公开(公告)号：US20120322187A1

公开(公告)日：2012-12-20

申请号：US13366696

申请日：2012-02-06

申请人： Jong-Hyun CHOUNG ,  Seon-il KIM ,  Ji-Young PARK ,  Jeanho SONG ,  Sanggab KIM ,  Shin Il CHOI ,  Youngchul PARK ,  Youngjun JIN ,  Suckjun LEE ,  O byoung KWON ,  Inho YU ,  Sanghoon JANG ,  Minki LIM

发明人： Jong-Hyun CHOUNG ,  Seon-il KIM ,  Ji-Young PARK ,  Jeanho SONG ,  Sanggab KIM ,  Shin Il CHOI ,  Youngchul PARK ,  Youngjun JIN ,  Suckjun LEE ,  O byoung KWON ,  Inho YU ,  Sanghoon JANG ,  Minki LIM

IPC分类号： H01L33/08 ,  H05K13/00 ,  C09K13/08

CPC分类号： H01L21/32134 ,  C09K13/08 ,  C23F1/18 ,  C23F1/26 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/4908

摘要： An etchant includes: a persulfate; a fluoride; an inorganic acid; a cyclic amine; a sulfonic acid; and one of an organic acid and a salt thereof.

摘要翻译： 蚀刻剂包括：过硫酸盐; 氟化物 无机酸; 环胺; 磺酸; 和有机酸及其盐之一。

公开(公告)号：US20120252148A1

公开(公告)日：2012-10-04

申请号：US13223958

申请日：2011-09-01

申请人： Ji-Young PARK ,  Shin-Il CHOI ,  Jong-Hyun CHOUNG ,  Sang Gab KIM ,  Seon-Il KIM ,  Sang-Tae KIM ,  Joon-Woo LEE ,  Young-Chul PARK ,  Young-Jun JIN ,  Kyong-Min KANG ,  Suck-Jun LEE ,  O-Byoung KWON ,  In-Ho YU ,  Sang-Hoon JANG ,  Min-Ki LIM ,  Yu-Jin LEE

发明人： Ji-Young PARK ,  Shin-Il CHOI ,  Jong-Hyun CHOUNG ,  Sang Gab KIM ,  Seon-Il KIM ,  Sang-Tae KIM ,  Joon-Woo LEE ,  Young-Chul PARK ,  Young-Jun JIN ,  Kyong-Min KANG ,  Suck-Jun LEE ,  O-Byoung KWON ,  In-Ho YU ,  Sang-Hoon JANG ,  Min-Ki LIM ,  Yu-Jin LEE

IPC分类号： H01L33/36 ,  C09K13/08

CPC分类号： C09K13/08 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  H01L21/32134 ,  H01L27/1259 ,  H01L29/41733

摘要： An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.

摘要翻译： 根据本发明的示例性实施方案的蚀刻剂包括约0.5重量％至约20重量％的过硫酸盐，约0.01重量％至约2重量％的氟化合物，约1重量％至约10重量％的无机酸， 约0.5重量％至约5重量％的环胺化合物，约0.1重量％至约5重量％的氯化合物，约0.05重量％至约3重量％的铜盐，约0.1重量％至约10重量％ ％的有机酸或有机酸盐，和水。

公开(公告)号：US20130180947A1

公开(公告)日：2013-07-18

申请号：US13588825

申请日：2012-08-17

申请人： In-Bae KIM ,  Jae-Woo JEONG ,  Sang-Gab KIM ,  Ji-Young PARK ,  Jong-Hyun CHOUNG ,  Seon-il KIM ,  Yong-Sung SONG ,  Jong-Hyun OH

发明人： In-Bae KIM ,  Jae-Woo JEONG ,  Sang-Gab KIM ,  Ji-Young PARK ,  Jong-Hyun CHOUNG ,  Seon-il KIM ,  Yong-Sung SONG ,  Jong-Hyun OH

IPC分类号： C09K13/06 ,  H01B13/00 ,  C09K13/00

CPC分类号： C09K13/06 ,  H01L27/124 ,  H01L27/1259

摘要： An etching composition that includes, based on the total weight of the etching composition, from about 0.05% to about 15% by weight of a halogen-containing compound, from about 0.1% to about 20% by weight of a nitrate compound, from about 0.1% to about 10% by weight of an acetate compound, from about 0.1% to about 10% by weight of a cyclic amine compound, from about 0% to about 50% by weight of a polyhydric alcohol, and a remainder of water.

