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    Multi-menisci processing apparatus
    2.
    发明授权
    Multi-menisci processing apparatus 失效
    多功能加工设备

    公开(公告)号：US07464719B2

    公开(公告)日：2008-12-16

    申请号：US11437891

    申请日：2006-05-18

    申请人： James P. Garcia ,  Mike Ravkin ,  Carl Woods ,  Fred C. Redeker ,  John de Larios

    发明人： James P. Garcia ,  Mike Ravkin ,  Carl Woods ,  Fred C. Redeker ,  John de Larios

    IPC分类号： B08B3/00 ,  B08B7/04

    CPC分类号： C25D5/22 ,  B08B3/04 ,  C25D17/001 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/68707 ,  Y10S134/902

    摘要： A substrate preparation apparatus is provided. The apparatus includes a housing configured to be installed in a substrate fabrication facility. The housing includes a manifold for use in preparing a wafer surface. The manifold is configured to include a first process window in a first portion of the manifold. A first fluid meniscus is capable of being defined within the first process windowl. Further included is a second process window in a second portion of the manifold. A second fluid meniscus is capable of being defined within the second process window. An arm is integrated with the housing, and the arm is coupled to the manifold, such that the arm is capable of positioning the manifold in proximity with the substrate during operation. The apparatus therefore provides for the formation of multi-menisci over the surface of a substrate using a single manifold.

    摘要翻译： 提供了基板制备装置。 该装置包括构造成安装在基板制造设备中的壳体。 壳体包括用于制备晶片表面的歧管。 歧管被配置为在歧管的第一部分中包括第一过程窗口。 第一流体弯液面能够在第一过程窗口内被定义。 还包括在歧管的第二部分中的第二处理窗口。 能够在第二过程窗口内限定第二流体弯月面。 臂与壳体一体化，并且臂联接到歧管，使得臂在操作期间能够将歧管定位在基板附近。 因此，该装置提供了使用单个歧管在基板的表面上形成多重半月板。

    System and method for modulating flow through multiple ports in a proximity head
    4.
    发明授权
    System and method for modulating flow through multiple ports in a proximity head 有权
    用于调节流过邻近头部的多个端口的系统和方法

    公开(公告)号：US07143527B2

    公开(公告)日：2006-12-05

    申请号：US11273853

    申请日：2005-11-14

    申请人： James P. Garcia ,  Fred C. Redeker ,  John de Larios

    发明人： James P. Garcia ,  Fred C. Redeker ,  John de Larios

    IPC分类号： F26B21/10

    CPC分类号： H01L21/67051 ,  H01L21/67034 ,  Y10S134/902

    摘要： A method of forming a dynamic liquid meniscus includes forming a meniscus at a first size, the meniscus being formed between a proximity head and a first surface and changing the meniscus to a second size by modulating a flow through at least one of a set of ports on the proximity head. A system for modulating flow through the ports in a proximity head is also described.

    摘要翻译： 形成动态液体弯液面的方法包括：以第一尺寸形成弯液面，所述弯液面形成在邻近头部和第一表面之间，并且通过调制通过一组端口中的至少一个的流动将所述弯月面改变为第二尺寸 在接近头上。 还描述了用于调制在邻近头部中的端口的流动的系统。

    METHOD AND APPARATUS FOR TRANSPORTING A SUBSTRATE USING NON-NEWTONIAN FLUID
    7.
    发明申请
    METHOD AND APPARATUS FOR TRANSPORTING A SUBSTRATE USING NON-NEWTONIAN FLUID 失效
    使用非牛顿流体运输基质的方法和装置

    公开(公告)号：US20080267721A1

    公开(公告)日：2008-10-30

    申请号：US12173661

    申请日：2008-07-15

    申请人： John M. de Larios ,  Mike Ravkin ,  John Parks ,  Mikhail Korolik ,  Fred C. Redeker

    发明人： John M. de Larios ,  Mike Ravkin ,  John Parks ,  Mikhail Korolik ,  Fred C. Redeker

    IPC分类号： B65G51/01

    CPC分类号： H01L21/67784 ,  H01L21/67057

    摘要： A method for transporting a substrate is provided. In this method, a non-Newtonian fluid is provided and the substrate is suspended in the non-Newtonian fluid. The non-Newtonian fluid is capable of supporting the substrate. Thereafter, a supply force is applied on the non-Newtonian fluid to cause the non-Newtonian fluid to flow, whereby the flow is capable of moving the substrate along a direction of the flow. Apparatuses and systems for transporting the substrate using the non-Newtonian fluid also are described.

    摘要翻译： 提供了一种输送基板的方法。 在该方法中，提供了非牛顿流体，并将基底悬挂在非牛顿流体中。 非牛顿流体能够支撑基底。 此后，向非牛顿流体施加供应力以使非牛顿流体流动，由此流动能够沿着流动方向移动基底。 还描述了使用非牛顿流体输送基底的装置和系统。

    Method and apparatus for cleaning a substrate using non-newtonian fluids
    8.
    发明授权
    Method and apparatus for cleaning a substrate using non-newtonian fluids 有权
    使用非牛顿流体清洗基材的方法和设备

    公开(公告)号：US08671959B2

    公开(公告)日：2014-03-18

    申请号：US13252859

    申请日：2011-10-04

    申请人： John M. de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred C. Redeker

    发明人： John M. de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred C. Redeker

    IPC分类号： B08B3/00

    CPC分类号： H01L21/67057 ,  B08B3/003 ,  B08B7/0014 ,  C11D7/5004 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/67051 ,  Y10S134/902

    摘要： An apparatus for cleaning a substrate includes an application unit having a top inlet conduit and a bottom plate section. The top inlet conduit has an opening for receiving a non-Newtonian fluid and the bottom plate section has an opening through which the non-Newtonian fluid can flow. The bottom plate section is perpendicular to the top inlet conduit, and a surface of the bottom plate section is disposed above and parallel to a surface of a substrate so as to define a gap between the surface of the bottom plate section and the surface of the substrate. The defined gap has a height configured to create a flow of the non-Newtonian fluid in which a portion of the flow exhibits plug flow, and the plug flow moves over the surface of the substrate to remove particles from the surface of the substrate.

    摘要翻译： 用于清洁基板的装置包括具有顶部入口导管和底板部分的施加单元。 顶部入口导管具有用于接收非牛顿流体的开口，底板部分具有非牛顿流体可以流过的开口。 底板部分垂直于顶部入口导管，并且底板部分的表面设置在基板的表面上方并平行于基板的表面，以便限定底板部分的表面与底板部分的表面之间的间隙 基质。 限定的间隙具有构造成产生非牛顿流体的流动的高度，其中流体的一部分显示出塞子流动，并且塞子流动在衬底的表面上移动以从衬底的表面移除颗粒。