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公开(公告)号：US5537507A
公开(公告)日：1996-07-16
申请号：US314411
申请日：1994-09-28
CPC分类号： B01D1/0011 , C23C14/243
摘要： A flash evaporator heater including a substrate formed of an intermetallic compound or of graphite and having an outer coating composed of pyrolytic boron nitride or pyrolytic graphite. The substrate has a substantially rectangular configuration with a substantially flat upper surface and a recessed cavity. The cavity has a longitudinal cross sectional geometry which forms a slope intersecting the substantially flat upper surface of the substrate at an angle .alpha. of less than 60 degrees.
摘要翻译： 一种闪蒸器加热器，包括由金属间化合物或石墨形成的基底，并具有由热解氮化硼或热解石墨组成的外涂层。 衬底具有基本上矩形的构造，具有基本平坦的上表面和凹腔。 空腔具有纵向截面几何形状，其形成与基板的基本上平坦的上表面相交的倾斜角度小于60度的角度。
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公开(公告)号：US08512806B2
公开(公告)日：2013-08-20
申请号：US12228392
申请日：2008-08-12
申请人： John Mariner , Douglas A. Longworth , Donald William Pultz, Jr. , Feng Liao , David M. Rusinko , Zhong-Hao Lu , Timothy J. Hejl
发明人： John Mariner , Douglas A. Longworth , Donald William Pultz, Jr. , Feng Liao , David M. Rusinko , Zhong-Hao Lu , Timothy J. Hejl
IPC分类号： C23C16/00
CPC分类号： C23C14/243
摘要： A containment vessel for evaporating materials for use in applying film coatings to a substrate includes a body fabricated from a refractory material. In one embodiment the body includes end portions capable of being connected to other bodies in an end to end fashion. In another embodiment, the body includes an integral patterned conductor incorporated into the outer surface portion of the body to facilitate association with an electrical power source for heating.
摘要翻译： 用于将薄膜涂料用于蒸镀材料的容纳容器包括由耐火材料制成的主体。 在一个实施例中，主体包括能够以端对端方式连接到其他主体的端部。 在另一个实施例中，主体包括结合到主体的外表面部分中的整体图案化导体，以便于与用于加热的电源相关联。
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公开(公告)号：US20100040780A1
公开(公告)日：2010-02-18
申请号：US12228392
申请日：2008-08-12
申请人： John Mariner , Douglas A. Longworth , Donald William Pultz, JR. , Feng Liao , David M. Rusinko , Zhong-Hao Lu , Timothy J. Hejl
发明人： John Mariner , Douglas A. Longworth , Donald William Pultz, JR. , Feng Liao , David M. Rusinko , Zhong-Hao Lu , Timothy J. Hejl
IPC分类号： C23C16/448
CPC分类号： C23C14/243
摘要： A containment vessel for evaporating materials for use in applying film coatings to a substrate includes a body fabricated from a refractory material. In one embodiment the body includes end portions capable of being connected to other bodies in an end to end fashion. In another embodiment, the body includes an integral patterned conductor incorporated into the outer surface portion of the body to facilitate association with an electrical power source for heating.
摘要翻译： 用于将薄膜涂料用于蒸镀材料的容纳容器包括由耐火材料制成的主体。 在一个实施例中，主体包括能够以端对端方式连接到其他主体的端部。 在另一个实施例中，主体包括结合到主体的外表面部分中的整体图案化导体，以便于与用于加热的电源相关联。
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4.发明授权Graphite flash evaporator having at least one intermediate layer and a pyrolytic boron nitride coating 失效具有至少一个中间层和热解氮化硼涂层的石墨闪蒸器
公开(公告)号：US5495550A
公开(公告)日：1996-02-27
申请号：US314314
申请日：1994-09-28
CPC分类号： C23C14/243 , C23C14/26
摘要： A flash evaporator vaporization vessel for flash evaporating metal under conditions of repeated thermal cycling having a graphite body, an outer layer of pyrolytic boron nitride and an intermediate layer of a material selected from the group consisting of pyrolytic graphite, boron carbide (B.sub.4 C), tantalum carbide, and silicon carbide and having a thickness of no greater than about 0,002 inches.
摘要翻译： 一种闪蒸蒸发器蒸发容器，用于在具有石墨体，热解氮化硼外层和选自热解石墨，碳化硼（B4C），钽 碳化物和碳化硅，并且具有不大于约0.002英寸的厚度。
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5.发明申请公开(公告)号：US20080016684A1
公开(公告)日：2008-01-24
申请号：US11557905
申请日：2006-11-08
申请人： Benjamin J. Olechnowicz , David M. Rusinko , Wei Fan , Demetrius Sarigiannis , Marc Schaepkens , Douglas A. Longworth
发明人： Benjamin J. Olechnowicz , David M. Rusinko , Wei Fan , Demetrius Sarigiannis , Marc Schaepkens , Douglas A. Longworth
IPC分类号： H01R43/00
CPC分类号： H01L21/67103 , C03C3/062 , C03C4/20 , H01L21/6875 , H01L21/68757 , H01L21/68785 , Y10T29/53213
摘要： A wafer processing apparatus characterized by having corrosion resistant connections for its electrical connections, gas feed-through channels, recessed areas, raised areas, MESA, through-holes such as lift-pin holes, threaded bolt holes, blind holes, and the like, with the special configurations employing connectors and fillers having excellent chemical resistant properties and optimized CTEs, i.e., having a coefficient of thermal expansion (CTE) that closely matches the CTE of the base substrate layer, the electrode(s), as well as the CTE of coating layer. In one embodiment, a nickel plated molybdenum insert is employed.
摘要翻译： 一种晶片处理装置，其特征在于具有用于其电连接，气体馈通通道，凹陷区域，凸起区域，MESA，诸如提升针孔，螺纹孔，盲孔等通孔的耐腐蚀连接， 具有采用具有优异的耐化学性能和优化的CTE的连接器和填料的特殊构造，即具有与基底衬底层，电极以及CTE的CTE密切匹配的热膨胀系数（CTE） 的涂层。 在一个实施例中，使用镀镍的钼插入件。
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公开(公告)号：US20070181065A1
公开(公告)日：2007-08-09
申请号：US11550785
申请日：2006-10-18
申请人： Akinobu Otaka , Takeshi Higuchi , Sridhar Ramaprasad Prasad , Wei Fan , Marc Schaepkens , Douglas A. Longworth
发明人： Akinobu Otaka , Takeshi Higuchi , Sridhar Ramaprasad Prasad , Wei Fan , Marc Schaepkens , Douglas A. Longworth
IPC分类号： C23C16/00
CPC分类号： C23C16/4581 , C23C16/46 , H01L21/67103
摘要： An etch resistant heater for use in a wafer processing assembly with an excellent ramp rate of at least 20° C. per minute. The heater is coated with a protective overcoating layer allowing the heater to have a radiation efficiency above 70% at elevated heater temperatures of >1500° C., and an etch rate in NF3 at 600° C. of less than 100 A/min.
摘要翻译： 用于晶片加工组件的耐蚀刻加热器，具有至少20℃/分钟的优异的斜坡速率。 加热器涂覆有保护性外涂层，允许加热器在升高的加热器温度> 1500℃时具有高于70％的辐射效率，并且在600℃下具有NF 3 N的蚀刻速率。 小于100A / min。
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