公开(公告)号：US20160282727A1

公开(公告)日：2016-09-29

申请号：US15178522

申请日：2016-06-09

申请人： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MElJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertu MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Helmar VAN SANTEN

发明人： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MElJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertu MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Helmar VAN SANTEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

公开(公告)号：US20130250270A1

公开(公告)日：2013-09-26

申请号：US13615190

申请日：2012-09-13

申请人： Joeri LOF ,  Erik Theodorus Maria BIJLAART ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Antonius Theodorus Anna Maria DERKSEN

发明人： Joeri LOF ,  Erik Theodorus Maria BIJLAART ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Antonius Theodorus Anna Maria DERKSEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70858 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7085

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。

公开(公告)号：US20120013870A1

公开(公告)日：2012-01-19

申请号：US13240867

申请日：2011-09-22

申请人： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

发明人： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

公开(公告)号：US20110176121A1

公开(公告)日：2011-07-21

申请号：US13004557

申请日：2011-01-11

申请人： Erik Roelof LOOPSTRA ,  Marius RAVENSBERGEN ,  Franciscus Johannes Joseph JANSSEN

发明人： Erik Roelof LOOPSTRA ,  Marius RAVENSBERGEN ,  Franciscus Johannes Joseph JANSSEN

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03B27/54 ,  G03F7/70266 ,  G03F7/70891

摘要： In a lithographic apparatus, a part of a reflector is heated and cooled. The rate of heating and/or the rate of cooling is adjusted to adjust the temperature of the part. The change in temperature of the part exerts a force on the reflector, which changes its shape.

摘要翻译： 在光刻设备中，反射器的一部分被加热和冷却。 调节加热速率和/或冷却速率以调节部件的温度。 部件的温度变化在反射器上施加力，其改变其形状。

公开(公告)号：US20110026002A1

公开(公告)日：2011-02-03

申请号：US12830777

申请日：2010-07-06

申请人： Erik Roelof LOOPSTRA ,  Gerardus Hubertus Petrus Maria Swinkels ,  Uwe Bruno Heini Stamm

发明人： Erik Roelof LOOPSTRA ,  Gerardus Hubertus Petrus Maria Swinkels ,  Uwe Bruno Heini Stamm

IPC分类号： G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70941 ,  G03F7/70033 ,  G03F7/70575 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.

摘要翻译： EUV辐射发生装置包括光学增益介质，该光学增益介质被配置为产生用于与目标材料相互作用的激光辐射以产生EUV辐射发射等离子体，以及限定激光辐射通过的孔径的结构。 该结构包括具有构造和布置成将激光辐射远离光学增益介质的外表面的辐射导向器。

公开(公告)号：US20100053581A1

公开(公告)日：2010-03-04

申请号：US12543578

申请日：2009-08-19

申请人： Gerardus Hubertus Petrus Maria SWINKELS ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Johannes Hubertus Josephina MOORS

发明人： Gerardus Hubertus Petrus Maria SWINKELS ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Johannes Hubertus Josephina MOORS

IPC分类号： G03B27/42 ,  B01J19/12

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造和布置成产生燃料液滴的液滴发生器，被构造和布置成在液滴发生器产生燃料液滴之后加热燃料液滴的加热器，并且减少存在于燃料液滴中的燃料质量和/或 降低燃料液滴的密度，以及被构造和布置成将辐射引导到已被加热器加热以产生极紫外辐射的燃料液滴上的辐射发射器。

公开(公告)号：US20090208878A1

公开(公告)日：2009-08-20

申请号：US12212163

申请日：2008-09-17

申请人： Erik Roelof LOOPSTRA ,  Donis George Flagello

发明人： Erik Roelof LOOPSTRA ,  Donis George Flagello

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70408

摘要： A lithographic system includes two lithographic apparatus. A first lithographic apparatus is configured to project a patterned radiation beam onto a first target portion of a substrate. The second lithographic apparatus includes an interferometric arrangement configured to split the radiation beam and to recombine the split beams so as to produce an interference pattern. A masking arrangement is configured to selectively transmit a portion of the interference pattern and a projection system is configured to project the selectively transmitted portion of the interference pattern onto a second target portion of the substrate.

