利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

409 条记录 (耗时 0.03 秒)

    Guided wave applicator with non-gaseous dielectric for plasma chamber
    1.
    发明授权
    Guided wave applicator with non-gaseous dielectric for plasma chamber 有权
    带等离子体室的非气体介质的导波器

    公开(公告)号：US09397380B2

    公开(公告)日：2016-07-19

    申请号：US13360652

    申请日：2012-01-27

    申请人： Jozef Kudela ,  Tsutomu Tanaka ,  Carl A. Sorensen ,  Suhail Anwar ,  John M. White

    发明人： Jozef Kudela ,  Tsutomu Tanaka ,  Carl A. Sorensen ,  Suhail Anwar ,  John M. White

    IPC分类号： H01P3/16 ,  H01L21/02 ,  H05H1/46 ,  H01J37/32

    CPC分类号： H01P3/16 ,  H01J37/32229 ,  H01L21/02 ,  H01L21/02104 ,  H05H1/46 ,  H05H2001/4622

    摘要： A guided wave applicator comprising two electrically conductive waveguide walls and a waveguide dielectric. The volume of the waveguide dielectric is composed of non-gaseous dielectric material and is positioned between the two waveguide walls. The waveguide dielectric includes first and second longitudinal ends and includes first, second, third and fourth sides extending longitudinally between the two longitudinal ends. The first waveguide wall is positioned so that it covers the first side of the waveguide dielectric, and the second waveguide wall is positioned so that it covers the second side of the waveguide dielectric. In operation, electrical power can be supplied to one or both longitudinal ends of the waveguide dielectric, whereby the power can be coupled to a plasma through the exposed sides of the waveguide dielectric.

    摘要翻译： 导波装置，其包括两个导电波导壁和波导电介质。 波导介质的体积由非气体电介质材料构成，并且位于两个波导壁之间。 波导电介质包括第一和第二纵向端部，并且包括在两个纵向端部之间纵向延伸的第一，第二，第三和第四侧面。 第一波导壁被定位成使得其覆盖波导电介质的第一侧，并且第二波导壁被定位成使得其覆盖波导电介质的第二侧。 在操作中，可以向波导介质的一个或两个纵向端提供电力，由此可以通过波导电介质的暴露侧将功率耦合到等离子体。

    Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber
    2.
    发明申请
    Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber 有权
    用于等离子室的非气体介质的导波涂敷器

    公开(公告)号：US20130126331A1

    公开(公告)日：2013-05-23

    申请号：US13360652

    申请日：2012-01-27

    申请人： Jozef Kudela ,  Tsutomu Tanaka ,  Carl A. Sorensen ,  Suhail Anwar ,  John M. White

    发明人： Jozef Kudela ,  Tsutomu Tanaka ,  Carl A. Sorensen ,  Suhail Anwar ,  John M. White

    IPC分类号： H01P3/16 ,  H05H1/46 ,  H01L21/02

    CPC分类号： H01P3/16 ,  H01J37/32229 ,  H01L21/02 ,  H01L21/02104 ,  H05H1/46 ,  H05H2001/4622

    摘要： A guided wave applicator comprising two electrically conductive waveguide walls and a waveguide dielectric. The volume of the waveguide dielectric is composed of non-gaseous dielectric material and is positioned between the two waveguide walls. The waveguide dielectric includes first and second longitudinal ends and includes first, second, third and fourth sides extending longitudinally between the two longitudinal ends. The first waveguide wall is positioned so that it covers the first side of the waveguide dielectric, and the second waveguide wall is positioned so that it covers the second side of the waveguide dielectric. In operation, electrical power can be supplied to one or both longitudinal ends of the waveguide dielectric, whereby the power can be coupled to a plasma through the exposed sides of the waveguide dielectric.