摘要翻译： 一种蚀刻组合物，其基于蚀刻组合物的总重量计包含约0.05重量％至约15重量％的含卤素化合物，约0.1重量％至约20重量％的硝酸盐化合物，约为 0.1重量％至约10重量％的乙酸酯化合物，约0.1重量％至约10重量％的环胺化合物，约0重量％至约50重量％的多元醇，剩余的水。

公开(公告)号：US20130034923A1

公开(公告)日：2013-02-07

申请号：US13433013

申请日：2012-03-28

申请人： In-Bae KIM ,  Jong-Hyun CHOUNG ,  Ji-Young PARK ,  Seon-Il KIM ,  Jae-Woo JEONG ,  Sang Gab KIM ,  Sang-Woo KIM ,  Ki-Beom LEE ,  Dae-Woo LEE ,  Sam-Young CHO

发明人： In-Bae KIM ,  Jong-Hyun CHOUNG ,  Ji-Young PARK ,  Seon-Il KIM ,  Jae-Woo JEONG ,  Sang Gab KIM ,  Sang-Woo KIM ,  Ki-Beom LEE ,  Dae-Woo LEE ,  Sam-Young CHO

IPC分类号： H01L33/08 ,  C09K13/08 ,  C23F1/02 ,  C09K13/00

CPC分类号： C23F1/18 ,  C09K13/08 ,  C23F1/26 ,  H01L21/32134 ,  H01L27/124

摘要： An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.

摘要翻译： 公开了一种蚀刻组合物，使用该蚀刻组合物形成金属图案的方法以及一种制造显示衬底的方法。 蚀刻组合物包含约0.1重量％至约25重量％的过硫酸铵，约0.1重量％至约25重量％的有机酸，约0.01重量％至约5重量％的螯合剂 ，约0.01重量％至约5重量％的氟化物，约0.01重量％至约5重量％的氯化物化合物，约0.01重量％至约2重量％的唑类化合物 和余下的水。 因此，可以稳定地蚀刻铜层以提高制造金属图案和显示基板的可靠性。

公开(公告)号：US20100044717A1

公开(公告)日：2010-02-25

申请号：US12434942

申请日：2009-05-04

申请人： Seung-Ha CHOI ,  Ki-Yeup LEE ,  Sang-Gab KIM ,  Shin-Il CHOI ,  Dong-Ju YANG ,  Hong-Kee CHIN ,  Yu-Gwang JEONG ,  Ji-Young PARK ,  Dong-Hoon LEE ,  Byeong-Beom KIM

发明人： Seung-Ha CHOI ,  Ki-Yeup LEE ,  Sang-Gab KIM ,  Shin-Il CHOI ,  Dong-Ju YANG ,  Hong-Kee CHIN ,  Yu-Gwang JEONG ,  Ji-Young PARK ,  Dong-Hoon LEE ,  Byeong-Beom KIM

IPC分类号： H01L29/786 ,  H01L21/336

CPC分类号： H01L29/458 ,  H01L27/124 ,  H01L29/4908

摘要： After forming a signal line including aluminum, an upper layer of an oxide layer including aluminum that covers the signal line is formed in the same chamber and by using the same sputtering target as the signal line, or a buffer layer of an oxide layer including aluminum is formed in a contact hole exposing the signal line during the formation of the contact hole. Accordingly, the contact characteristic between an upper layer including indium tin oxide (“ITO”) or indium zinc oxide (“IZO”) and the signal line may be improved to enhance the adhesion therebetween while not increasing the production cost of the thin film transistor (“TFT”) array panel.

