LOW-MOISTURE CLOUD-MAKING CLEANING ARTICLE
    3.
    发明申请
    LOW-MOISTURE CLOUD-MAKING CLEANING ARTICLE 有权
    低湿度云彩清洁文章

    公开(公告)号:US20150089755A1

    公开(公告)日:2015-04-02

    申请号:US14042071

    申请日:2013-09-30

    CPC classification number: A47L13/17 D04H1/00

    Abstract: A cleaning article includes a cleaning article sheet comprising a fabric substrate, wherein the fabric substrate includes pores therein, and wherein the fabric substrate has a background moisture percentage by weight, and liquid water disposed substantially and disconnectedly within the pores, wherein the liquid water is at moisture percentage by weight that is 5 to 150 percentage points higher than the background moisture percentage. The nonwoven substrate can include pores formed between and/or within the fibers and can have a background moisture percentage by weight. The substrate can include a treatment to increase the dielectric constant from the dielectric constant of the substrate without the treatment. The moisture of the article can be configured to exhibit a dielectric constant of at least 50% and up to 600% higher than the dielectric constant of the same article with only background moisture.

    Abstract translation: 一种清洁用品,具有包括织物基材的清洁用品片,其中,所述织物基材在其中包含孔,并且其中所述织物基材具有背景水分重量百分比,以及在所述孔内基本上和不连续地设置的液态水,其中所述液态水为 水分重量比背景水分百分比高5至150个百分点。 非织造基材可以包括在纤维之间和/或内部形成的孔,并且可以具有重量的背景水分百分比。 衬底可以包括在不进行处理的情况下从介质的介电常数增加介电常数的处理。 制品的湿气可以被配置为表现出比仅具有背景水分的相同制品的介电常数高至少50%且高达600%的介电常数。

Patent Agency Ranking