公开(公告)号：US07375795B2

公开(公告)日：2008-05-20

申请号：US11018930

申请日：2004-12-22

申请人： Joeri Lof ,  Jeroen Fluit ,  Bernardus Antonius Johannes Luttikhuis ,  Peter Spit

发明人： Joeri Lof ,  Jeroen Fluit ,  Bernardus Antonius Johannes Luttikhuis ,  Peter Spit

IPC分类号： G03B27/42

CPC分类号： G03F7/70791 ,  G03F7/70291

摘要： Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.

摘要翻译： 基板处理装置包括光刻设备，该光刻设备包括用于提供投射辐射束的照明系统，用于使投影光束在其横截面上具有图案的独立可控元件的阵列，以及投影系统， 到基板的目标部分上。 处理装置还包括布置成输出至少一个不间断长度的基板的基板供给源，以及基板输送系统，其布置成将基板的每个输出的不间断长度从基板供给输送并经过投影系统，使得投影系统能够 沿着每个不间断长度的衬底将图案化的光束投影到一系列目标部分上。 在某些实施例中，长的基底是从卷筒供应的，但也可以提供一系列单独的片材。

公开(公告)号：US20090061361A1

公开(公告)日：2009-03-05

申请号：US12262647

申请日：2008-10-31

申请人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

发明人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.

摘要翻译： 公开了通过光刻设备制造集成电路的方法。 所述方法包括用图案形成装置图案化辐射束，使用投影系统将图案化的光束投射到衬底上，并且确定图案形成装置的位置。 在一个示例中，图案形成装置相对于投影系统的位置通过测量图案形成装置的支撑结构的位置来确定。 在另一示例中，位置可以通过测量图案形成装置相对于其支撑件的位置并通过测量支撑件的位置来确定。 在另一示例中，通过将至少一束辐射引导到位于图案区域外的图案形成装置的一部分来确定图案形成装置的Z位置。 这可以通过将一对激光束从投影系统上的传感器引导到图案形成装置上的反射条来实现。

公开(公告)号：US07471373B2

公开(公告)日：2008-12-30

申请号：US10876786

申请日：2004-06-25

申请人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

发明人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bernardus Antonius Johannes Luttikhuis ,  Engelbertus Antonius Franciscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Marc Johannes Martinus Engels

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于将图案化的辐射束投影到基板的目标部分上的投影系统和用于确定图案形成装置相对于投影系统的空间位置的组件。 组件包括具有安装在投影系统上的多个传感器的测量单元。

公开(公告)号：US07130019B2

公开(公告)日：2006-10-31

申请号：US10986182

申请日：2004-11-12

申请人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Carlo Cornelis Maria Luijten ,  Bernardus Antonius Johannes Luttikhuis ,  Michael Ten Bhomer ,  Ferdy Migchelbrink ,  Jan Jaap Kuit

发明人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Carlo Cornelis Maria Luijten ,  Bernardus Antonius Johannes Luttikhuis ,  Michael Ten Bhomer ,  Ferdy Migchelbrink ,  Jan Jaap Kuit

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

摘要： A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10−6/K.

摘要翻译： 提供了一种光刻设备，其包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。 图案形成装置用于使辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于提供参考表面的隔离参考框架，以及用于测量基板相对于基板的测量系统 参考面。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。

公开(公告)号：US07961291B2

公开(公告)日：2011-06-14

申请号：US11316359

申请日：2005-12-23

申请人： Erik Roelof Loopstra ,  Bernardus Antonius Johannes Luttikhuis

发明人： Erik Roelof Loopstra ,  Bernardus Antonius Johannes Luttikhuis

IPC分类号： G03B27/42 ,  G03B27/62

CPC分类号： G03F7/70741 ,  G03F7/70733

摘要： A lithographic apparatus includes an illumination system to condition a radiation beam, a patterning device support to support a patterning device in a projection plane, the patterning device to pattern the radiation beam, a substrate table to hold a substrate, a projection system to project the patterned beam onto the substrate, and an exchange device to exchange an exchangeable object with an exchangeable object support that holds the exchangeable object during projection. The exchange device includes a load unit and an unload unit that each have a holding device to hold an exchangeable object. The holding devices are positioned substantially adjacent to each other and configured to hold an exchangeable object in a plane substantially parallel to the plane in which the exchangeable object is held in the exchangeable object support during projection. The exchangeable object support exchanges an exchangeable object with each of the holding devices.

摘要翻译： 光刻设备包括用于调节辐射束的照明系统，图案形成装置支撑件以支撑投影平面中的图案形成装置，图案形成装置对辐射束进行图案化，衬底台以保持衬底，投影系统将投影系统投影 图案化的光束到基板上，以及交换装置，用于在可投影对象期间交换可交换对象与可更换物体的支撑。 交换装置包括负载单元和卸载单元，每个都具有用于保持可更换对象的保持装置。 保持装置基本上彼此相邻地定位，并且构造成将可交换物体保持在基本上平行于平面的平面中，在该平面中可交换物体在投影期间保持在可更换物体支撑件中。 可交换对象支持与每个保持装置交换可交换对象。

公开(公告)号：US20100002207A1

公开(公告)日：2010-01-07

申请号：US12483703

申请日：2009-06-12

申请人： Erik Roelof LOOPSTRA ,  Petrus Rutgerus Bartray ,  Leon Martin Levasier ,  Bernardus Antonius Johannes Luttikhuis ,  Josephus Jacobus Smits ,  Anthonie Aantjes ,  Maurice Willem Jozef Etienne Wijckmans ,  Johannes Bernardus Ridder ,  Andre Schreuder ,  Dennis Jozef Maria Paulussen ,  Peter Gerardus Jonkers ,  Hugues Poincelin ,  Fransiscus Theresia Noel Heusschen

发明人： Erik Roelof LOOPSTRA ,  Petrus Rutgerus Bartray ,  Leon Martin Levasier ,  Bernardus Antonius Johannes Luttikhuis ,  Josephus Jacobus Smits ,  Anthonie Aantjes ,  Maurice Willem Jozef Etienne Wijckmans ,  Johannes Bernardus Ridder ,  Andre Schreuder ,  Dennis Jozef Maria Paulussen ,  Peter Gerardus Jonkers ,  Hugues Poincelin ,  Fransiscus Theresia Noel Heusschen

IPC分类号： G03B27/52

CPC分类号： G03F7/709 ,  G03F7/70808

摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.

