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公开(公告)号：US10381216B2
公开(公告)日：2019-08-13
申请号：US16231048
申请日：2018-12-21
摘要： An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.
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公开(公告)号：US20160268120A1
公开(公告)日：2016-09-15
申请号：US15064294
申请日：2016-03-08
摘要： An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.
摘要翻译： 用于通过光持续等离子体形成产生宽带光的光学系统包括腔室，照明源，一组聚焦光学器件和一组收集光学器件。 室被配置为在第一相中包含缓冲材料和第二相中的等离子体形成材料。 照明源产生连续波泵照明。 该组聚焦光学器件将连续波泵浦照明通过缓冲材料聚焦到缓冲材料和等离子体形成材料之间的界面上，以便通过激发至少等离子体形成材料产生等离子体。 该组收集光学器件接收从等离子体发出的宽带辐射。
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公开(公告)号：US09355208B2
公开(公告)日：2016-05-31
申请号：US14321565
申请日：2014-07-01
发明人： Eugene Shifrin , Ashok Kulkarni , Kris Bhaskar , Graham Michael Lynch , John Raymond Jordan, III , Chwen-Jiann Fang
CPC分类号： G06F17/5081 , G01N21/9501 , G06F17/5045 , H01L22/12
摘要： Systems and methods for detecting defects on a wafer are provided. One method includes determining locations of all instances of a weak geometry in a design for a wafer. The locations include random, aperiodic locations. The weak geometry includes one or more features that are more prone to defects than other features in the design. The method also includes scanning the wafer with a wafer inspection system to thereby generate output for the wafer with one or more detectors of the wafer inspection system. In addition, the method includes detecting defects in at least one instance of the weak geometry based on the output generated at two or more instances of the weak geometry in a single die on the wafer.
摘要翻译： 提供了用于检测晶片上的缺陷的系统和方法。 一种方法包括在晶片的设计中确定弱几何的所有实例的位置。 这些位置包括随机，不定期的位置。 弱几何包括与设计中的其他特征相比更容易出现缺陷的一个或多个特征。 该方法还包括用晶片检查系统扫描晶片，从而通过晶片检查系统的一个或多个检测器产生用于晶片的输出。 此外，该方法包括基于在晶片上的单个管芯中的弱几何形状的两个或多个实例处产生的输出来检测弱几何形状的至少一个实例中的缺陷。
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公开(公告)号：US20160104600A1
公开(公告)日：2016-04-14
申请号：US14880187
申请日：2015-10-09
发明人： Qing Luo , Kenong Wu , Hucheng Lee , Lisheng Gao , Eugene Shifrin , Yan Xiong , Shuo Sun
IPC分类号： H01J37/28
CPC分类号： G05B19/401 , G05B2219/37365 , G05B2219/37571 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L22/20
摘要： Systems and methods for detecting defects on a specimen based on structural information are provided. One system includes one or more computer subsystems configured for separating the output generated by a detector of an inspection subsystem in an array area on a specimen into at least first and second segments of the output based on characteristic(s) of structure(s) in the array area such that the output in different segments has been generated in different locations in the array area in which the structure(s) having different values of the characteristic(s) are formed. The computer subsystem(s) are also configured for detecting defects on the specimen by applying one or more defect detection methods to the output based on whether the output is in the first segment or the second segment.
摘要翻译： 提供了基于结构信息检测样本上的缺陷的系统和方法。 一个系统包括一个或多个计算机子系统，其被配置为基于检测子系统的检测器产生的输出，以将样本上的阵列区域中的输出的至少第一和第二段基于 阵列区域使得不同段中的输出已经在其中形成具有不同特征值的结构的阵列区域中的不同位置中生成。 计算机子系统还被配置为基于输出是在第一段还是第二段中，通过向输出应用一个或多个缺陷检测方法来检测样本上的缺陷。
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公开(公告)号：US09262821B2
公开(公告)日：2016-02-16
申请号：US14707573
申请日：2015-05-08
发明人： Eugene Shifrin , Chetana Bhaskar , Ashok V. Kulkarni , Chien-Huei (Adam) Chen , Kris Bhaskar , Brian Duffy
CPC分类号： G06T7/001 , G06T2200/28 , G06T2207/30148
摘要： Systems and methods for generating information for use in a wafer inspection process are provided. One method includes acquiring output of an inspection system for die(s) located on wafer(s), combining the output for the die(s) based on within die positions of the output, determining, on a within die position basis, a statistical property of variation in values of characteristic(s) of the combined output, and assigning the within die positions to different groups based on the statistical properties determined for the within die positions. The method also includes storing information for the within die positions and the different groups to which the within die positions are assigned in a storage medium that is accessible to the inspection system for performing the wafer inspection process, which includes applying defect detection parameter(s) to additional output of the inspection system generated for a wafer based on the information thereby detecting defects on the wafer.
