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公开(公告)号:US20070013886A1
公开(公告)日:2007-01-18
申请号:US11524262
申请日:2006-09-21
申请人: Johannes Baselmans , Sjoerd Donders , Christiaan Hoogendam , Jeroen Johannes Mertens , Johannes Mulkens , Bob Streefkerk
发明人: Johannes Baselmans , Sjoerd Donders , Christiaan Hoogendam , Jeroen Johannes Mertens , Johannes Mulkens , Bob Streefkerk
IPC分类号: G03B27/42
CPC分类号: G03F7/70341
摘要: An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular. to an exposure plane of the substrate.
摘要翻译: 公开了一种浸没式光刻设备,其包括液体供应系统,该液体供应系统具有被配置为将液体供应到光刻设备的投影系统与基板之间的空间的入口以及被构造成去除至少部分液体的出口,液体供应 系统构造成围绕基本上垂直的轴线旋转入口,出口或两者。 到基板的曝光平面。
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公开(公告)号:US20060147821A1
公开(公告)日:2006-07-06
申请号:US11025603
申请日:2004-12-30
申请人: Bob Streefkerk , Johannes Baselmans , Sjoerd Donders , Jeroen Johannes Mertens , Johannes Mulkens , Christiaan Hoogendam
发明人: Bob Streefkerk , Johannes Baselmans , Sjoerd Donders , Jeroen Johannes Mertens , Johannes Mulkens , Christiaan Hoogendam
CPC分类号: G03F9/7023 , G03F7/70341 , G03F7/70883
摘要: A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译: 提供了一种用于校正浸没式光刻设备的曝光参数的方法。 在该方法中,使用通过投影系统和浸没式光刻设备的衬底台之间的液体投影的测量光束来测量曝光参数,并且基于影响使用测量光束进行的测量的物理性质的变化来确定偏移 至少部分地校正测量的曝光参数。
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公开(公告)号:US20060132731A1
公开(公告)日:2006-06-22
申请号:US11015767
申请日:2004-12-20
申请人: Hans Jansen , Johannes Baselmans , Sjoerd Donders , Christiaan Hoogendam , Jeroen Johannes Mertens , Johannes Mulkens , Marco Stavenga , Bob Streefkerk , Jan Cornelis Hoeven , Cedric Grouwstra
发明人: Hans Jansen , Johannes Baselmans , Sjoerd Donders , Christiaan Hoogendam , Jeroen Johannes Mertens , Johannes Mulkens , Marco Stavenga , Bob Streefkerk , Jan Cornelis Hoeven , Cedric Grouwstra
IPC分类号: G03B27/52
CPC分类号: G03F7/70341 , G03F7/70925
摘要: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
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公开(公告)号:US20050007569A1
公开(公告)日:2005-01-13
申请号:US10844575
申请日:2004-05-13
申请人: Bob Streefkerk , Levinus Bakker , Johannes Baselmans , Hendrikus Cox , Antonius Theodorus Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Johannes Mertens , Frits Van Der Meulen , Johannes Mulkens , Gerardus Van Nunen , Klaus Simon , Bernardus Slaghekke , Alexander Straaijer , Jan-Gerard Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Levinus Bakker , Johannes Baselmans , Hendrikus Cox , Antonius Theodorus Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Johannes Mertens , Frits Van Der Meulen , Johannes Mulkens , Gerardus Van Nunen , Klaus Simon , Bernardus Slaghekke , Alexander Straaijer , Jan-Gerard Van Der Toorn , Martijn Houkes
IPC分类号: G03F7/20 , H01L21/027 , G03B27/52
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译: 在光刻设备中,将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度,以将液体供应系统保持在基板表面上方的预定高度。
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公开(公告)号:US20050231694A1
公开(公告)日:2005-10-20
申请号:US10823777
申请日:2004-04-14
申请人: Aleksey Kolesnychenko , Johannes Jacobus Baselmans , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Mulkens , Felix Peeters , Bob Streefkerk , Franciscus Johannes Teunissen , Helmar Santen
发明人: Aleksey Kolesnychenko , Johannes Jacobus Baselmans , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Mulkens , Felix Peeters , Bob Streefkerk , Franciscus Johannes Teunissen , Helmar Santen
IPC分类号: G03F7/20 , H01L21/027 , G03B27/42
CPC分类号: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
