiple micromirror arrays and multiple microlens arrays. The substrate is disposed apart with a predetermined distance from a light source. The multiple micromirror arrays are disposed over the substrate to be assembled together to have a predetermined incidence angle with respect to the incident rays. The multiple microlens arrays are configured to correspond to the micromirror arrays. More specifically, a first microlens array is disposed in a predetermined region between the light source and the substrate and comprises multiple microlenses. A second microlens array is disposed in a light path of reflection rays reflected from the micromirrors.

摘要翻译： 使用微透镜阵列和微镜阵列的投影显示装置包括基板，多个微镜阵列和多个微透镜阵列。 基板与光源隔开预定的距离。 多个微镜阵列设置在基板上以组装在一起以具有相对于入射光线的预定入射角。 多个微透镜阵列被配置为对应于微镜阵列。 更具体地，第一微透镜阵列设置在光源和衬底之间的预定区域中，并且包括多个微透镜。 第二微透镜阵列设置在从微反射镜反射的反射光线的光路中。

公开(公告)号：US20080182081A1

公开(公告)日：2008-07-31

申请号：US11911897

申请日：2006-11-06

申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

IPC分类号： G03F7/30 ,  G03F7/40 ,  B32B3/00

CPC分类号： G03F7/201 ,  G03F7/70291 ,  G03F7/70308 ,  G03F7/7035 ,  G03F7/70383 ,  Y10T428/24802

摘要： A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.

摘要翻译： 在衬底上制造聚合物或抗蚀剂图案的方法包括在衬底上涂覆光敏聚合物或抗蚀剂以形成聚合物或抗蚀剂层，确定要暴露于光的聚合物或抗蚀剂层的一部分，将光调节层 在光聚合物或抗蚀剂层上照射的光路中，并且调整光调节层以调节聚合物或抗蚀剂层上的光照的方向或强度。 基于该方法，通过调节入射光的方向或强度，容易制造聚合物或抗蚀剂图案，金属膜图案，金属图案结构和聚合物模具，每个具有各种斜率或形状的三维结构 当进行光刻工艺时。

公开(公告)号：US07081872B2

公开(公告)日：2006-07-25

申请号：US10105281

申请日：2002-03-26

申请人： Koeng Su Lim ,  Jun-Bo Yoon ,  Jin-Wan Jeon

发明人： Koeng Su Lim ,  Jun-Bo Yoon ,  Jin-Wan Jeon

IPC分类号： G09G3/34 ,  G02B26/00

CPC分类号： G02B26/0841 ,  B81B3/0051 ,  B81B2201/042 ,  B81B2203/058 ,  Y10S359/904

摘要： Disclosed are a micromirror device made in a simple structure using interdigitated cantilevers and having two stable rotational states, and applications thereof. The micromirror device comprises: (a) a substrate; (b) at least two protruded support posts arranged protrudedly in two columns of left and right sides on the substrate and apart by a predetermined interval from each other; (c) multiple cantilevers formed in parallel with the substrate, each having one end attached at the upper end portion of the respective protruded support posts and made in a thin strip having an elastic restoring force, wherein the cantilevers adjacent to each other are arranged to be parallel and interdigitated; (d) mirror support posts coupled to upper portions of the other ends of the cantilevers; (e) a mirror attached on upper portions of the whole mirror support posts and supported by the mirror support posts; and (f) two electrodes formed at left and right sides on the substrate, for providing an electrostatic force to the mirror, wherein the micromirror device reflects light incident into the mirror in different directions from each other by using an electrostatic force due to a voltage applied between the electrodes and the mirror, and the elastic restoring force of the cantilevers. The micromirror device can drive the mirror in two directions and adjust a rotational angle of the mirror using the electrostatic force due to a potential difference between the electrodes and the mirror for reflecting incident light, and the elastic restoring force of the cantilevers.

