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1.发明授权Lithographic apparatus, device manufacturing method and computer program product 有权平版印刷设备，设备制造方法和计算机程序产品公开(公告)号：US07903234B2
公开(公告)日：2011-03-08
申请号：US11984837
申请日：2007-11-21
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
CPC分类号： G03F7/70891 , G03F7/70108 , G03F7/70158
摘要： In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
摘要翻译： 在光刻设备中，使用照射模式来执行校正照射程序，所述照明模式被布置成在生产曝光期间将相对不加热的瞳孔平面附近的投影系统的元件的选定部分加热。 校正辐射程序旨在提高投影系统的光学元件加热的均匀性和/或降低相位梯度。
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2.发明申请Lithographic apparatus, device manufacturing method and computer program product 有权平版印刷设备，设备制造方法和计算机程序产品公开(公告)号：US20080158528A1
公开(公告)日：2008-07-03
申请号：US11984837
申请日：2007-11-21
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
CPC分类号： G03F7/70891 , G03F7/70108 , G03F7/70158
摘要： In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
摘要翻译： 在光刻设备中，使用照射模式来执行校正照射程序，所述照明模式被布置成在生产曝光期间将相对不加热的瞳孔平面附近的投影系统的元件的选定部分加热。 校正辐射程序旨在提高投影系统的光学元件加热的均匀性和/或降低相位梯度。
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3.发明授权Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels 有权具有用于两个照明通道的开关装置的舞台装置，光刻装置和装置制造方法公开(公告)号：US07924406B2
公开(公告)日：2011-04-12
申请号：US11445466
申请日：2006-06-02
申请人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/72
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： An illuminator for a lithographic apparatus includes a first illuminator channel, a second illuminator channel, a first switch device, an additional illuminator part and a second switch device. Each of the first and the second illuminator channel includes elements which are adjustable to provide a radiation beam with at least one desired property. The first switch device is configured to receive the radiation beam and arranged to direct the radiation beam between the first and second illuminator channels. The second switch device is arranged to receive the radiation beam from the first and second illuminator channels and direct the radiation beam through the additional illuminator part. The additional illuminator part includes elements which apply at least one additional desired property to the radiation beam.
摘要翻译： 用于光刻设备的照明器包括第一照明器通道，第二照明器通道，第一开关器件，附加照明器部件和第二开关器件。 第一和第二照明器通道中的每一个包括可调节的元件，以提供具有至少一个期望特性的辐射束。 第一开关装置被配置为接收辐射束并被布置成将辐射束引导在第一和第二照射器通道之间。 第二开关装置被布置成从第一和第二照明器通道接收辐射束并且引导辐射束通过附加照明器部分。 附加照明器部分包括将至少一个附加期望特性应用于辐射束的元件。
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4.发明授权公开(公告)号：US07671968B2
公开(公告)日：2010-03-02
申请号：US11486378
申请日：2006-07-14
申请人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/72
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： A lithographic apparatus includes a masking device that includes a first masking part configured to obscure a first part of a first patterning device before the pattern of the first patterning device is impinged by a radiation beam, a second masking part having an adjustable length, the second masking part configured to obscure a second part of the first patterning device after the pattern of the first patterning device is impinged by the radiation beam and to obscure a first part of a second patterning device before the pattern of the second patterning device is impinged by the radiation beam, and a third masking part configured to obscure a second part of the second patterning device after the pattern of the second patterning device is impinged by the radiation beam.