摘要翻译： 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

公开(公告)号：US20090284730A1

公开(公告)日：2009-11-19

申请号：US12512220

申请日：2009-07-30

申请人： Harmen Klaas VAN DER SCHOOT ,  Hernes Jacobs ,  Bernardus Antonius Johannes Luttikhuis ,  Petrus Matthijs Henricus Vosters ,  Johannes Martinus Andreas Hazenberg ,  Aart Adrianus Van Beuzekom

发明人： Harmen Klaas VAN DER SCHOOT ,  Hernes Jacobs ,  Bernardus Antonius Johannes Luttikhuis ,  Petrus Matthijs Henricus Vosters ,  Johannes Martinus Andreas Hazenberg ,  Aart Adrianus Van Beuzekom

IPC分类号： G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/7075

摘要： An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.

摘要翻译： 提供了一种装置，方法和系统来调节基板。 该装置可以包括基板处理器，二极管阵列和投影系统。 衬底处理器可以包括调节装置，浮子装置和置换装置。 二极管阵列可以被配置为提供图案化的辐射束，其中投影系统将图案化的辐射束投影到经调理的基底的目标部分上。

公开(公告)号：US07545478B2

公开(公告)日：2009-06-09

申请号：US10838525

申请日：2004-05-05

申请人： Wilhelmus Josephus Box ,  Bernardus Antonius Johannes Luttikhuis ,  Thomas Henricus Jacobus Verhagen

发明人： Wilhelmus Josephus Box ,  Bernardus Antonius Johannes Luttikhuis ,  Thomas Henricus Jacobus Verhagen

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70833 ,  G03F7/70891

摘要： A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation beam; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a projection system support configured to support the projection system on a reference frame. The lithographic apparatus further includes a thermal conditioning system configured to thermally condition the projection system support. The invention further relates to a thermal conditioning system constructed and arranged to thermally condition a projection system support. The invention further relates to a device manufacturing method and a method for manufacturing a device.

摘要翻译： 一种具有被配置为提供辐射束的照明系统的光刻设备; 构造成支撑图案形成装置的支撑结构，所述图案形成装置能够在其横截面中赋予所述辐射束图案，从而提供图案化的辐射束; 被配置为保持基板的基板台; 投影系统，布置成将图案化的辐射束投影到基板的目标部分上;以及投影系统支撑件，被配置为将投影系统支撑在参考系上。 光刻设备还包括被配置为热调节投影系统支撑件的热调节系统。 本发明还涉及一种构造和布置成对投影系统支撑件进行热调节的热调节系统。 本发明还涉及一种用于制造器件的器件制造方法和方法。

公开(公告)号：US20140340663A1

公开(公告)日：2014-11-20

申请号：US14345118

申请日：2012-08-21

申请人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Bernardus Antonius Johannes Luttikhuis ,  Roelof Koole ,  Hendrikus Jan Wondergem ,  Petrus Carolus Johannes Graat

发明人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Bernardus Antonius Johannes Luttikhuis ,  Roelof Koole ,  Hendrikus Jan Wondergem ,  Petrus Carolus Johannes Graat

IPC分类号： G03F7/20

CPC分类号： G03F7/70783 ,  G01B11/16 ,  G03F1/84 ,  G03F7/70141 ,  G03F7/7085 ,  G03F7/70916

摘要： A lithographic patterning device deformation monitoring apparatus (38) comprising a radiation source (40), an imaging device (42), and a processor (50). The radiation source being configured to direct a plurality of beams of radiation (41) with a predetermined diameter towards a lithographic patterning device (MA) such that they are reflected by the patterning device. The imaging detector configured to detect spatial positions of the radiation beams (41′) after they have been reflected by the patterning device. The processor configured to monitor the spatial positions of the radiation beams and thereby determine the presence of a patterning device deformation. The imaging detector has an collection angle which is smaller than a minimum angle of diffraction of the radiation beams.

摘要翻译： 一种包括辐射源（40），成像装置（42）和处理器（50）的平版印刷图案形成装置变形监测装置（38）。 辐射源被配置为将多个具有预定直径的辐射光束引向平版印刷图案形成装置（MA），使得它们被图案形成装置反射。 该成像检测器被配置为在被图案形成装置反射之后检测辐射束（41'）的空间位置。 处理器被配置为监视辐射束的空间位置，从而确定图案形成装置变形的存在。 成像检测器的收集角度小于辐射束的最小衍射角。

公开(公告)号：US08264670B2

公开(公告)日：2012-09-11

申请号：US11343219

申请日：2006-01-31

申请人： Erik Roelof Loopstra ,  Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Fransicus Mathijs Jacobs

发明人： Erik Roelof Loopstra ,  Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Fransicus Mathijs Jacobs

IPC分类号： G03B27/62

CPC分类号： G03F7/707

摘要： The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.

摘要翻译： 本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑透射式图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面上赋予辐射束图案以形成 图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统，其中，图案形成装置支撑件构造成保持图案形成装置，并且其中光刻装置包括 夹持装置，夹持装置构造成将图案形成装置夹在顶侧。