公开(公告)号：US20120048342A1

公开(公告)日：2012-03-01

申请号：US13217707

申请日：2011-08-25

申请人： Koeng Su Lim ,  Jin-Wan Jeon

发明人： Koeng Su Lim ,  Jin-Wan Jeon

IPC分类号： H01L31/05 ,  H01L31/18

CPC分类号： H01L31/1872 ,  H01L31/046 ,  H01L31/0465 ,  H01L31/072 ,  Y02E10/50 ,  Y02P70/521

摘要： Disclosed is an integrated thin film photovoltaic device. The integrated thin film photovoltaic device includes: a substrate including trenches formed therein; a first semiconductor material layer formed on the substrate from a first basic line within each of the trenches through one side of each of the trenches to the projected surface of the substrate, which is adjacent to the one side; a second semiconductor material layer formed on a resultant substrate from a second basic line on the first semiconductor material layer within each of the trenches through the other side of each of the trenches to the projected surface of the resultant substrate, which is adjacent to the other side, so that a portion of the first semiconductor material layer and a portion of the second semiconductor material layer are overlapped with each other within each of the trenches.

摘要翻译： 公开了一种集成薄膜光伏器件。 集成薄膜光伏器件包括：衬底，其包括形成在其中的沟槽; 第一半导体材料层，其从每个沟槽中的每个沟槽中的第一基本线通过每个沟槽的一侧到与所述一侧相邻的衬底的突出表面形成; 形成在所得基板上的第二半导体材料层，该第二基线从每个沟槽中的每个沟槽中的第一半导体材料层上的第二基线通过每个沟槽的另一侧延伸到所得衬底的与另一个相邻的投影表面 使得第一半导体材料层的一部分和第二半导体材料层的一部分在每个沟槽内彼此重叠。

公开(公告)号：US20080211995A1

公开(公告)日：2008-09-04

申请号：US12090229

申请日：2007-03-20

申请人： Jin-Wan Jeon ,  Joo-Hyung Lee ,  Dae-Hyun Kim ,  Koeng Su Lim ,  Jun-Eo Yoon

发明人： Jin-Wan Jeon ,  Joo-Hyung Lee ,  Dae-Hyun Kim ,  Koeng Su Lim ,  Jun-Eo Yoon

IPC分类号： G02B27/18 ,  G02F1/1335

CPC分类号： H04N3/08 ,  H04N5/7458 ,  H04N9/3152

摘要： Provided is a display apparatus using a micromirror or an image display device. The display apparatus is designed to eliminate dark regions, usually formed by pixel partitions or black matrixes, display a high-quality image by increasing light usage efficiency, and improve the power consumption. A display apparatus using a microlens includes a micromirror array, a substrate, and a microlens array. The micromirror array includes a plurality of micromirrors arranged to reflect incident light rays from a light source. The substrate supports the micromirror array. The microlens array includes a plurality of microlenses disposed between the light source and the micromirror array to condense the incident light rays from the light source upon the micromirror array and correct a traveling path of reflected light rays from the micromirror array.

摘要翻译： 提供了使用微镜或图像显示装置的显示装置。 显示装置被设计为消除通常由像素分区或黑矩阵形成的暗区，通过增加光使用效率来显示高质量图像，并且提高功耗。 使用微透镜的显示装置包括微镜阵列，基板和微透镜阵列。 微镜阵列包括多个微反射镜，其布置成反射来自光源的入射光线。 基板支撑微镜阵列。 微透镜阵列包括设置在光源和微镜阵列之间的多个微透镜，以将来自光源的入射光束聚集在微镜阵列上并校正来自微镜阵列的反射光线的行进路径。

公开(公告)号：US08802969B2

公开(公告)日：2014-08-12

申请号：US12851823

申请日：2010-08-06

申请人： Koeng Su Lim ,  Jin-Wan Jeon

发明人： Koeng Su Lim ,  Jin-Wan Jeon

IPC分类号： H01L31/00 ,  H01L27/142

CPC分类号： H01L31/03923 ,  H01L31/022425 ,  H01L31/0392 ,  H01L31/03925 ,  H01L31/0463 ,  H01L31/0465 ,  H01L31/076 ,  Y02E10/541 ,  Y02E10/548 ,  Y02P70/521