    摘要翻译： 导波装置，其包括两个导电波导壁和波导电介质。 波导介质的体积由非气体电介质材料构成，并且位于两个波导壁之间。 波导电介质包括第一和第二纵向端部，并且包括在两个纵向端部之间纵向延伸的第一，第二，第三和第四侧面。 第一波导壁被定位成使得其覆盖波导电介质的第一侧，并且第二波导壁被定位成使得其覆盖波导电介质的第二侧。 在操作中，可以向波导介质的一个或两个纵向端提供电力，由此可以通过波导电介质的暴露侧将功率耦合到等离子体。

    Plasma source with vertical gradient
    5.
    发明授权
    Plasma source with vertical gradient 有权
    等离子源与垂直梯度

    公开(公告)号：US08872428B2

    公开(公告)日：2014-10-28

    申请号：US13405297

    申请日：2012-02-25

    申请人： Jozef Kudela ,  Tsutomu Tanaka ,  Suhail Anwar ,  Carl A. Sorensen ,  John M. White

    发明人： Jozef Kudela ,  Tsutomu Tanaka ,  Suhail Anwar ,  Carl A. Sorensen ,  John M. White

    IPC分类号： H05H1/24 ,  H05H1/46 ,  C23C14/02 ,  C23C14/34 ,  C23C14/58

    CPC分类号： H05H1/46 ,  C23C14/028 ,  C23C14/34 ,  C23C14/58 ,  H05H2001/4682

    摘要： A plasma source includes upper and lower portions. In a first aspect, an electrical power source supplies greater power to the upper portion than to the lower portion. In a second aspect, the plasma source includes three or more power couplers that are spaced apart vertically, wherein the number of plasma power couplers in the upper portion is greater than the number of plasma power couplers in the lower portion. The upper and lower portions of the plasma source can be defined as respectively above and below a horizontal geometric plane that bisects the vertical height of the plasma source. Alternatively, the upper and lower portions can be defined as respectively above and below a horizontal geometric plane that bisects the combined area of first and second workpiece positions.

    摘要翻译： 等离子体源包括上部和下部。 在第一方面，电源向上部提供比下部更大的功率。 在第二方面，等离子体源包括三个或更多个垂直间隔开的功率耦合器，其中上部中的等离子体功率耦合器的数量大于下部中的等离子体功率耦合器的数量。 等离子体源的上部和下部可以分别在等分于等离子体源的垂直高度的水平几何平面之上和之下。 或者，上部和下部可以分别在平分第一和第二工件位置的组合区域的水平几何平面的上方和下方。

    Plasma Source with Vertical Gradient
    7.
    发明申请
    Plasma Source with Vertical Gradient 有权
    等离子源与垂直梯度

    公开(公告)号：US20120217874A1

    公开(公告)日：2012-08-30

    申请号：US13405297

    申请日：2012-02-25

    申请人： Jozef Kudela ,  Tsutomu Tanaka ,  Suhail Anwar ,  Carl A. Sorensen ,  John M. White

    发明人： Jozef Kudela ,  Tsutomu Tanaka ,  Suhail Anwar ,  Carl A. Sorensen ,  John M. White

    IPC分类号： H05H1/24 ,  H01L21/3065 ,  C23C16/50

    CPC分类号： H05H1/46 ,  C23C14/028 ,  C23C14/34 ,  C23C14/58 ,  H05H2001/4682

    摘要： A plasma source includes upper and lower portions. In a first aspect, an electrical power source supplies greater power to the upper portion than to the lower portion. In a second aspect, the plasma source includes three or more power couplers that are spaced apart vertically, wherein the number of plasma power couplers in the upper portion is greater than the number of plasma power couplers in the lower portion. The upper and lower portions of the plasma source can be defined as respectively above and below a horizontal geometric plane that bisects the vertical height of the plasma source. Alternatively, the upper and lower portions can be defined as respectively above and below a horizontal geometric plane that bisects the combined area of first and second workpiece positions.