摘要翻译： 在形成包括铝的信号线之后，在相同的室中形成包含覆盖信号线的铝的氧化物层的上层，并且通过使用与信号线相同的溅射靶，或者包括铝的氧化物层的缓冲层 形成在接触孔形成期间暴露信号线的接触孔中。 因此，可以改善包括氧化铟锡（“ITO”）或氧化铟锌（“IZO”）的上层与信号线之间的接触特性，以增强其之间的粘附，同时不增加薄膜晶体管的生产成本 （“TFT”）阵列面板。

公开(公告)号：US20110243795A1

公开(公告)日：2011-10-06

申请号：US13079299

申请日：2011-04-04

申请人： Ji-Young PARK

发明人： Ji-Young PARK

IPC分类号： G01N33/48

CPC分类号： B01L3/502746 ,  B01L2200/0636 ,  B01L2200/0684 ,  B01L2300/0809 ,  B01L2300/089 ,  B01L2400/0406 ,  B01L2400/086

摘要： A chip for analyzing fluid being moved without an outside power source is disclosed. A chip for analyzing fluid being moved without an outside power source according to the present invention comprises: a pre-treatment portion into which a target-being analyzed substance is injected and received; a channel portion through which the fluid received in the pre-treatment portion is moved and in which specific reaction of the fluid such as an antigen-antibody reaction is conducted; and a washing portion into which the fluid passing through the channel portion is received wherein the pre-treatment portion includes: a specimen injection portion into which the fluid is injected; a first buffer portion having a step difference with respect to the specimen injection portion for the fluid to be firstly received; and at least one specimen leading guide which is provided between the specimen injection portion and the first buffer portion and destroys surface tension of the fluid flow moving from the specimen injection portion to the first buffer portion side and thus stabilizes flow surface of the fluid. According to the present invention, a moving pattern of the fluid passing through a channel portion is formed evenly and thus bubble creation is decreased and reproducibility thereof is ensured and further a signal detection from a target-being analyzed substance is performed easily.

摘要翻译： 公开了一种用于分析未经外部电源移动的流体的芯片。 根据本发明的用于分析未被外部动力源移动的流体的芯片包括：预处理部分，其中注入和接收目标分析物质; 在预处理部分中接收的流体被移动的通道部分，并且进行诸如抗原 - 抗体反应之类的流体的特异性反应; 以及洗涤部，所述流体通过所述流路部的流体被容纳在所述洗涤部中，所述预处理部包括：注入所述流体的试样注入部; 第一缓冲部，其相对于要首先接收的流体的样本注入部分具有阶差; 以及至少一个样本引导引导件，其设置在检体注入部和第一缓冲部之间，破坏从检体注入部向第一缓冲部侧移动的流体流的表面张力，由此稳定流体的流动面。 根据本发明，通过通道部分的流体的移动图形被均匀地形成，从而降低了气泡产生并且确保了其再现性，并且进一步容易地执行来自目标分析物质的信号检测。

公开(公告)号：US20130146900A1

公开(公告)日：2013-06-13

申请号：US13488733

申请日：2012-06-05

申请人： Yun-Jong YEO ,  Yu-Gwang JEONG ,  Hong-Kee CHIN ,  Sang-Gab KIM ,  Jeong-Min PARK ,  Ji-Young PARK

发明人： Yun-Jong YEO ,  Yu-Gwang JEONG ,  Hong-Kee CHIN ,  Sang-Gab KIM ,  Jeong-Min PARK ,  Ji-Young PARK

IPC分类号： H01L33/62

CPC分类号： G02F1/134363 ,  H01L27/124 ,  H01L27/1244 ,  H01L27/1248 ,  H01L27/1288

摘要： A display substrate includes a base substrate, a switching element, a protecting layer, an organic layer, a first pixel electrode and a second pixel electrode. The switching element is on the base substrate, and includes a gate electrode, a source electrode and a drain electrode. The protecting layer is on the switching element, and includes a first hole exposing the drain electrode. The organic layer is on the protecting layer, and includes a second hole which exposes a side surface of the protecting layer which defines the first hole and exposes a top surface of the protecting layer which is adjacent to the side surface of the protecting layer. The first pixel electrode is on the organic layer. The second pixel electrode overlaps the first pixel electrode, and is electrically connected to the drain electrode via the first and second holes.

