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公开(公告)号：US09766187B2
公开(公告)日：2017-09-19
申请号：US14838091
申请日：2015-08-27
发明人： Hong Chen , Kenong Wu , Eugene Shifrin , Masatoshi Yamaoka , Gangadharan Sivaraman , Raghav Babulnath , Satya Kurada , Shuo Sun
IPC分类号： G01N21/95 , G01N21/956 , G01N21/00
CPC分类号： G01N21/9501 , G01N21/00 , G01N21/95 , G01N21/95607
摘要： Systems and methods for detecting defects on a wafer are provided. One method includes generating test image(s) for at least a portion of an array region in die(s) on a wafer from frame image(s) generated by scanning the wafer with an inspection system. The method also includes generating a reference image for cell(s) in the array region from frame images generated by the scanning of the wafer. In addition, the method includes determining difference image(s) for at least one cell in the at least the portion of the array region in the die(s) by subtracting the reference image from portion(s) of the test image(s) corresponding to the at least one cell. The method further includes detecting defects on the wafer in the at least one cell based on the difference image(s).
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公开(公告)号：US20160061745A1
公开(公告)日：2016-03-03
申请号：US14838091
申请日：2015-08-27
发明人： Hong Chen , Kenong Wu , Eugene Shifrin , Masatoshi Yamaoka , Gangadharan Sivaraman , Raghav Babulnath , Satya Kurada , Shuo Sun
CPC分类号： G01N21/9501 , G01N21/00 , G01N21/95 , G01N21/95607
摘要： Systems and methods for detecting defects on a wafer are provided. One method includes generating test image(s) for at least a portion of an array region in die(s) on a wafer from frame image(s) generated by scanning the wafer with an inspection system.The method also includes generating a reference image for cell(s) in the array region from frame images generated by the scanning of the wafer. In addition, the method includes determining difference image(s) for at least one cell in the at least the portion of the array region in the die(s) by subtracting the reference image from portion(s) of the test image(s) corresponding to the at least one cell. The method further includes detecting defects on the wafer in the at least one cell based on the difference image(s).
摘要翻译： 提供了用于检测晶片上的缺陷的系统和方法。 一种方法包括从通过用检查系统扫描晶片产生的帧图像为晶片上的晶片中的晶片的阵列区域的至少一部分生成测试图像。 该方法还包括从通过晶片扫描生成的帧图像生成阵列区域中的单元的参考图像。 此外，该方法包括通过从测试图像的一部分中减去参考图像来确定模具中的阵列区域的至少一部分中的至少一个单元的差分图像， 对应于至少一个小区。 该方法还包括基于差分图像来检测至少一个单元中的晶片上的缺陷。
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公开(公告)号：US10338002B1
公开(公告)日：2019-07-02
申请号：US15411719
申请日：2017-01-20
发明人： Robert M. Danen , Shuo Sun , Thomas Boatwright
摘要： Methods and systems for selecting optical modes suitable for defect inspection are disclosed. A method may include: scanning a full-stack wafer of the particular type utilizing a set of optical modes to obtain a set of full-stack wafer images; and de-processing the full-stack wafer to produce a de-processed wafer based on a location of a potential defect of interest indicated by the set of full-stack wafer images to facilitate selection of optical modes suitable for defect inspection of wafers of the particular type.
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公开(公告)号：US09727047B2
公开(公告)日：2017-08-08
申请号：US14880187
申请日：2015-10-09
发明人： Qing Luo , Kenong Wu , Hucheng Lee , Lisheng Gao , Eugene Shifrin , Yan Xiong , Shuo Sun
IPC分类号： G05B19/401 , H01L21/66
CPC分类号： G05B19/401 , G05B2219/37365 , G05B2219/37571 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L22/20
摘要： Systems and methods for detecting defects on a specimen based on structural information are provided. One system includes one or more computer subsystems configured for separating the output generated by a detector of an inspection subsystem in an array area on a specimen into at least first and second segments of the output based on characteristic(s) of structure(s) in the array area such that the output in different segments has been generated in different locations in the array area in which the structure(s) having different values of the characteristic(s) are formed. The computer subsystem(s) are also configured for detecting defects on the specimen by applying one or more defect detection methods to the output based on whether the output is in the first segment or the second segment.
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公开(公告)号：US20160104600A1
公开(公告)日：2016-04-14
申请号：US14880187
申请日：2015-10-09
发明人： Qing Luo , Kenong Wu , Hucheng Lee , Lisheng Gao , Eugene Shifrin , Yan Xiong , Shuo Sun
IPC分类号： H01J37/28
CPC分类号： G05B19/401 , G05B2219/37365 , G05B2219/37571 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L22/20
摘要： Systems and methods for detecting defects on a specimen based on structural information are provided. One system includes one or more computer subsystems configured for separating the output generated by a detector of an inspection subsystem in an array area on a specimen into at least first and second segments of the output based on characteristic(s) of structure(s) in the array area such that the output in different segments has been generated in different locations in the array area in which the structure(s) having different values of the characteristic(s) are formed. The computer subsystem(s) are also configured for detecting defects on the specimen by applying one or more defect detection methods to the output based on whether the output is in the first segment or the second segment.
摘要翻译： 提供了基于结构信息检测样本上的缺陷的系统和方法。 一个系统包括一个或多个计算机子系统，其被配置为基于检测子系统的检测器产生的输出，以将样本上的阵列区域中的输出的至少第一和第二段基于 阵列区域使得不同段中的输出已经在其中形成具有不同特征值的结构的阵列区域中的不同位置中生成。 计算机子系统还被配置为基于输出是在第一段还是第二段中，通过向输出应用一个或多个缺陷检测方法来检测样本上的缺陷。
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