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公开(公告)号：US20240161272A1
公开(公告)日：2024-05-16
申请号：US18342609
申请日：2023-06-27
Applicant: KLA Corporation
Inventor： Sangbong Park , Ge Cong , Eugene Shifrin , Richard Wallingford
CPC classification number: G06T7/001 , G06T5/50 , G06T2207/20081 , G06T2207/20224 , G06T2207/30148 , G06T2207/30168
Abstract: Methods and systems for detecting defects on a specimen are provided. One method includes generating first and second mode test, reference, and difference images of a specimen for first and second modes of an inspection subsystem, respectively. The method also includes combining the first and second mode test images, the first and second mode reference images, and the first and second mode difference images as an input for defect detection. In addition, the method includes detecting defects on the specimen based on at least the first and second mode difference images.
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公开(公告)号：US20220318986A1
公开(公告)日：2022-10-06
申请号：US17711043
申请日：2022-04-01
Applicant: KLA Corporation
Inventor： Bjorn Brauer , Richard Wallingford
IPC: G06T7/00 , G06T7/10 , G06V20/70 , G06V10/774 , G06N3/08
Abstract: Methods and systems for determining information for a specimen are provided. One system includes a computer subsystem and one or more components executed by the computer subsystem. The one or more components include a semantic segmentation model configured for assigning labels to each of multiple pixels in an image responsive to what is represented in each of the multiple pixels. The image is an image of a specimen generated by an imaging subsystem. The computer subsystem is configured for determining information for the specimen from the assigned labels and without a reference image for the specimen.
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公开(公告)号：US20210297600A1
公开(公告)日：2021-09-23
申请号：US17195614
申请日：2021-03-08
Applicant: KLA Corporation
Inventor： Bryant Mantiply , Xiumei Liu , Matthew Giusti , Kai Cao , Richard Wallingford
Abstract: Methods and systems for determining focus settings for use in a specimen scan are provided. One method includes generating a focus map defined as values of best focus as a function of position on a specimen using output generated in one or more pre-focus swaths scanned on the specimen by an output acquisition subsystem configured to direct energy to a specimen, to detect energy from the specimen, and to generate output responsive to the detected energy. The method also includes interpolating the focus map to generate focus settings for a scan performed on the specimen during a process and storing information for the generated focus settings for use in the scan performed on the specimen during the process.
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公开(公告)号：US11983865B2
公开(公告)日：2024-05-14
申请号：US17308878
申请日：2021-05-05
Applicant: KLA Corporation
Inventor： Bjorn Brauer , Richard Wallingford
CPC classification number: G06T7/001 , G06T7/337 , G06T2207/20081 , G06T2207/20084 , G06T2207/30148
Abstract: Methods and systems for deep learning alignment for semiconductor applications are provided. One method includes transforming first actual information for an alignment target on a specimen from either design data to a specimen image or a specimen image to design data by inputting the first actual information into a deep generative model such as a GAN. The method also includes aligning the transformed first actual information to second actual information for the alignment target, which has the same information type as the transformed first actual information. The method further includes determining an offset between the transformed first actual information and the second actual information based on results of the aligning and storing the determined offset as an align-to-design offset for use in a process performed on the specimen.
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公开(公告)号：US20220383470A1
公开(公告)日：2022-12-01
申请号：US17492321
申请日：2021-10-01
Applicant: KLA Corporation
Inventor： Abdurrahman Sezginer , Wei Zhao , Richard Wallingford , Grace Hsiu-Ling Chen , Xuzhao Liu , Ge Cong , Leon Yu , Kuljit Virk , Bosheng Zhang , Amrish Patel , Patrick McBride
Abstract: A system includes a processing unit communicatively coupled to a detector array of an optical wafer characterization system. The processing unit is configured to perform one or more steps of a method or process including the steps of acquiring one or more target images of a target location on a wafer from the detector array, applying a de-noising filter to at least the one or more target images, determining one or more difference images from one or more reference images and the one or more target images, and up-sampling the one or more difference images to generate one or more up-sampled images. One or more wafer defects are detectable in the one or more difference images or the up-sampled images.