摘要翻译： 光刻系统包括两个光刻设备。 第一光刻设备被配置为将图案化的辐射束投影到衬底的第一目标部分上。 第二光刻设备包括被配置为分离辐射束并且将分束束复合以产生干涉图案的干涉布置。 掩模布置被配置为选择性地传送干涉图案的一部分，并且投影系统被配置为将干涉图案的选择性地发送的部分投影到基板的第二目标部分上。

公开(公告)号：US20080319569A1

公开(公告)日：2008-12-25

申请号：US12142271

申请日：2008-06-19

申请人： Erik Roelof LOOPSTRA ,  Emiel Jozef Melanie EUSSEN ,  Willem Herman Gertruda Anna KOENEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Marc Wilhelmus Maria VAN DER WIJST

发明人： Erik Roelof LOOPSTRA ,  Emiel Jozef Melanie EUSSEN ,  Willem Herman Gertruda Anna KOENEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Marc Wilhelmus Maria VAN DER WIJST

IPC分类号： G06F19/00

CPC分类号： G03F7/709 ,  G03F7/70775 ,  G03F7/70858 ,  G03F9/7096

摘要： A control system controls a support structure of a lithographic apparatus. A first measurement system measures the position of a substrate supported by the support structure, in a first coordinate system. A second measurement system measures the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. A controller controls the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure dependent upon the position error signal.

摘要翻译： 控制系统控制光刻设备的支撑结构。 第一测量系统在第一坐标系中测量由支撑结构支撑的基板的位置。 第二测量系统测量支撑结构在第二坐标系中的位置，第一测量系统在第二坐标系中具有推测位置。 控制器基于第二测量系统的测量来控制支撑结构的位置，将基板的测量位置转换成第二坐标系中的支撑结构的转换位置，以基于转换位置定位支撑结构 以接收表示第二坐标系中的第一测量系统的推定位置与实际位置之间的差异的位置误差信号，并且依赖于位置误差信号定位支撑结构。

公开(公告)号：US20100149516A1

公开(公告)日：2010-06-17

申请号：US12616312

申请日：2009-11-11

申请人： Erik Roelof LOOPSTRA ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

发明人： Erik Roelof LOOPSTRA ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58

CPC分类号： G03F7/709 ,  G03F7/70525 ,  G03F7/70758 ,  G03F7/70766

摘要： Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object.

摘要翻译： 本发明的实施例提供了一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，被构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，用于支撑投影系统的主动空气支架，主动空气支架包括至少一个 致动器和前馈装置，所述前馈装置被配置为基于可移动物体的设定点信号提供到所述至少一个致动器的前馈信号，其中所述前馈信号 被设计成由于可移动物体的移动而减小对投影系统的干扰效应。

公开(公告)号：US20100085551A1

公开(公告)日：2010-04-08

申请号：US12563838

申请日：2009-09-21

申请人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Andre Bernardus JEUNINK ,  Erik Roelof LOOPSTRA ,  Joost Jeroen OTTENS ,  Rene Theodorus Petrus COMPEN ,  Peter SMITS ,  Martijn HOUBEN ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Antonius Arnoldus MEULENDIJKS ,  Rene Wilhelmus Antonius Hubertus LEENAARS

发明人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Andre Bernardus JEUNINK ,  Erik Roelof LOOPSTRA ,  Joost Jeroen OTTENS ,  Rene Theodorus Petrus COMPEN ,  Peter SMITS ,  Martijn HOUBEN ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Antonius Arnoldus MEULENDIJKS ,  Rene Wilhelmus Antonius Hubertus LEENAARS

IPC分类号： G03B27/72

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。 如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。 滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。