公开(公告)号：US5972426A

公开(公告)日：1999-10-26

申请号：US005495

申请日：1998-01-12

申请人： Junji Kutsuzawa ,  Hiroyoshi Sago ,  Futoshi Shimai ,  Hidenori Miyamoto

发明人： Junji Kutsuzawa ,  Hiroyoshi Sago ,  Futoshi Shimai ,  Hidenori Miyamoto

IPC分类号： G03F7/16 ,  B05B1/14 ,  B05B13/04 ,  B05C5/02 ,  B05C11/08 ,  G02B5/20 ,  H01L21/027 ,  B05D3/12

CPC分类号： B05C5/0254 ,  B05C11/08 ,  B05C5/0208 ,  B05B13/04 ,  B05C5/027

摘要： A coating nozzle includes an elongate nozzle body having a coating solution reservoir defined longitudinally therein for being supplied with a coating solution from an external coating solution supply. The elongate nozzle body also has a coating solution holder defined therein and opening away from the coating solution reservoir, for holding a coating solution against falling off as droplets under surface tension of the coating solution. A plurality of passages are defined in the elongate nozzle body and held in communication with the coating solution reservoir and the coating solution holder, for supplying the coating solution from the coating solution reservoir to the coating solution holder.

摘要翻译： 涂布喷嘴包括细长的喷嘴体，其具有纵向地限定在其中的涂布溶液储存器，以从外部涂布溶液供应源供应涂布溶液。 细长喷嘴体还具有限定在其中的涂覆溶液保持器，并且远离涂覆溶液储存器，用于在涂布溶液的表面张力下保持涂布溶液不会作为液滴脱落。 多个通道被限定在细长喷嘴体中，并且与涂布液储存器和涂布液保持器保持连通，用于将涂布溶液从涂布液储存器提供到涂布溶液保持器。

公开(公告)号：US5769946A

公开(公告)日：1998-06-23

申请号：US627694

申请日：1996-03-29

申请人： Junji Kutsuzawa ,  Hiroyoshi Sago ,  Futoshi Shimai ,  Hidenori Miyamoto

发明人： Junji Kutsuzawa ,  Hiroyoshi Sago ,  Futoshi Shimai ,  Hidenori Miyamoto

IPC分类号： G03F7/16 ,  B05B1/14 ,  B05B13/04 ,  B05C5/02 ,  B05C11/08 ,  G02B5/20 ,  H01L21/027 ,  B05C3/02 ,  B05B13/02 ,  B05C3/00 ,  B05C5/00

CPC分类号： B05C5/0254 ,  B05C11/08 ,  B05C5/0208 ,  B05B13/04 ,  B05C5/027

摘要： A coating nozzle includes an elongate nozzle body having a coating solution reservoir defined longitudinally therein for being supplied with a coating solution from an external coating solution supply. The elongate nozzle body also has a coating solution holder defined therein and opening away from the coating solution reservoir, for holding a coating solution against falling off as droplets under surface tension of the coating solution. A plurality of passages are defined in the elongate nozzle body and held in communication with the coating solution reservoir and the coating solution holder, for supplying the coating solution from the coating solution reservoir to the coating solution holder. The arrangement of the reservoir, the solution holder and the passages in the elongate nozzle body assures that a uniform layer of coating solution is deposited by the nozzle on a surface of a planar substrate.

摘要翻译： 涂布喷嘴包括细长的喷嘴体，其具有纵向地限定在其中的涂布溶液储存器，以从外部涂布溶液供应源供应涂布溶液。 细长喷嘴体还具有限定在其中的涂覆溶液保持器，并且远离涂覆溶液储存器，用于在涂布溶液的表面张力下保持涂布溶液不会作为液滴脱落。 多个通道被限定在细长喷嘴主体中，并且与涂布液储存器和涂布液保持器保持连通，用于将涂布溶液从涂布液储存器提供到涂布溶液保持器。 储存器，溶液保持器和细长喷嘴体中的通道的布置确保了通过喷嘴将均匀的涂层溶液层沉积在平面基板的表面上。

公开(公告)号：US5688411A

公开(公告)日：1997-11-18

申请号：US612723

申请日：1996-03-08

申请人： Junji Kutsuzawa ,  Yoshihito Kai ,  Hidenori Miyamoto ,  Futoshi Shimai

发明人： Junji Kutsuzawa ,  Yoshihito Kai ,  Hidenori Miyamoto ,  Futoshi Shimai

IPC分类号： B08B3/02 ,  B05C9/12 ,  B05D5/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306 ,  H01L21/30 ,  B05D3/00 ,  B44C1/22

CPC分类号： H01L21/02052 ,  B05C9/12 ,  B05D5/00

摘要： A removing unit for removing coating from the edge of a substrate has a vertical unit body housing a pair of pipes connected to a solvent reservoir and having respective solvent supply parts. The unit body has a head disposed in an upper end portion thereof. The head has a horizontal slot which opens at opposite ends thereof and at one side thereof for receiving an edge of a substrate. Solvent is supplied into the slot, drawn therealong and discharged from an end of the slot, all in a contained manner. A edge of a substrate is horizontally inserted into the slot so as to be immersed in the solvent contained in the slot, and the unit body is moved along the substrate edge so that the solvent cleans undesired coating from the edge.