摘要翻译: 公开了一种浸没式光刻设备的衬底台,其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式,可以收集从液体供应系统溢出的任何液体,以减少光刻投影设备的精细部件污染的风险。
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公开(公告)号:US20050175776A1
公开(公告)日:2005-08-11
申请号:US10986178
申请日:2004-11-12
申请人: Bod Streefkerk , Johannes Baselmans , Richard Bruls , Marcel Mathijs Dierichs , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Erik Loopstra , Jeroen Johannes Mertens , Johannes Mulkens , Ronald Severijns , Sergei Shulepov , Herman Boom , Timotheus Sengers
发明人: Bod Streefkerk , Johannes Baselmans , Richard Bruls , Marcel Mathijs Dierichs , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Erik Loopstra , Jeroen Johannes Mertens , Johannes Mulkens , Ronald Severijns , Sergei Shulepov , Herman Boom , Timotheus Sengers
IPC分类号: H01L21/027 , B05D3/12 , G03F7/20
CPC分类号: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译: 公开了一种浸没式光刻投影装置,其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡,有助于减少与液体接触后的元件上的残留物,就可以在设备的各种元件上使用液体和液体两层。
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公开(公告)号:US20060158626A1
公开(公告)日:2006-07-20
申请号:US11298942
申请日:2005-12-12
申请人: Johannes Baselmans , Sjoerd Donders , Christiaan Hoogendam , Jeroen Mertens , Johannes Mulkens , Bob Streefkerk
发明人: Johannes Baselmans , Sjoerd Donders , Christiaan Hoogendam , Jeroen Mertens , Johannes Mulkens , Bob Streefkerk
IPC分类号: G03B27/42
CPC分类号: G03F9/7023 , G03F7/70341 , G03F7/70883
摘要: A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. Also, there is provided an apparatus and method to measure a height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus.
摘要翻译: 提供了一种用于校正浸没式光刻设备的曝光参数的方法。 在该方法中,使用通过投影系统和浸没式光刻设备的衬底台之间的液体投影的测量光束来测量曝光参数,并且基于影响使用测量光束进行的测量的物理性质的变化来确定偏移 至少部分地校正测量的曝光参数。 此外,提供了一种用于在浸没式光刻设备中测量连接到投影系统和基板台之间的液体的光学元件的高度的装置和方法。
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公开(公告)号:US20080002162A1
公开(公告)日:2008-01-03
申请号:US11656560
申请日:2007-01-23
申请人: Hans Jansen , Johannes Baselmans , Sjoerd Donders , Christiaan Hoogendam , Jeroen Mertens , Johannes Mulkens , Marco Stavenga , Bob Streefkerk , Jan Van Der Hoeven , Cedric Grouwstra
发明人: Hans Jansen , Johannes Baselmans , Sjoerd Donders , Christiaan Hoogendam , Jeroen Mertens , Johannes Mulkens , Marco Stavenga , Bob Streefkerk , Jan Van Der Hoeven , Cedric Grouwstra
IPC分类号: G03B27/42
CPC分类号: G03F7/70341 , G03F7/70925
摘要: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
摘要翻译: 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地,可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地,可以在衬底台上设置清洁装置,并且可以设置超声发射器以产生超声波清洗液体。
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公开(公告)号:US20060176458A1
公开(公告)日:2006-08-10
申请号:US11375039
申请日:2006-03-15
申请人: Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
发明人: Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
IPC分类号: G03B27/42
CPC分类号: G03F7/707 , G03F7/70341 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
摘要翻译: 在光刻投影设备中,液体供应系统在投影系统的最终元件和光刻投影设备的基板之间的空间中提供液体。 提供挡板构件以在例如基板交换期间容纳液体供应系统中的液体。
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公开(公告)号:US20050264778A1
公开(公告)日:2005-12-01
申请号:US10857614
申请日:2004-06-01
申请人: Joeri Lof , Erik Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Meijer , Jeroen Maria Mertens , Johannes Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Meijer , Jeroen Maria Mertens , Johannes Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03F7/20 , H01L21/027 , G03B27/42
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译: 公开了一种光刻投影装置,其中投影系统和传感器之间的空间填充有液体。
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