公开(公告)号：US20070013886A1

公开(公告)日：2007-01-18

申请号：US11524262

申请日：2006-09-21

申请人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular. to an exposure plane of the substrate.

摘要翻译： 公开了一种浸没式光刻设备，其包括液体供应系统，该液体供应系统具有被配置为将液体供应到光刻设备的投影系统与基板之间的空间的入口以及被构造成去除至少部分液体的出口，液体供应 系统构造成围绕基本上垂直的轴线旋转入口，出口或两者。 到基板的曝光平面。

公开(公告)号：US20060147821A1

公开(公告)日：2006-07-06

申请号：US11025603

申请日：2004-12-30

申请人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Christiaan Hoogendam

发明人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Christiaan Hoogendam

IPC分类号： G03B27/00 ,  G03F9/00 ,  G03C5/00

CPC分类号： G03F9/7023 ,  G03F7/70341 ,  G03F7/70883

摘要： A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.

摘要翻译： 提供了一种用于校正浸没式光刻设备的曝光参数的方法。 在该方法中，使用通过投影系统和浸没式光刻设备的衬底台之间的液体投影的测量光束来测量曝光参数，并且基于影响使用测量光束进行的测量的物理性质的变化来确定偏移 至少部分地校正测量的曝光参数。

公开(公告)号：US20060132731A1

公开(公告)日：2006-06-22

申请号：US11015767

申请日：2004-12-20

申请人： Hans Jansen ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Marco Stavenga ,  Bob Streefkerk ,  Jan Cornelis Hoeven ,  Cedric Grouwstra

发明人： Hans Jansen ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Marco Stavenga ,  Bob Streefkerk ,  Jan Cornelis Hoeven ,  Cedric Grouwstra

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

公开(公告)号：US20050007569A1

公开(公告)日：2005-01-13

申请号：US10844575

申请日：2004-05-13

申请人： Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

发明人： Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

公开(公告)号：US20050231694A1

公开(公告)日：2005-10-20

申请号：US10823777

申请日：2004-04-14

申请人： Aleksey Kolesnychenko ,  Johannes Jacobus Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Felix Peeters ,  Bob Streefkerk ,  Franciscus Johannes Teunissen ,  Helmar Santen

发明人： Aleksey Kolesnychenko ,  Johannes Jacobus Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Felix Peeters ,  Bob Streefkerk ,  Franciscus Johannes Teunissen ,  Helmar Santen

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

摘要翻译： 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。

公开(公告)号：US20060007419A1

公开(公告)日：2006-01-12

申请号：US10885489

申请日：2004-07-07

申请人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens

发明人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

公开(公告)号：US20070159613A1

公开(公告)日：2007-07-12

申请号：US11709834

申请日：2007-02-23

申请人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.

公开(公告)号：US20060119807A1

公开(公告)日：2006-06-08

申请号：US11001082

申请日：2004-12-02

申请人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.

摘要翻译： 公开了一种浸没式光刻设备，其包括液体供应系统，该液体供应系统具有被配置为将液体供应到光刻设备的投影系统与基板之间的空间的入口以及被构造成去除至少部分液体的出口，液体供应 系统构造成围绕基本上垂直于衬底的曝光平面的轴旋转入口，出口或两者。

公开(公告)号：US20060158626A1

公开(公告)日：2006-07-20

申请号：US11298942

申请日：2005-12-12

申请人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Mertens ,  Johannes Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Mertens ,  Johannes Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42

CPC分类号： G03F9/7023 ,  G03F7/70341 ,  G03F7/70883

摘要： A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. Also, there is provided an apparatus and method to measure a height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus.

摘要翻译： 提供了一种用于校正浸没式光刻设备的曝光参数的方法。 在该方法中，使用通过投影系统和浸没式光刻设备的衬底台之间的液体投影的测量光束来测量曝光参数，并且基于影响使用测量光束进行的测量的物理性质的变化来确定偏移 至少部分地校正测量的曝光参数。 此外，提供了一种用于在浸没式光刻设备中测量连接到投影系统和基板台之间的液体的光学元件的高度的装置和方法。

公开(公告)号：US20080002162A1

公开(公告)日：2008-01-03

申请号：US11656560

申请日：2007-01-23

申请人： Hans Jansen ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Mertens ,  Johannes Mulkens ,  Marco Stavenga ,  Bob Streefkerk ,  Jan Van Der Hoeven ,  Cedric Grouwstra

发明人： Hans Jansen ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Mertens ,  Johannes Mulkens ,  Marco Stavenga ,  Bob Streefkerk ,  Jan Van Der Hoeven ,  Cedric Grouwstra

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。