摘要翻译： 显示基板包括基底基板，开关元件，保护层，有机层，第一像素电极和第二像素电极。 开关元件在基底基板上，并且包括栅电极，源电极和漏电极。 保护层位于开关元件上，并且包括暴露漏电极的第一孔。 有机层位于保护层上，并且包括第二孔，其露出限定第一孔的保护层的侧表面，并露出与保护层的侧表面相邻的保护层的顶表面。 第一像素电极在有机层上。 第二像素电极与第一像素电极重叠，并且经由第一和第二孔电连接到漏电极。

公开(公告)号：US20120133873A1

公开(公告)日：2012-05-31

申请号：US13193488

申请日：2011-07-28

申请人： Ji-Young PARK ,  Sang Gab Kim ,  Yong-Mo Choi ,  Hyung Jun Kim ,  Sung-Haeng Cho ,  Hong-Sick Park ,  Byeong-Jin Lee ,  Soo-Wan Yoon

发明人： Ji-Young PARK ,  Sang Gab Kim ,  Yong-Mo Choi ,  Hyung Jun Kim ,  Sung-Haeng Cho ,  Hong-Sick Park ,  Byeong-Jin Lee ,  Soo-Wan Yoon

IPC分类号： G02F1/1333 ,  H01L33/16

CPC分类号： H01L27/1288 ,  G02F1/1362 ,  G02F2001/136231 ,  H01L29/41733

摘要： A method of manufacturing a liquid crystal display includes: forming a gate line including a gate electrode on a first substrate; forming a gate insulating layer on the gate line; sequentially forming a semiconductor layer, an amorphous silicon layer, and a data metal layer on the entire surface of the gate insulating layer; aligning the edges of the semiconductor layer and the data metal layer; forming a transparent conductive layer on the gate insulating layer and the data metal layer; forming a first pixel electrode and a second pixel electrode by patterning the transparent conductive layer; and forming a data line including a source electrode, a drain electrode, and an ohmic contact layer by etching the data metal layer and the amorphous silicon layer, using the first pixel electrode and the second pixel electrode as a mask, and exposing the semiconductor between the source electrode and the drain electrode.

摘要翻译： 制造液晶显示器的方法包括：在第一基板上形成包括栅电极的栅极线; 在栅极线上形成栅极绝缘层; 在栅极绝缘层的整个表面上依次形成半导体层，非晶硅层和数据金属层; 对准半导体层和数据金属层的边缘; 在栅绝缘层和数据金属层上形成透明导电层; 通过图案化透明导电层形成第一像素电极和第二像素电极; 以及使用所述第一像素电极和所述第二像素电极作为掩模，通过蚀刻所述数据金属层和所述非晶硅层来形成包括源电极，漏电极和欧姆接触层的数据线，并且使所述半导体在 源电极和漏电极。

公开(公告)号：US20120162385A1

公开(公告)日：2012-06-28

申请号：US13333968

申请日：2011-12-21

申请人： Ji-Young PARK ,  Jae-Ho Lee ,  Seung-Ki Hong ,  Hee-Kwon Kim ,  Seung-Woo Nam

发明人： Ji-Young PARK ,  Jae-Ho Lee ,  Seung-Ki Hong ,  Hee-Kwon Kim ,  Seung-Woo Nam

IPC分类号： H04N13/02

CPC分类号： H04N13/254

摘要： Disclosed herein are an apparatus and method for acquiring 3D depth information. The apparatus includes a pattern projection unit, an image acquisition unit, and an operation unit. The pattern projection unit projects light, radiated by an infrared light source, into a space in a form of a pattern. The image acquisition unit acquires an image corresponding to the pattern using at least one camera. The operation unit extracts a pattern from the image, analyzes results of the extraction, and calculates information about a 3D distance between objects existing in the space.

摘要翻译： 本文公开了一种用于获取3D深度信息的装置和方法。 该装置包括图案投影单元，图像获取单元和操作单元。 图案投影单元将由红外光源辐射的光投射到图案形式的空间中。 图像获取单元使用至少一个照相机获取与图案相对应的图像。 操作单元从图像中提取图案，分析提取结果，并计算有关存在于空间中的对象之间的3D距离的信息。