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    Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element
    1.
    发明授权
    Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element 有权
    透明弹性体，接触模式光刻掩模，传感器和波前工程元件

    公开(公告)号：US06753131B1

    公开(公告)日：2004-06-22

    申请号：US09422611

    申请日：1999-10-21

    申请人： John A. Rogers ,  Rebecca J. Jackman ,  Kateri E. Paul ,  Olivier J. A. Schueller ,  Tricia Lynn Breen ,  George M. Whitesides

    发明人： John A. Rogers ,  Rebecca J. Jackman ,  Kateri E. Paul ,  Olivier J. A. Schueller ,  Tricia Lynn Breen ,  George M. Whitesides

    IPC分类号： G03C500

    CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/34 ,  G03F1/50 ,  G03F1/60 ,  G03F7/0002

    摘要： A contact-mode photolithography phase mask includes a diffracting surface having a plurality of indentations and protrusions. The protrusions are brought into contact with a surface of positive photoresist, and the surface exposed to electromagnetic radiation through the phase mask. The phase shift due to radiation passing through the indentations as opposed to the protrusions is essentially complete. Minima in intensity of electromagnetic radiation are thereby produced at boundaries between the indentations and protrusions. The elastomeric mask conforms well to the surface of photoresist and, following development, features smaller than 100 nm can be obtained. Patterns including curved portions are obtained, as well as curved and/or linear patterns on non-planar surfaces. An elastomeric transparent diffraction grating serves also as a spatial light modulator photothermal detector, strain gauge, and display device. A technique for simplified photolithography is also described. A photoreactive, contoured surface is exposed to electricmagnetic radiation and contours in the surface alters the electromagnetic radiation to promote selective surface photoreaction. The contours can act as lenses, gratings, or the like, such that the photoreactive surface itself can selectively direct uniform radiation to promote selective photoreaction within itself. A photoresist layer having a contoured surface thus can be exposed to uniform radiation, without a mask, followed by development and lift-off to create a photoresist pattern that can be used in any of a variety of ways. The invention provides methods of making contoured, photoreactive surfaces, and contoured photoreactive surfaces themselves.

    摘要翻译： 接触模式光刻相位掩模包括具有多个凹陷和突起的衍射表面。 突起与正性光致抗蚀剂的表面接触，并且表面暴露于通过相位掩模的电磁辐射。 与突起相反的通过压痕的辐射的相移基本上完成。 因此，在凹陷和突起之间的边界处产生电磁辐射强度的微小。 弹性体掩模与光致抗蚀剂的表面相适应，并且在显影之后，可以获得小于100nm的特征。 获得包括弯曲部分的图案，以及在非平面表面上的曲线和/或线性图案。 弹性透明衍射光栅还用作空间光调制器光热检测器，应变计和显示装置。 还描述了用于简化光刻的技术。 光反应的轮廓表面暴露于电磁辐射，并且表面中的轮廓改变电磁辐射以促进选择性表面光反应。 轮廓可以用作透镜，光栅等，使得光反应表面本身可以选择性地引导均匀的辐射以促进其本身内的选择性光反应。 因此，具有轮廓表面的光致抗蚀剂层可以暴露于均匀的辐射，而不需要掩模，然后显影和剥离以产生可以以各种方式中的任何一种使用的光致抗蚀剂图案。 本发明提供了制造轮廓，光反应表面和轮廓光反应表面本身的方法。

    System and process for automated microcontact printing
    6.
    发明授权
    System and process for automated microcontact printing 失效
    自动微接触印刷的系统和工艺

    公开(公告)号：US07338613B2

    公开(公告)日：2008-03-04

    申请号：US09950383

    申请日：2001-09-10

    申请人： Olivier J. A. Schueller ,  Amar Kendale

    发明人： Olivier J. A. Schueller ,  Amar Kendale

    IPC分类号： B44C1/22 ,  B41K1/38

    CPC分类号： G03F7/0002 ,  B05D1/283 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C23C30/00 ,  H05K3/0079 ,  H05K3/12

    摘要： An automated process for microcontact printing is provided, comprising the steps of providing a substrate and a stamp; automatically aligning the substrate and stamp so that the stamp is aligned relative to the substrate to impart a pattern to the substrate at a desired location and with a desired orientation on the substrate; applying an ink to the stamp, the ink including a molecular species adapted to form a self-assembling monolayer (SAM) on the substrate; contacting the stamp and the substrate; and separating the stamp from the substrate.

    摘要翻译： 提供了一种用于微接触印刷的自动化方法，包括提供基板和印模的步骤; 自动对准衬底和印模，使得印模相对于基底对准，以在期望的位置和基板上具有期望取向的基底赋予图案; 将油墨施加到印模上，所述油墨包括适于在所述基材上形成自组装单层（SAM）的分子种类; 使印模和基板接触; 并将印模与基板分开。