公开(公告)号：US20100259739A1

公开(公告)日：2010-10-14

申请号：US12644865

申请日：2009-12-22

申请人： Jiro MINABE ,  Akira TATEISHI ,  Katsunori KAWANO ,  Shin YASUDA ,  Yasuhiro OGASAWARA ,  Kazuhiro HAYASHI

发明人： Jiro MINABE ,  Akira TATEISHI ,  Katsunori KAWANO ,  Shin YASUDA ,  Yasuhiro OGASAWARA ,  Kazuhiro HAYASHI

IPC分类号： G03B27/54 ,  G02B5/32

CPC分类号： B41J2/451 ,  G03G15/04054 ,  G03G15/326 ,  G03G2215/0409

摘要： There is provided an exposure device including: a light-emitting element array at which a plurality of light-emitting elements, that emit light that passes through an optical path of diffused light, are arrayed one-dimensionally or two-dimensionally on a substrate; and a hologram element array at which a plurality of hologram elements are formed at positions, that respectively correspond to the plurality of light-emitting elements, of a hologram recording layer disposed on the substrate, so as to diffract and collect, at an outer side of illumination regions of all of the plurality of light-emitting elements, respective lights that are emitted from the plurality of light-emitting elements respectively.

摘要翻译： 提供了一种曝光装置，包括：发光元件阵列，其中发射通过漫射光的光路的光的多个发光元件在基板上一维或二维排列; 以及全息元件阵列，其中多个全息元件形成在分别对应于多个发光元件的位于设置在基板上的全息图记录层的位置处，以便在外侧衍射和收集 所述多个发光元件的照明区域分别是从所述多个发光元件发射的各自的光。

公开(公告)号：US20120236280A1

公开(公告)日：2012-09-20

申请号：US13214889

申请日：2011-08-22

申请人： Jiro MINABE ,  Keishi SHIMIZU ,  Mihoko WAKUI ,  Yasuhiro OGASAWARA ,  Kazuhiro HAYASHI ,  Akira TATEISHI ,  Shin YASUDA ,  Motoki TANIGUCHI

发明人： Jiro MINABE ,  Keishi SHIMIZU ,  Mihoko WAKUI ,  Yasuhiro OGASAWARA ,  Kazuhiro HAYASHI ,  Akira TATEISHI ,  Shin YASUDA ,  Motoki TANIGUCHI

IPC分类号： G02B5/32

CPC分类号： G03G15/04054 ,  G03G15/0435

摘要： An exposure device includes at least one light emitting element that emits light in a normal direction of the substrate; at least one hologram element that is recorded on a recording layer arranged on the substrate to diffract light emitted from the light emitting element and condense the diffracted light on a condensing point on a normal line of the light emitting element; and at least one light inhibiting part that is arranged on a straight line that connects the light emitting element and the condensing point such that the light diffracted by the hologram element passes through the outside of the light inhibiting part and condenses at the condensing point, to inhibit transmission of zeroth-order light that goes straight toward the condensing point from the light emitting element without being diffracted by the hologram element.

摘要翻译： 曝光装置包括：在基板的法线方向上发光的至少一个发光元件; 至少一个全息元件，其被记录在布置在所述基板上的记录层上，以衍射从所述发光元件发射的光并将所述衍射光冷凝在所述发光元件的法线上的聚光点上; 以及至少一个光抑制部，其布置在连接发光元件和聚光点的直线上，使得由全息元件衍射的光穿过光抑制部分的外部并在聚光点处冷凝至至 抑制从发光元件直接朝向聚光点传播的零级光的透射，而不被全息元件衍射。