摘要翻译： 用于从基板的边缘去除涂层的去除单元具有容纳连接到溶剂容器并具有各自的溶剂供应部分的一对管道的垂直单元体。 单位体具有设置在其上端部的头部。 头部具有在其相对端部处和在其一侧开口的水平槽，用于接收基板的边缘。 溶剂被供给到狭槽中，被拉出并从槽的端部排出，全部以包含的方式。 将基板的边缘水平地插入槽中以便浸入容纳在槽中的溶剂中，并且单元主体沿着基板边缘移动，使得溶剂从边缘清除不需要的涂层。

公开(公告)号：US06436472B1

公开(公告)日：2002-08-20

申请号：US08825256

申请日：1997-03-27

申请人： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Akira Uehara

发明人： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Akira Uehara

IPC分类号： B05D312

CPC分类号： H01L21/6715

摘要： A slit nozzle is positioned above an end of a glass substrate placed in an inner cup, and, while a coating solution is being ejected with reduced surface tension from the slit nozzle toward the glass substrate, the slit nozzle is translated parallel to the surface of the glass substrate to roughly coat the coating solution on substantially the entire surface of the glass substrate. Thereafter, the upper opening of the inner cup and the upper opening of an outer cup around the inner cup are closed by respective lids, and then the inner cup is rotated to rotate the glass substrate for thereby spreading the coated solution uniformly over the surface of the glass substrate under centrifugal forces.

摘要翻译： 狭缝喷嘴位于放置在内杯中的玻璃基板的端部的上方，并且当从狭缝喷嘴朝向玻璃基板喷射具有降低的表面张力的涂布溶液时，狭缝喷嘴平行于 所述玻璃基板在所述玻璃基板的基本上整个表面上大致涂覆所述涂布溶液。 此后，内杯的上部开口和内杯周围的外杯的上部开口由相应的盖封闭，然后内杯旋转以旋转玻璃基板，从而将涂覆的溶液均匀地铺展在 玻璃基板在离心力下。

公开(公告)号：US5439519A

公开(公告)日：1995-08-08

申请号：US176204

申请日：1994-01-03

申请人： Hiroyoshi Sago ,  Hirotsugu Kumazawa ,  Futoshi Shimai ,  Shigemi Fujiyama ,  Hiroki Endo ,  Hideya Kobari

发明人： Hiroyoshi Sago ,  Hirotsugu Kumazawa ,  Futoshi Shimai ,  Shigemi Fujiyama ,  Hiroki Endo ,  Hideya Kobari

IPC分类号： B05C11/08 ,  G03F7/16 ,  H01L21/00 ,  B05C11/02 ,  B05C5/00

CPC分类号： H01L21/6715 ,  B05C11/08 ,  G03F7/162

摘要： A solution applying apparatus has inner and outer cups each having an upper opening, the inner cup being rotatably disposed in the outer cup. The inner cup houses a planar workpiece such as a glass substrate therein which is to be coated with a coating solution such as a resist solution. The solution applying apparatus also has a lid assembly having an outer cup lid for closing the upper opening of the outer cup and an inner cup lid for closing the upper opening of the inner cup, the inner cup lid being rotatable with respect to the outer cup lid. The inner cup has drain holes defined in an outer circumferential portion thereof for providing communication between a space within the inner cup and a space outside of the inner cup to drain an excessive coating solution from the inner cup. The outer cup has an annular collection passage defined therein along the outer circumferential portion of the inner cup, the drain holes opening into the annular collection passage. The lid assembly includes a self-centering valve body that can be vertically movable into and out of snugly fitting relation to a through hole defined in the inner cup lid and a lost motion mechanism for moving the valve body to an open position thereof while the first and second cup lids remain closed and for opening the outer cup lid while the inner cup lid remains closed. After the workpiece has been coated with the coating solution, the valve body is lifted out of the through hole to smoothly eliminate a vacuum developed in the inner cup, and then the inner cup is opened.

