THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE
    8.
    发明申请
    THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE 有权
    三维半导体存储器件

    公开(公告)号:US20130171806A1

    公开(公告)日:2013-07-04

    申请号:US13779334

    申请日:2013-02-27

    IPC分类号: H01L21/02

    摘要: Provided is a three-dimensional semiconductor memory device. The three-dimensional semiconductor memory device includes a substrate that has a cell array region including a pair of sub-cell regions and a strapping region interposed between the pair of sub-cell regions. A Plurality of sub-gates are sequentially stacked on the substrate in each of the sub-cell regions, and interconnections are electrically connected to extensions of the stacked sub-gates, respectively, which extend into the strapping region. Each of the interconnections is electrically connected to the extensions of the sub-gate which are disposed in the pair of the sub-cell regions, respectively, and which are located at the same level.

    摘要翻译: 提供一种三维半导体存储器件。 三维半导体存储器件包括具有包括一对子单元区域的单元阵列区域和插入该一对子单元区域之间的带状区域的基板。 多个子栅极依次层叠在每个子单元区域中的衬底上,并且互连电连接到延伸到捆扎区域中的堆叠子栅极的延伸部分。 每个互连电连接到分别设置在一对子单元区域中并且位于同一电平的子栅极的延伸部分。

    Three-Dimensional Memory Device
    10.
    发明申请
    Three-Dimensional Memory Device 有权
    三维存储器件

    公开(公告)号:US20100193861A1

    公开(公告)日:2010-08-05

    申请号:US12694339

    申请日:2010-01-27

    IPC分类号: H01L29/78

    摘要: A three-dimensional semiconductor device includes a semiconductor substrate, vertical channel structures arranged on the semiconductor substrate in a matrix, a P-type semiconductor layer disposed at the semiconductor substrate to be in direct with the vertical channel structures, and a common source line disposed at the semiconductor substrate between the vertical channel structures. The common source line may be in contact with the P-type semiconductor layer.

    摘要翻译: 三维半导体器件包括:半导体衬底,以矩阵形式布置在半导体衬底上的垂直沟道结构;设置在半导体衬底处以与垂直沟道结构直接相连的P型半导体层;以及布置的公共源极线 在垂直沟道结构之间的半导体衬底处。 公共源极线可以与P型半导体层接触。