    摘要翻译： 等离子体源包括上部和下部。 在第一方面，电源向上部提供比下部更大的功率。 在第二方面，等离子体源包括三个或更多个垂直间隔开的功率耦合器，其中上部中的等离子体功率耦合器的数量大于下部中的等离子体功率耦合器的数量。 等离子体源的上部和下部可以分别在等分于等离子体源的垂直高度的水平几何平面之上和之下。 或者，上部和下部可以分别在平分第一和第二工件位置的组合区域的水平几何平面的上方和下方。

    Phase-Modulated RF Power for Plasma Chamber Electrode
    8.
    发明申请
    Phase-Modulated RF Power for Plasma Chamber Electrode 审中-公开
    等离子室电极的相位调制RF功率

    公开(公告)号：US20110192349A1

    公开(公告)日：2011-08-11

    申请号：US13005526

    申请日：2011-01-12

    申请人： Edward P. Hammond, IV ,  Tsutomu Tanaka ,  Christopher Boitnott ,  Jozef Kudela

    发明人： Edward P. Hammond, IV ,  Tsutomu Tanaka ,  Christopher Boitnott ,  Jozef Kudela

    IPC分类号： C23C16/509

    CPC分类号： H05H1/46 ,  C23C16/509 ,  H01J37/32082 ,  H01J37/32091

    摘要： A plurality of RF power signals have the same RF frequency as a reference RF signal and are coupled to respective RF connection points on an electrode of a plasma chamber. At least three of the RF connection points are not collinear. At least two of the RF power signals have time-varying phase offsets relative to the reference RF signal that are distinct functions of time. Such time-varying phase offsets can produce a spatial distribution of plasma in the plasma chamber having better time-averaged uniformity than the uniformity of the spatial distribution at any instant in time.

    摘要翻译： 多个RF功率信号具有与参考RF信号相同的RF频率，并且耦合到等离子体室的电极上的相应RF连接点。 至少三个RF连接点不共线。 RF功率信号中的至少两个具有相对于参考RF信号的时变相位偏移，该参考RF信号是时间的不同功能。 这种时变相位偏移可以在等离子体室中产生等离子体的空间分布，其具有比在任何时刻的空间分布的均匀性更好的时间均匀度。

    Non-Transitory Computer Readable Medium Storing Instructions for Update Management, Update Management Device, and Image Processing System
    10.
    发明申请
    Non-Transitory Computer Readable Medium Storing Instructions for Update Management, Update Management Device, and Image Processing System 有权
    非瞬时计算机可读介质存储更新管理指令，更新管理设备和图像处理系统

    公开(公告)号：US20140245283A1

    公开(公告)日：2014-08-28

    申请号：US14191948

    申请日：2014-02-27

    申请人： Tsutomu Tanaka

    发明人： Tsutomu Tanaka

    IPC分类号： G06F9/445

    CPC分类号： G06F8/65

    摘要： A non-transitory computer readable medium stores an update management program for causing an update on control program, which is installed on each of image processing devices. The update management program, when executed by a processor, causes the computer to: acquire an update program and update function information regarding functions to be updated by the update program from a firmware distribution server; acquire device function information regarding functions of each image processing device from the each image processing device; transmit the update program to the each image processing device; determine an update sequence of timing for causing the each image processing device to update its control program, based on the acquired update function information and the acquired device function information; and cause the each image processing device to update its control program by executing the transmitted update program in accordance with the determined update sequence of timing.

    摘要翻译： 非暂时性计算机可读介质存储用于对安装在每个图像处理装置上的控制程序进行更新的更新管理程序。 更新管理程序在由处理器执行时使计算机从固件分发服务器获取更新程序并更新关于由更新程序更新的功能的功能信息; 从每个图像处理装置获取关于每个图像处理装置的功能的装置功能信息; 将更新程序发送到每个图像处理装置; 基于所获取的更新功能信息和所获取的设备功能信息，确定使每个图像处理设备更新其控制程序的定时更新顺序; 并且通过根据确定的定时更新顺序执行所发送的更新程序，使每个图像处理装置更新其控制程序。