摘要翻译： 溶液施加装置具有各自具有上开口的内杯和外杯，内杯可旋转地设置在外杯中。 内杯容纳有诸如抗蚀剂溶液等涂布溶液的平面状的工件，例如玻璃基板。 溶液施加装置还具有盖组件，其具有用于封闭外杯的上开口的外杯盖和用于封闭内杯的上开口的内杯盖，内杯盖可相对于外杯旋转 盖。 内杯具有限定在其外圆周部分中的排水孔，用于提供内杯内的空间和内杯外部的空间之间的连通，以从内杯排出过量的涂层溶液。 外杯具有沿着内杯的外圆周部分限定在其中的环形收集通道，排出孔通向环形收集通道。 盖组件包括自定心阀体，其可以垂直移动进入和离开与内杯盖中限定的通孔的紧密配合关系，以及用于将阀体移动到其打开位置的空动机构，而第一 并且第二杯盖保持关闭并且在内杯盖保持关闭时打开外杯盖。 在工件被涂布溶液之后，将阀体从通孔中提出，以平滑地消除在内杯中显影的真空，然后打开内杯。

公开(公告)号：US06423139B1

公开(公告)日：2002-07-23

申请号：US09153590

申请日：1998-09-15

申请人： Futoshi Shimai ,  Koichi Nagasawa ,  Junji Kutsuzawa

发明人： Futoshi Shimai ,  Koichi Nagasawa ,  Junji Kutsuzawa

IPC分类号： B05C502

CPC分类号： H01L21/6715 ,  B05C5/0254 ,  B05C11/08 ,  H01L21/67051

摘要： A liquid chemical treatment apparatus includes a coating apparatus for applying a coating liquid such as resist onto the surface of a substantially planar substrate such as a glass substrate. The coating apparatus includes a nozzle with an elongate injection outlet such as a slit with a width substantially the same as that of the substrate, and a liquid circulating passage connected to the nozzle for supplying the coating liquid to the nozzle. Mechanisms are provided with the circulating passage and the nozzle to remove air from the liquid, and to maintain the circulating liquid at a substantially constant temperature and a substantially constant flow rate. When performing a coating operation with the coating liquid, a flow amount thereof is increased up to 1,500 though 3,000 ml/min, from a condition under which the liquid is prevented from dropping from the slit-like injection outlet while circulating within the circulating passage at a flow rate of 500 through 700 ml/min, for example, by closing a valve or by means of a pump 35 included with the passage. The liquid output from the slit-like injection outlet 4a takes on the form of a curtain to be applied over substantially the entire surface of the substrate, without any drops of the coating liquid remaining within the nozzle after the coating operation.

摘要翻译： 液体化学处理装置包括用于将诸如抗蚀剂的涂布液施加到诸如玻璃基板的基本平坦的基板的表面上的涂覆装置。 涂布装置包括具有细长的注射口的喷嘴，例如宽度与基底宽度基本相同的狭缝，以及连接到喷嘴的液体循环通道，用于向喷嘴供应涂布液。 提供了循环通道和喷嘴以从液体中除去空气并且将循环液体保持在基本上恒定的温度和基本上恒定的流速的机构。 当用涂布液进行涂布操作时，其流量可以从循环通道中循环的液体被防止从狭缝状喷射出口滴落的状态增加到1500〜3000ml / min 流量为500至700ml / min，例如通过关闭阀或通过通道附带的泵35。 从狭缝状喷射出口输出的液体呈窗帘的形式施加在基体的基本整个表面上，涂布操作之后没有任何滴落的喷涂液体残留在喷嘴内。

公开(公告)号：US06761930B2

公开(公告)日：2004-07-13

申请号：US10199602

申请日：2002-07-19

申请人： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Akira Uehara

发明人： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Akira Uehara

IPC分类号： B05D142

CPC分类号： H01L21/6715

摘要： A slit nozzle is positioned above a surface of a substrate placed in a rotary coater, and, while the slit nozzle is translated parallel to the surface of the substrate a coating solution is ejected from the slit nozzle toward the glass substrate under conditions such that the effects of surface tension of the solution are minimized or substantially cancelled out, to uniformly coat the coating solution on substantially the entire surface of the substrate with minimum wasting of the solution.