摘要翻译： 光刻设备包括掩模装置，该掩模装置包括第一掩蔽部分，其被配置为在第一图案形成装置的图案被辐射束撞击之前遮蔽第一图案形成装置的第一部分，第二掩模部分具有可调长度，第二掩模部分 掩模部件被配置为在第一图案形成装置的图案被辐射束撞击之后遮蔽第一图案形成装置的第二部分，并且在第二图案形成装置的图案被第二图案形成装置的图案撞击之前使第二图案形成装置的第一部分模糊 辐射束和第三掩模部分，其被配置为在第二图案形成装置的图案被辐射束撞击之后使第二图案形成装置的第二部分模糊。
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公开(公告)号：US08885144B2
公开(公告)日：2014-11-11
申请号：US13114652
申请日：2011-05-24
申请人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
发明人： Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
CPC分类号： G03F7/70116 , G03F7/70291 , G03F7/70508 , G03F7/70516
摘要： An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
摘要翻译： 公开了一种具有独立可控光学元件阵列的照明系统，其中每个元件可在选择多个取向之间移动，以形成所需的照明模式。 照明系统包括控制器，用于控制一个或多个元件的取向，该控制器被配置为向一个或多个元件施加力，该至少一个或多个元件至少部分地补偿通过入射的辐射突发施加到一个或多个元件上的力 一个或多个元素。
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公开(公告)号：US08089672B2
公开(公告)日：2012-01-03
申请号：US12318034
申请日：2008-12-19
申请人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
发明人： Patricius Aloysius Jacobus Tinnemans , Heine Melle Mulder , Marius Ravensbergen , Wilfred Edward Endendijk , Jozef Ferdinand Dymphna Verbeeck
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , G03F7/70508 , G09G3/006 , G09G3/346
摘要： A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
摘要翻译： 一种控制单独可控元件阵列的元件的方法。 该方法包括改变驱动元件的驱动电压的频率。
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7.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07508487B2
公开(公告)日：2009-03-24
申请号：US10719065
申请日：2003-11-24
申请人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Willem Van Schaik , Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Heine Melle Mulder
发明人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Willem Van Schaik , Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Heine Melle Mulder
CPC分类号： G03F7/70558 , G03F7/70883 , G03F7/70933 , G03F7/70941
摘要： In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.
摘要翻译： 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。
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公开(公告)号：US20080100816A1
公开(公告)日：2008-05-01
申请号：US11589990
申请日：2006-10-31
IPC分类号： G03B27/80
CPC分类号： G03B27/522 , G03F7/70116 , G03F7/702 , G03F7/70291
摘要： An illuminator for a lithographic apparatus is disclosed, the illuminator including an array of individually controllable reflective elements capable of changing the angular intensity distribution of an incident illumination beam of radiation, wherein the array of individually controllable reflective elements is provided on a curved support structure, or the array of individually controllable reflective elements is arranged to serve as a curved reflective surface.
摘要翻译： 公开了一种用于光刻设备的照明器，所述照明器包括能够改变入射照射光束的角度强度分布的独立可控反射元件的阵列，其中所述独立可控反射元件阵列设置在弯曲的支撑结构上， 或者可单独控制的反射元件的阵列被布置成用作弯曲的反射表面。
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公开(公告)号：US07224440B2
公开(公告)日：2007-05-29
申请号：US11019525
申请日：2004-12-23
申请人： Stefan Geerte Kruijswijk , Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Heine Melle Mulder
发明人： Stefan Geerte Kruijswijk , Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Heine Melle Mulder
IPC分类号： G03B27/52
CPC分类号： G03F7/70108 , G03F7/70275
摘要： A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.
摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统; 图案形成装置，其被配置成图案化所述辐射束以形成图案化的辐射束; 以及投影系统，被配置为将图案化的辐射束投影到基板上。 光学组件包括在辐射源和图案形成装置之间二维布置的多个光学元件，以产生辐射束的预定角度分布。 为了提高辐射束的均匀性，光学元件从具有不同形状和/或尺寸的预定数量的光学元件中选择。
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10.发明授权Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product 有权光刻设备，设备制造方法，由此制造的设备，控制系统，计算机程序和计算机程序产品公开(公告)号：US06737662B2
公开(公告)日：2004-05-18
申请号：US10157033
申请日：2002-05-30
申请人： Heine Melle Mulder , Jan Bernard Plechelmus Van Schoot , Markus Franciscus Antonius Eurlings , Antonius Johannes Josephus Van Dijsseldonk , Marcel Dierichs
发明人： Heine Melle Mulder , Jan Bernard Plechelmus Van Schoot , Markus Franciscus Antonius Eurlings , Antonius Johannes Josephus Van Dijsseldonk , Marcel Dierichs
IPC分类号： G01N2186
CPC分类号： G03F7/70116 , G03F7/70075 , G03F7/70141 , G03F7/702
摘要： A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.
摘要翻译： 光刻投影系统具有照明系统。 多个引导元件将入射投影光束的不同子光束反射到可调节的，可独立控制的方向。 通过使用重新引导光学元件，可以在其横截面中产生投影光束的所需空间强度分布。
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