摘要翻译： 提供了用于生成用于晶片检查过程的信息的系统和方法。 一种方法包括获取位于晶片上的模具的检查系统的输出，基于输出的管芯位置组合用于管芯的输出，在内部管芯位置的基础上确定统计学 基于针对模具位置确定的统计特性，将组合输出的特性值的变化的属性以及将模具位置分配给不同的组。 该方法还包括在用于执行晶片检查过程的检查系统可访问的存储介质中存储用于管芯位置和内部管芯位置分配的不同组的信息，其包括应用缺陷检测参数， 基于该信息为晶片生成的检查系统的附加输出，从而检测晶片上的缺陷。
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公开(公告)号：US11138722B2
公开(公告)日：2021-10-05
申请号：US16229816
申请日：2018-12-21
发明人： Anatoly Shchemelinin , Ilya Bezel , Eugene Shifrin
摘要： Methods and systems for enhanced defect detection based on images collected by at least two imaging detectors at different times are described. In some embodiments, the time between image measurements is at least 100 microseconds and no more than 10 milliseconds. In one aspect, one or more defects of interest are identified based on a composite image of a measured area generated based on a difference between collected images. In a further aspect, measurement conditions associated with the each imaged location are adjusted to be different for measurements performed by at least two imaging detectors at different times. In some embodiments, the measurement conditions are adjusted during the time between measurements by different imaging detectors. Exemplary changes of measurement conditions include environmental changes at the wafer under measurement and changes made to the optical configuration of the inspection system.
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公开(公告)号：US20180348147A1
公开(公告)日：2018-12-06
申请号：US15828632
申请日：2017-12-01
发明人： Eugene Shifrin , Bjorn Brauer , Sumit Sen , Ashok Mathew , Sreeram Chandrasekaran , Lisheng Gao
IPC分类号： G01N21/95 , G01N21/956
摘要： Defects from a hot scan can be saved, such as on persistent storage, random access memory, or a split database. The persistent storage can be patch-based virtual inspector virtual analyzer (VIVA) or local storage. Repeater defect detection jobs can determined and the wafer can be inspected based on the repeater defect detection jobs. Repeater defects can be analyzed and corresponding defect records to the repeater defects can be read from the persistent storage. These results may be returned to the high level defect detection controller.
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公开(公告)号：US20160061749A1
公开(公告)日：2016-03-03
申请号：US14674856
申请日：2015-03-31
发明人： Hong Chen , Kenong Wu , Eugene Shifrin , Masatoshi Yamaoka
CPC分类号： G01N21/9501 , G01N21/00 , G01N21/94 , G01N21/95 , G01N2201/061 , G01N2201/10
摘要： Systems and methods for detecting defects on a wafer are provided. One method includes generating test image(s) for at least a portion of an array region in die(s) on a wafer from frame image(s) generated by scanning the wafer with an inspection system. The method also includes generating a reference image for cell(s) in the array region from frame images generated by the scanning of the wafer. In addition, the method includes determining difference image(s) for at least one cell in the at least the portion of the array region in the die(s) by subtracting the reference image from portion(s) of the test image(s) corresponding to the at least one cell. The method further includes detecting defects on the wafer in the at least one cell based on the difference image(s).
摘要翻译： 提供了用于检测晶片上的缺陷的系统和方法。 一种方法包括从通过用检查系统扫描晶片产生的帧图像为晶片上的晶片中的晶片的阵列区域的至少一部分生成测试图像。 该方法还包括从通过晶片扫描生成的帧图像生成阵列区域中的单元的参考图像。 另外，该方法包括通过从测试图像的一部分中减去参考图像来确定模具中的阵列区域的至少一部分中的至少一个单元的差分图像， 对应于至少一个小区。 该方法还包括基于差分图像来检测至少一个单元中的晶片上的缺陷。
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公开(公告)号：US10648925B2
公开(公告)日：2020-05-12
申请号：US15828632
申请日：2017-12-01
发明人： Eugene Shifrin , Bjorn Brauer , Sumit Sen , Ashok Mathew , Sreeram Chandrasekaran , Lisheng Gao
IPC分类号： G06K9/00 , G01N21/95 , G01N21/956 , H01L21/66
摘要： Defects from a hot scan can be saved, such as on persistent storage, random access memory, or a split database. The persistent storage can be patch-based virtual inspector virtual analyzer (VIVA) or local storage. Repeater defect detection jobs can determined and the wafer can be inspected based on the repeater defect detection jobs. Repeater defects can be analyzed and corresponding defect records to the repeater defects can be read from the persistent storage. These results may be returned to the high level defect detection controller.
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10.发明授权公开(公告)号：US10520741B2
公开(公告)日：2019-12-31
申请号：US15651968
申请日：2017-07-17
IPC分类号： G02B27/10
摘要： A system for separating plasma pumping light and collected broadband light includes a pump source configured to generate pumping illumination including at least a first wavelength, a gas containment element for containing a volume of gas, a collector configured to focus the pumping illumination from the pumping source into the volume of gas to generate a plasma within the volume of gas, wherein the plasma emits broadband radiation including at least a second wavelength and an illumination separation prism element positioned between a reflective surface of the collector and the pump source and arranged to spatially separate the pumping illumination including the first wavelength and the emitted broadband radiation including at least a second wavelength emitted from the plasma.
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