摘要翻译： 狭缝喷嘴位于旋转涂布机的基板的表面上方，并且在狭缝喷嘴平行于基板的表面平行地平移时，将涂布液从狭缝喷嘴朝向玻璃基板喷射， 使溶液的表面张力的作用最小化或基本抵消，以最小程度地消除溶液的浪费，均匀地将涂布液涂覆在基材的基本整个表面上。

公开(公告)号：US5785759A

公开(公告)日：1998-07-28

申请号：US742581

申请日：1996-10-28

申请人： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Koichi Nagasawa

发明人： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Koichi Nagasawa

IPC分类号： B05C11/02 ,  B05C11/08 ,  G03F7/16 ,  H01L21/027 ,  H01L21/31 ,  H01L21/316 ,  B05B13/02 ,  B05C13/00

CPC分类号： B05C11/02 ,  G03F7/162

摘要： A rotating cup type liquid supply device comprises an inner cup 3, a vacuum chuck 5 disposed in the center of a bottom surface of the inner cup 3 for holding thereon a planar material W to be treated, and a tray 7 fixed onto the bottom surface of the inner cup 3 for substantially surrounding the planar material W held by the vacuum chuck 5. The tray is of a substantially rectangular shape in plan view and includes an tapered wall portion 9 turned inwardly along a circumferential wall portion thereof for defining an upper opening 8 of the tray 7. The tray 7 further includes a plurality of drain guiding conduits 10 each extending at a predetermined angle outwardly from an outer peripheral portion thereof. Also, the tray can be provided thereon with the cover having an opening slightly larger than the planar material W.

摘要翻译： 旋转杯型液体供给装置包括内杯3，设置在内杯3的底面的中心的真空吸盘5，用于保持待处理的平面材料W，以及固定在底面上的托盘7 用于基本上围绕由真空吸盘5保持的平面材料W。托盘在平面图中具有基本上矩形的形状，并且包括沿着其周壁部分向内转动的锥形壁部分9，用于限定上开口 托盘7还包括多个排水引导管道10，每个排水引导管道10以预定的角度从其外围部分向外延伸。 此外，托盘可以设置在其上，盖具有比平面材料W稍大的开口。

公开(公告)号：US09010270B2

公开(公告)日：2015-04-21

申请号：US13116941

申请日：2011-05-26

申请人： Futoshi Shimai ,  Akihiko Sato ,  Tsutomu Sahoda ,  Kenji Maruyama

发明人： Futoshi Shimai ,  Akihiko Sato ,  Tsutomu Sahoda ,  Kenji Maruyama

IPC分类号： B05C5/00 ,  B05D3/00 ,  H01L21/67 ,  H01L21/677 ,  B05C5/02 ,  B05C9/04 ,  B05B13/02 ,  B05D1/00 ,  B05D1/26 ,  G11B5/842

CPC分类号： B05C5/02 ,  B05B13/02 ,  B05B13/0228 ,  B05B13/0278 ,  B05C9/04 ,  B05D1/002 ,  B05D1/26 ,  B05D3/007 ,  G11B5/842 ,  H01L21/67051 ,  H01L21/67155

摘要： Provided is a coating device including: a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion.

摘要翻译： 本发明提供一种涂布装置，包括：基板承载单元，其在基板竖立时可旋转地保持基板，并且能够将保持的基板设置在第一位置和第二位置; 应用单元，其包括将液体材料喷射到布置在第一位置的基板的第一和第二表面中的液体材料喷嘴; 以及拆卸单元，其包括容纳机构，该容纳机构容纳设置在第二位置的基板的周缘部的一部分，以及清洗液喷出机构，其向周缘部喷射清洗液，除去周缘部的液体材料 。

公开(公告)号：US08919756B2

公开(公告)日：2014-12-30

申请号：US12877881

申请日：2010-09-08

申请人： Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

发明人： Tsutomu Sahoda ,  Futoshi Shimai ,  Akihiko Sato

IPC分类号： B25B11/00 ,  H01L21/67 ,  H01L21/677

CPC分类号： H01L21/67051 ,  H01L21/67161 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67751 ,  H01L21/67766 ,  H01L21/67778 ,  Y10S269/903

摘要： A substrate processing system includes a processing unit, a substrate loading unit, a substrate unloading unit, and a carrying unit. A carrying device has a constitution in which a suction portion suctioning and holding a substrate is rotatable about an arm portion provided in a base portion and the substrate is rotated in the state where the substrate is held by a holding portion. A coating device has a constitution in which a liquid material is ejected from a nozzle to both surfaces of the substrate rotating in an upright state.

摘要翻译： 基板处理系统包括处理单元，基板装载单元，基板卸载单元和承载单元。 携带装置具有这样一种构造，其中吸引和保持基板的吸附部分可以围绕设置在基部中的臂部分旋转，并且基板在通过保持部保持基板的状态下旋转。 涂布装置具有液体材料从喷嘴喷射到以直立状态旋转的基板的两个表面的构造。