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    Method for preparing partially tert-butoxylated poly(p-hydroxystyrene)
    1.
    发明授权
    Method for preparing partially tert-butoxylated poly(p-hydroxystyrene) 失效
    部分叔丁氧基化聚（对羟基苯乙烯）

    公开(公告)号：US5580936A

    公开(公告)日：1996-12-03

    申请号：US536119

    申请日：1995-09-29

    申请人： Junji Tsuchiya ,  Katsuya Takemura ,  Osamu Watanabe ,  Yoshihumi Takeda ,  Toshinobu Ishihara

    发明人： Junji Tsuchiya ,  Katsuya Takemura ,  Osamu Watanabe ,  Yoshihumi Takeda ,  Toshinobu Ishihara

    IPC分类号： C08F8/00 ,  C08F8/14 ,  C08F12/00 ,  C08F212/14 ,  G03F7/027

    CPC分类号： C08F8/12 ,  C08F2800/20

    摘要： A partially tert-butoxylated poly(p-hydroxystyrene) is prepared by subjecting poly(p-tert-butoxystyrene) to reaction of eliminating some of the tert-butoxy groups in an organic solvent at a temperature of 30.degree.-100.degree. C. in the presence of an acid catalyst at a molar ratio of acid catalyst/t-BuO group of from 0.050 to 2.0. During the elimination reaction, a change of solubility of the resulting partially tert-butoxylated poly(p-hydroxystyrene) is determined to calculate a degree of elimination of tert-butoxy groups. The reaction is terminated when a desired degree of elimination is reached. Through a simple process, partially tert-butoxylated poly(p-hydroxystyrene) having a well controlled t-BuO content is produced in high yields.

    摘要翻译： 通过使聚（对叔丁氧基苯乙烯）在有机溶剂中在30℃-100℃的温度下除去一些叔丁氧基进行反应来制备部分叔丁氧基化的聚（对羟基苯乙烯） 酸催化剂/ t-BuO基团的摩尔比为0.050至2.0的酸催化剂的存在。 在消除反应期间，测定所得部分叔丁氧基化聚（对羟基苯乙烯）的溶解度的变化，以计算叔丁氧基的消除程度。 当达到所需的消除程度时，终止反应。 通过简单的方法，产生具有良好控制的t-BuO含量的部分叔丁氧基化聚（对羟基苯乙烯），产率高。

    Polymers and chemically amplified positive resist compositions
    2.
    发明授权
    Polymers and chemically amplified positive resist compositions 失效
    聚合物和化学增幅阳性抗蚀剂组合物

    公开(公告)号：US06022665A

    公开(公告)日：2000-02-08

    申请号：US109084

    申请日：1998-07-02

    申请人： Osamu Watanabe ,  Yoshihumi Takeda ,  Junji Tsuchiya ,  Toshinobu Ishihara

    发明人： Osamu Watanabe ,  Yoshihumi Takeda ,  Junji Tsuchiya ,  Toshinobu Ishihara

    IPC分类号： C08F212/14 ,  G03C1/492

    CPC分类号： C08F212/14 ,  Y10S430/115

    摘要： The invention provides a novel polymer comprising a recurring unit of formula (1) wherein R.sup.1 is hydrogen or methyl, R.sup.2 is hydrogen or acid labile group, at least one R.sup.2 being hydrogen and at least one R.sup.2 being an acid labile group, and n=2 or 3. The polymer's Mw is 3,000-300,000. Blending the polymer as a base resin with an organic solvent and a photoacid generator yields a chemically amplified positive resist composition. ##STR1##

    摘要翻译： 本发明提供一种包含式（1）的重复单元的新型聚合物，其中R 1是氢或甲基，R 2是氢或酸不稳定基团，至少一个R 2是氢，至少一个R 2是酸不稳定基团，n = 聚合物的Mw为3,000-300,000。 将聚合物作为基础树脂与有机溶剂和光酸发生剂混合产生化学放大的正性抗蚀剂组合物。

    Polymers and chemically amplified positive resist compositions
    3.
    发明授权
    Polymers and chemically amplified positive resist compositions 失效
    聚合物和化学增幅阳性抗蚀剂组合物

    公开(公告)号：US5844057A

    公开(公告)日：1998-12-01

    申请号：US630633

    申请日：1996-04-11

    申请人： Osamu Watanabe ,  Yoshihumi Takeda ,  Junji Tsuchiya ,  Toshinobu Ishihara

    发明人： Osamu Watanabe ,  Yoshihumi Takeda ,  Junji Tsuchiya ,  Toshinobu Ishihara

    IPC分类号： C08F212/14 ,  G03C1/492 ,  C08F12/24

    CPC分类号： C08F212/14 ,  Y10S430/115

    摘要： The invention provides a novel polymer comprising a recurring unit of formula. (1) wherein R.sup.1 is hydrogen or methyl, R.sup.2 is hydrogen or acid labile group, at least one R.sup.2 being hydrogen and at least one R.sup.2 being an acid labile group, and n=2 or 3. The polymer's Mw is 3,000-300,000. Blending the polymer as a base resin with an organic solvent and a photoacid generator yields a chemically amplified positive resist composition. ##STR1##

    摘要翻译： 本发明提供一种包含式的重复单元的新型聚合物。 （1）其中R1是氢或甲基，R2是氢或酸不稳定基团，至少一个R2是氢，至少一个R2是酸不稳定基团，n = 2或3.聚合物的Mw为3,000-300,000。 将聚合物作为基础树脂与有机溶剂和光酸发生剂混合产生化学放大的正性抗蚀剂组合物。 （1）