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公开(公告)号:US20090084413A1
公开(公告)日:2009-04-02
申请号:US12255247
申请日:2008-10-21
申请人: JOHN S. LEWIS , Michael Biese , Garrett H. Sin , Chidambara A. Ramalingam , Balaji Chandrasekaran , Tak Fan (Kerry) Ling
发明人: JOHN S. LEWIS , Michael Biese , Garrett H. Sin , Chidambara A. Ramalingam , Balaji Chandrasekaran , Tak Fan (Kerry) Ling
CPC分类号: H01L21/67034 , H01L21/67028 , H01L21/67057 , H01L21/67316 , H01L21/68707 , Y10S414/139
摘要: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
摘要翻译: 本发明的实施例一般涉及用于漂洗和干燥基底的装置和方法。 一个实施例提供了一种末端执行器,其包括具有用于接触基板的边缘区域的接触末端的主体,其中末端执行器构造成在基板处于漂洗槽中并且当基板从冲洗干燥时支撑基板 浴,并且接触尖端包括亲水材料。
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公开(公告)号:US20110266736A1
公开(公告)日:2011-11-03
申请号:US13182301
申请日:2011-07-13
申请人: JOHN S. LEWIS , Michael Biese , Garrett H. Sin , Chidambara A. Ramalingam , Balaji Chandrasekaran , Tak Fan (Kerry) Ling
发明人: JOHN S. LEWIS , Michael Biese , Garrett H. Sin , Chidambara A. Ramalingam , Balaji Chandrasekaran , Tak Fan (Kerry) Ling
CPC分类号: H01L21/67034 , H01L21/67028 , H01L21/67057 , H01L21/67316 , H01L21/68707 , Y10S414/139
摘要: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
摘要翻译: 本发明的实施例一般涉及用于漂洗和干燥基底的装置和方法。 一个实施例提供了一种末端执行器,其包括具有用于接触基板的边缘区域的接触末端的主体,其中末端执行器构造成在基板处于漂洗槽中并且当基板从冲洗干燥时支撑基板 浴,并且接触尖端包括亲水材料。
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公开(公告)号:US07980000B2
公开(公告)日:2011-07-19
申请号:US12255247
申请日:2008-10-21
申请人: John S. Lewis , Michael Biese , Garrett H. Sin , Chidambara A. Ramalingam , Balaji Chandrasekaran , Tak Fan (Kerry) Ling
发明人: John S. Lewis , Michael Biese , Garrett H. Sin , Chidambara A. Ramalingam , Balaji Chandrasekaran , Tak Fan (Kerry) Ling
IPC分类号: F26B21/06
CPC分类号: H01L21/67034 , H01L21/67028 , H01L21/67057 , H01L21/67316 , H01L21/68707 , Y10S414/139
摘要: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
摘要翻译: 本发明的实施例一般涉及用于漂洗和干燥基底的装置和方法。 一个实施例提供了一种末端执行器,其包括具有用于接触基板的边缘区域的接触末端的主体,其中末端执行器构造成在基板处于漂洗槽中并且当基板从冲洗干燥时支撑基板 浴,并且接触尖端包括亲水材料。
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公开(公告)号:US08205352B2
公开(公告)日:2012-06-26
申请号:US13182301
申请日:2011-07-13
申请人: John S. Lewis , Michael Biese , Garrett H. Sin , Chidambara A. Ramalingam , Balaji Chandrasekaran , Tak Fan (Kerry) Ling
发明人: John S. Lewis , Michael Biese , Garrett H. Sin , Chidambara A. Ramalingam , Balaji Chandrasekaran , Tak Fan (Kerry) Ling
IPC分类号: F26B21/06
CPC分类号: H01L21/67034 , H01L21/67028 , H01L21/67057 , H01L21/67316 , H01L21/68707 , Y10S414/139
摘要: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
摘要翻译: 本发明的实施例一般涉及用于漂洗和干燥基底的装置和方法。 一个实施例提供了一种末端执行器,其包括具有用于接触基板的边缘区域的接触末端的主体,其中末端执行器构造成在基板处于漂洗槽中并且当基板从冲洗干燥时支撑基板 浴,并且接触尖端包括亲水材料。
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