公开(公告)号：US08154708B2

公开(公告)日：2012-04-10

申请号：US11482122

申请日：2006-07-07

申请人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Erik Theodorus Maria Bijlaart ,  Christiaan Alexander Hoogendam ,  Helmar Van Santen ,  Marcus Adrianus Van De Kerhof ,  Mark Kroon ,  Arie Jeffrey Den Boef ,  Joost Jeroen Ottens ,  Jeroen Johannes Sophia Maria Mertens

发明人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Erik Theodorus Maria Bijlaart ,  Christiaan Alexander Hoogendam ,  Helmar Van Santen ,  Marcus Adrianus Van De Kerhof ,  Mark Kroon ,  Arie Jeffrey Den Boef ,  Joost Jeroen Ottens ,  Jeroen Johannes Sophia Maria Mertens

IPC分类号： G03B27/58

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。

公开(公告)号：US07453078B2

公开(公告)日：2008-11-18

申请号：US11896981

申请日：2007-09-07

申请人： Haico Victor Kok ,  Marcus Adrianus Van De Kerhof ,  Borgert Kruizinga ,  Timotheus Franciscus Sengers ,  Bearrach Moest ,  Marc Antonius Maria Haast ,  Peter Weissbrodt ,  Manfred Schrenk ,  Torsten Harzendorf

发明人： Haico Victor Kok ,  Marcus Adrianus Van De Kerhof ,  Borgert Kruizinga ,  Timotheus Franciscus Sengers ,  Bearrach Moest ,  Marc Antonius Maria Haast ,  Peter Weissbrodt ,  Manfred Schrenk ,  Torsten Harzendorf

IPC分类号： G01N21/84 ,  G03B27/42

CPC分类号： G03F7/7085

摘要： A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

摘要翻译： 一种用于高数值温度光刻设备中的衬底级别的传感器，该传感器具有覆盖感测元件的透明板，并且包括改善辐射与感测元件的耦合的元件。 元件包括菲涅尔透镜，全息光学元件，倒置的温斯顿锥体，球面透镜和表面粗糙化。

公开(公告)号：US07282701B2

公开(公告)日：2007-10-16

申请号：US11067491

申请日：2005-02-28

申请人： Haico Victor Kok ,  Marcus Adrianus Van De Kerhof ,  Borgert Kruizinga ,  Timotheus Franciscus Sengers ,  Bearrach Moest ,  Marc Antonius Maria Haast ,  Peter Weissbrodt ,  Manfred Schrenk ,  Torsten Harzendorf

发明人： Haico Victor Kok ,  Marcus Adrianus Van De Kerhof ,  Borgert Kruizinga ,  Timotheus Franciscus Sengers ,  Bearrach Moest ,  Marc Antonius Maria Haast ,  Peter Weissbrodt ,  Manfred Schrenk ,  Torsten Harzendorf

IPC分类号： H01J3/14 ,  H01J5/16 ,  H01J40/14

CPC分类号： G03F7/7085

摘要： A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

摘要翻译： 一种用于高数值温度光刻设备中的衬底级别的传感器，该传感器具有覆盖感测元件的透明板，并且包括改善辐射与感测元件的耦合的元件。 元件包括菲涅尔透镜，全息光学元件，倒置的温斯顿锥体，球面透镜和表面粗糙化。

公开(公告)号：US06906787B2

公开(公告)日：2005-06-14

申请号：US10716938

申请日：2003-11-20

申请人： Marcus Adrianus Van De Kerhof ,  Wilhelmus Petrus De Boeij ,  Marcel Maurice Hemerik

发明人： Marcus Adrianus Van De Kerhof ,  Wilhelmus Petrus De Boeij ,  Marcel Maurice Hemerik

IPC分类号： G21K5/00 ,  G01J1/42 ,  G01J1/58 ,  G01T1/20 ,  G02B5/26 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70558 ,  G01J1/429 ,  G01J1/58 ,  G03F7/7085

摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of primary radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, the sensor including a radiation-sensitive material which converts incident primary radiation into secondary radiation, a radiation detector capable of detecting said secondary radiation emerging from said material, and a filter material for preventing secondary radiation from traveling in a direction away from the radiation detector.

摘要翻译： 光刻投影装置包括用于提供初级辐射的投影光束的辐射系统，用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构，用于保持基板的基板台， 系统，用于将图案化的光束投影到基板的目标部分上，辐射传感器，其可在由投影光束穿过的路径中移动，用于将一次辐射从投影光束接收，该传感器包括转换入射的辐射敏感材料 初级辐射进入次级辐射，能够检测从所述材料出射的所述次级辐射的辐射检测器和用于防止二次辐射沿远离辐射检测器的方向行进的过滤材料。