摘要： Disclosed is a method for manufacturing a photovoltaic device. The method for manufacturing a photovoltaic device includes providing substrates having trenches formed therein, forming a first electrode layer, and forming an auxiliary electrode layer in areas between the trenches such that the auxiliary electrode layer is located on or under the first electrode layer, the auxiliary electrode layer having electrical resistance less than that of the first electrode layer, and contacting with a portion of an area of the first electrode layer, forming a photovoltaic layer on the first electrode layer or the auxiliary electrode layer, forming a second electrode layer by obliquely depositing a second conductive material on the photovoltaic layer, etching the photovoltaic layer formed in the trenches such that the first electrode layer or the auxiliary electrode layer are exposed and forming a conductive layer by obliquely depositing a third conductive material on the second electrode layer such that the second electrode layer and either the first electrode layer or the auxiliary electrode layer are electrically connected to each other within the trench, the first electrode layer or the auxiliary electrode layer formed in one area generating electricity from light, and the second electrode layer formed in another area generating electricity from light.

摘要翻译： 公开了一种用于制造光伏器件的方法。 制造光伏器件的方法包括提供其中形成有沟槽的衬底，形成第一电极层，以及在沟槽之间的区域中形成辅助电极层，使得辅助电极层位于第一电极层上或下面，辅助电极层 电极层，其电阻小于第一电极层的电阻，并与第一电极层的一部分区域接触，在第一电极层或辅助电极层上形成光电转换层，通过倾斜形成第二电极层 在所述光伏层上沉积第二导电材料，蚀刻形成在所述沟槽中的所述光电层，使得所述第一电极层或所述辅助电极层被暴露并通过在所述第二电极层上倾斜地沉积第三导电材料形成导电层，使得 第二电极层和第一电极层 所述第一电极层或所述辅助电极层在所述沟槽中彼此电连接，所述第一电极层或辅助电极层形成在从光产生电的一个区域中，所述第二电极层形成在从光产生电力的另一区域中。

公开(公告)号：US20110030777A1

公开(公告)日：2011-02-10

申请号：US12851823

申请日：2010-08-06

申请人： Koeng Su Lim ,  Jin-Wan Jeon

发明人： Koeng Su Lim ,  Jin-Wan Jeon

IPC分类号： H01L31/0224 ,  H01L31/18

CPC分类号： H01L31/03923 ,  H01L31/022425 ,  H01L31/0392 ,  H01L31/03925 ,  H01L31/0463 ,  H01L31/0465 ,  H01L31/076 ,  Y02E10/541 ,  Y02E10/548 ,  Y02P70/521

摘要： Disclosed is a method for manufacturing a photovoltaic device. The method for manufacturing a photovoltaic device includes providing substrates having trenches formed therein, forming a first electrode layer, and forming an auxiliary electrode layer in areas between the trenches such that the auxiliary electrode layer is located on or under the first electrode layer, the auxiliary electrode layer having electrical resistance less than that of the first electrode layer, and contacting with a portion of an area of the first electrode layer, forming a photovoltaic layer on the first electrode layer or the auxiliary electrode layer, forming a second electrode layer by obliquely depositing a second conductive material on the photovoltaic layer, etching the photovoltaic layer formed in the trenches such that the first electrode layer or the auxiliary electrode layer are exposed and forming a conductive layer by obliquely depositing a third conductive material on the second electrode layer such that the second electrode layer and either the first electrode layer or the auxiliary electrode layer are electrically connected to each other within the trench, the first electrode layer or the auxiliary electrode layer formed in one area generating electricity from light, and the second electrode layer formed in another area generating electricity from light.

摘要翻译： 公开了一种用于制造光伏器件的方法。 制造光伏器件的方法包括提供其中形成有沟槽的衬底，形成第一电极层，并且在沟槽之间的区域中形成辅助电极层，使得辅助电极层位于第一电极层上或下面，辅助电极层 电极层，其电阻小于第一电极层的电阻，并与第一电极层的一部分区域接触，在第一电极层或辅助电极层上形成光电转换层，通过倾斜形成第二电极层 在所述光伏层上沉积第二导电材料，蚀刻形成在所述沟槽中的所述光电层，使得所述第一电极层或所述辅助电极层被暴露并通过在所述第二电极层上倾斜地沉积第三导电材料形成导电层，使得 第二电极层和第一电极层 所述第一电极层或所述辅助电极层在所述沟槽中彼此电连接，所述第一电极层或辅助电极层形成在从光产生电的一个区域中，所述第二电极层形成在从光产生电力的另一区域中。