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Patent Agency Ranking
公开(公告)号：US20220230293A1
公开(公告)日：2022-07-21
申请号：US17713017
申请日：2022-04-04
Applicant: KLA Corporation
Inventor： Jason Z. Lin , Allen Park , Ellis Chang , Richard Wallingford , Songnian Rong , Chetana Bhaskar
IPC: G06T7/00
Abstract: Mixed-mode includes receiving inspection results including one or more images of a selected region of the wafer, the one or more images include one or more wafer die including a set of repeating blocks, the set of repeating blocks a set of repeating cells. In addition, mixed-mode inspection includes adjusting a pixel size of the one or more images to map each cell, block and die to an integer number of pixels. Further, mixed-mode inspection includes comparing a first wafer die to a second wafer die to identify an occurrence of one or more defects in the first or second wafer die, comparing a first block to a second block to identify an occurrence of one or more defects in the first or second blocks and comparing a first cell to a second cell to identify an occurrence of one or more defects in the first or second cells.
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公开(公告)号：US12229935B2
公开(公告)日：2025-02-18
申请号：US17711043
申请日：2022-04-01
Applicant: KLA Corporation
Inventor： Bjorn Brauer , Richard Wallingford
IPC: G06T7/00 , G06N3/08 , G06T7/10 , G06V10/774 , G06V20/70
Abstract: Methods and systems for determining information for a specimen are provided. One system includes a computer subsystem and one or more components executed by the computer subsystem. The one or more components include a semantic segmentation model configured for assigning labels to each of multiple pixels in an image responsive to what is represented in each of the multiple pixels. The image is an image of a specimen generated by an imaging subsystem. The computer subsystem is configured for determining information for the specimen from the assigned labels and without a reference image for the specimen.
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8.发明公开公开(公告)号：US20230204934A1
公开(公告)日：2023-06-29
申请号：US18114859
申请日：2023-02-27
Applicant: KLA Corporation
Inventor： Xiumei Liu , Kai Cao , Richard Wallingford , Matthew Giusti , Brooke Bruguier
CPC classification number: G02B21/006 , G02B21/364 , G02B21/0032
Abstract: An auto-focusing system is disclosed. The system includes an illumination source. The system includes an aperture. The system includes a projection mask. The system includes a detector assembly. The system includes a relay system, the relay system being configured to optically couple illumination transmitted through the projection mask to an imaging system. The relay system also being configured to project one or more patterns from the projection mask onto a specimen and transmit an image of the projection mask from the specimen to the detector assembly. The system includes a controller including one or more processors configured to execute a set of program instructions. The program instructions being configured to cause the one or more processors to: receive one or more images of the projection mask from the detector assembly and determine quality of the one or more images of the projection mask.
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公开(公告)号：US11592653B2
公开(公告)日：2023-02-28
申请号：US16836787
申请日：2020-03-31
Applicant: KLA Corporation
Inventor： Xiumei Liu , Kai Cao , Richard Wallingford , Matthew Giusti , Brooke Bruguier
Abstract: An auto-focusing system is disclosed. The system includes an illumination source. The system includes an aperture. The system includes a projection mask. The system includes a detector assembly. The system includes a relay system, the relay system being configured to optically couple illumination transmitted through the projection mask to an imaging system. The relay system also being configured to project one or more patterns from the projection mask onto a specimen and transmit an image of the projection mask from the specimen to the detector assembly. The system includes a controller including one or more processors configured to execute a set of program instructions. The program instructions being configured to cause the one or more processors to: receive one or more images of the projection mask from the detector assembly and determine quality of the one or more images of the projection mask.
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公开(公告)号：US20220375051A1
公开(公告)日：2022-11-24
申请号：US17308878
申请日：2021-05-05
Applicant: KLA Corporation
Inventor： Bjorn Brauer , Richard Wallingford
Abstract: Methods and systems for deep learning alignment for semiconductor applications are provided. One method includes transforming first actual information for an alignment target on a specimen from either design data to a specimen image or a specimen image to design data by inputting the first actual information into a deep generative model such as a GAN. The method also includes aligning the transformed first actual information to second actual information for the alignment target, which has the same information type as the transformed first actual information. The method further includes determining an offset between the transformed first actual information and the second actual information based on results of the aligning and storing the determined offset as an align-to-design offset for use in a process performed on the specimen.
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