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1.Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle 失效
标题翻译: 光刻设备,器件制造方法,掩模和表征掩模和/或防护薄膜的方法公开(公告)号:US20050140949A1
公开(公告)日:2005-06-30
申请号:US10835287
申请日:2004-04-30
申请人: Johannes Jasper , Marcel Baggen , Richard Bruls , Orlando Cicilia , Hendrikus Alphonsus Van Dijck , Gerardus Carolus Hofmans , Albert Johannes Jansen , Carlo Cornelis Luijten , Willem Pongers , Martijn Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Demarteau
发明人: Johannes Jasper , Marcel Baggen , Richard Bruls , Orlando Cicilia , Hendrikus Alphonsus Van Dijck , Gerardus Carolus Hofmans , Albert Johannes Jansen , Carlo Cornelis Luijten , Willem Pongers , Martijn Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Demarteau
CPC分类号: G03F7/70258 , G03F1/62 , G03F1/64 , G03F1/82 , G03F7/70308 , G03F7/70983
摘要: A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
摘要翻译: 允许厚的防护薄膜具有非平坦形状,并且其形状的特征在于计算在曝光中应用的校正以补偿防护薄膜的光学效果。 防护薄膜组件可以在重力的影响下被安装成采用一维形状以使补偿更容易。